Abstract: A capacitive-coupled parallel plate plasma enhanced chemical vapor deposition reactor includes a gas distribution unit that is integrated in an RF electrode and is formed with a gas outlet. The parallel plate reactor is configured so that layers with high thickness homogeneity and quality can be produced. The capacitively coupled parallel plate plasma enhanced vapor deposition reactor has gas distribution unit with a multiple-stage showerhead constructed in such a way that it provides an independent adjustment of gas distribution and gas emission profile of the gas distribution unit.

Abstract: A hetero-contact solar cell has a front side provided for an incidence of solar radiation. The solar cell has an absorber of a crystalline semiconductor material of a first conductivity type, an amorphous semiconductor layer of the first conductivity type doped more highly than the absorber and an electrically conductive, transparent front side conduction layer provided on the amorphous semiconductor layer. A front side contact is provided on the solar cell and has spaced-apart contact structures. An emitter of a second conductivity type opposite to the first conductivity type is provided on a back side. A back side contact is arranged on the back side. The emitter-related absorption losses of the solar cells can be eliminated by the back side contact having a back side contact layer extending over the surface of the back side, and the front side conduction layer containing a specific resistance from 7×10?4 to 50×10?4 ?cm.

Abstract: A capacitive-coupled parallel plate plasma enhanced chemical vapor deposition reactor includes a gas distribution unit that is integrated in an RF electrode and is formed with a gas outlet. The parallel plate reactor is configured so that layers with high thickness homogeneity and quality can be produced. The capacitively coupled parallel plate plasma enhanced vapor deposition reactor has gas distribution unit with a multiple-stage showerhead constructed in such a way that it provides an independent adjustment of gas distribution and gas emission profile of the gas distribution unit.