Patents by Inventor Gun Sari Mari BERGLUND

Gun Sari Mari BERGLUND has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9208989
    Abstract: A charged particle lithography system for transferring a pattern onto the surface of a target, such as a wafer, comprising a charged particle source adapted for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam, the converging means comprising a first electrode, and an aperture array element comprising a plurality of apertures, the aperture array element forming a second electrode, wherein the system is adapted for creating an electric field between the first electrode and the second electrode.
    Type: Grant
    Filed: November 14, 2011
    Date of Patent: December 8, 2015
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Alexander Hendrik Vincent Van Veen, Yanxia Zhang, Gun Sari Mari Berglund, Pieter Kruit
  • Publication number: 20120145915
    Abstract: A charged particle lithography system for transferring a pattern onto the surface of a target, such as a wafer, comprising a charged particle source adapted for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam, the converging means comprising a first electrode, and an aperture array element comprising a plurality of apertures, the aperture array element forming a second electrode, wherein the system is adapted for creating an electric field between the first electrode and the second electrode.
    Type: Application
    Filed: November 14, 2011
    Publication date: June 14, 2012
    Applicant: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Alexander Hendrik Vincent VAN VEEN, Yanxia ZHANG, Gun Sari Mari BERGLUND, Pieter KRUIT