Patents by Inventor Gum-Hyun Shin

Gum-Hyun Shin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polarity exchanger and ion implanter having the same
    Patent number: 6903336
    Abstract: A polarity exchanger and ion implanter include a stripping canal for passing an ion beam therethrough, a gas supply unit for providing a stripping gas into the stripping canal to change a polarity of the ion beam, a gas circulation unit for circulating the stripping gas, a flow meter for measuring a flow rate of the stripping gas, an ammeter for measuring a driving current applied to the gas circulation unit for operating the gas circulation unit, and a monitoring unit for generating a control signal to control a process for changing the polarity of the ion beam in accordance with the measured flow rate of the stripping gas and the measured driving current. The polarity exchanger and ion implanter having the polarity exchanger may prevent generation of metallic contaminants caused by a flow rate variation of the stripping gas or deterioration of a component of the gas circulation unit.
    Type: Grant
    Filed: December 10, 2003
    Date of Patent: June 7, 2005
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Gyeong-Su Keum, Gum-Hyun Shin, Hyung-Sik Hong, Kyue-Sang Choi, Chung-Hun Park
  • Polarity exchanger and ion implanter having the same
    Publication number: 20040113100
    Abstract: A polarity exchanger and ion implanter include a stripping canal for passing an ion beam therethrough, a gas supply unit for providing a stripping gas into the stripping canal to change a polarity of the ion beam, a gas circulation unit for circulating the stripping gas, a flow meter for measuring a flow rate of the stripping gas, an ammeter for measuring a driving current applied to the gas circulation unit for operating the gas circulation unit, and a monitoring unit for generating a control signal to control a process for changing the polarity of the ion beam in accordance with the measured flow rate of the stripping gas and the measured driving current. The polarity exchanger and ion implanter having the polarity exchanger may prevent generation of metallic contaminants caused by a flow rate variation of the stripping gas or deterioration of a component of the gas circulation unit.
    Type: Application
    Filed: December 10, 2003
    Publication date: June 17, 2004
    Inventors: Gyeong-Su Keum, Gum-Hyun Shin, Hyung-Sik Hong, Kyue-Sang Choi, Chung-Hun Park