Abstract: A protective-film forming composition that can form a protective film having excellent resistance to a semiconductor wet etching solution, that enables dry etching at a high etching speed to achieve a high etch rate (ER), and that can also be effectively used as a resist underlayer-film forming composition. The protective-film forming composition against the semiconductor wet etching solution contains (A) a compound or polymer having an epoxy structure represented by the following Formula (I), (B) a compound having a thiol structure, and (C) a solvent, in Formula (I), * represents a binding site; n represents 1 or 2; and when n=1, X represents an ether bond, an ester bond, or an amide bond, and when n=2, X represents a nitrogen atom or an amide bond.

Abstract: A resist underlayer film exhibits excellent removability in a wet etching chemical liquid while mainly exhibiting excellent resistance to a resist solvent or a resist developer. A composition for forming a resist underlayer film for i-line contains a reaction product of a bifunctional or higher glycidyl ester type epoxy resin and a compound A represented by the following Formula (A), and a solvent. (In Formula (A), R1 represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or an aryl group having 6 to 40 carbon atoms, X represents an alkyl group having 1 to 10 carbon atoms, a hydroxy group, an alkoxy group having 1 to 10 carbon atoms, an alkoxycarbonyl group having 1 to 10 carbon atoms, a halogen atom, a cyano group, a nitro group, or a combination thereof, and n represents an integer from 0 to 4.

Abstract: A composition for forming a protective film capable of forming a protective film excellent in resistance to a semiconductor wet etchant such as a basic hydrogen peroxide solution or an acidic hydrogen peroxide solution, which exhibits excellent resistance also to a resist solvent and can be effectively used also as a resist underlayer film-forming composition. A protective film-forming composition against a semiconductor wet etchant, including: (A) a compound represented by the following formula (A); and (B) a solvent. (In the formula (A), n represents an integer of 1 to 10, and when n is 2, X represents a sulfinyl group, a sulfonyl group, an ether group or a C2-50 divalent organic group, and when n is an integer other than 2, X represents a C2-50 n-valent organic group, Y represents —CH2CH(OH)CH2OC(?O)CH2(CH2)t—, —CH2CH(OH)CH2OC(?O)C(CN)(?CH)—, and t represents an integer of 1 to 6.

Abstract: A resist underlayer film-forming composition having a dramatically improved crosslinking ability over conventional compositions, and further, a resist underlayer film-forming composition that crosslinks with a component of a resist material, in order to improve the adhesion of a resist underlayer film to a resist pattern. A resist underlayer film-forming composition for lithography including a copolymer having a structural unit of formula (1) and a structural unit of formula (2): (wherein each R1 is independently a hydrogen atom or a methyl group; each R2 is independently a C1-3 alkylene group; R3 is a single bond or a methylene group; A is a linear, branched, or cyclic aliphatic group having a carbon atom number of 1 to 12 and optionally having a substituent, or a C6-16 aromatic or heterocyclic group optionally having a substituent; and Pr is a protecting group); a crosslinking agent; an organic acid catalyst; and a solvent.

Abstract: An automated vehicle inspection system includes a diagnostic terminal mounted in a vehicle and connected to an engine control unit (ECU) of the vehicle, sequentially operating individual electric components through the ECU based on stored electric component inspection items while the vehicle passes through a watertight booth and receiving individual operating currents measured to determine whether the electric components normally operate, a transceiver connecting to the diagnostic terminal and a wireless diagnostic communication network through an antenna disposed in the watertight booth process line, and an inspector recognizing a vehicle ID of a vehicle that enters the watertight booth, transmitting inspection items according to a vehicle type and specification of the vehicle ID to the diagnostic terminal through the diagnostic communication network, and recognizing a vehicle ID of a vehicle that leaves the watertight booth to collect inspection results determined in the diagnostic terminal.

Abstract: An automated vehicle inspection system utilizing a watertight booth process of a manufacturing plant includes a diagnostic terminal mounted in a vehicle and connected to an engine control unit (ECU) of the vehicle through vehicle communication, sequentially operating individual electric components through the ECU based on a stored electric component inspection items while the vehicle passes through a watertight booth and receiving individual operating currents measured accordingly to determine whether the electric components normally operate, a transceiver connecting the diagnostic terminal and wireless diagnostic communication through an antenna disposed in the watertight booth process, and an inspector recognizing a vehicle ID of a vehicle that enters the watertight booth, transmitting inspection items according to a vehicle type and specification of the vehicle ID to the diagnostic terminal through the diagnostic communication, recognizing a vehicle ID of a vehicle that leaves the watertight booth to colle

Abstract: A novel monothioglycoluril compound and a novel dithioglycoluril compound. A thioglycoluril compound of the following Formula (1): (wherein X is an oxygen atom or a sulfur atom, and four Rs are each a hydrogen atom, a linear, branched, or cyclic alkyl group having a carbon atom number of 1 to 4, a phenyl group, a naphthyl group, a benzyl group, or a C3-9 alkyl group having at least one ether bond on the main chain).

Abstract: A metal adsorption agent including a chelating agent (A) and a chelating agent (B), wherein the chelating agent (A) is a metal adsorption agent containing a carrier having a glucamine-type functional group, and the chelating agent (B) is a metal adsorption agent containing a carrier having a thiol group, a thiourea group, an amino group, a triazabicyclodecene-inducing group, a thiouronium group, an imidazole group, a sulfonate group, a hydroxy group, an aminoacetate group, an amidoxime group, an aminophosphate group, or any combination of these groups. The carrier of each of the chelating agent (A) and the chelating agent (B) may be silica, a silica component-containing substance, polystyrene, or crosslinked porous polystyrene. The solution may contain water or an organic solvent.

Abstract: A novel monothioglycoluril compound and a novel dithioglycoluril compound. A thioglycoluril compound of the following Formula (1): (wherein X is an oxygen atom or a sulfur atom, and four Rs are each a hydrogen atom, a linear, branched, or cyclic alkyl group having a carbon atom number of 1 to 4, a phenyl group, a naphthyl group, a benzyl group, or a C3-9 alkyl group having at least one ether bond on the main chain).

Abstract: A novel monothioglycoluril compound and a novel dithioglycoluril compound. A thioglycoluril compound of the following Formula (1): (wherein X is an oxygen atom or a sulfur atom, and four Rs are each a hydrogen atom, a linear, branched, or cyclic alkyl group having a carbon atom number of 1 to 4, a phenyl group, a naphthyl group, a benzyl group, or a C3-9 alkyl group having at least one ether bond on the main chain).

Abstract: There are provided novel glycolurils, and methods for producing the same.

Abstract: There are provided a novel isocyanurate compound having a glycidyl group as a substituent to be bonded to a nitrogen atom. A monoglycidyl isocyanurate compound of the following Formula (1), (2), or (3). (wherein two R1s are each a C2-10 alkyl group, two R2s are each a C1-5 alkylene group, two R3s are each a C1-2 alkyl group, two R4s are each a C1-2 alkylene group, and two R5s are each a C1-2 alkyl group).

Abstract: There is provided a novel isocyanuric acid derivative having two alkoxyalkyl groups and having a trialkoxysilyl group introduced therein, and a method for producing the isocyanuric acid derivative. An isocyanuric acid derivative of formula (1): wherein R1 is a methyl group or an ethyl group; two R2s are each a C1-2 alkylene group; and two R3s are each a methyl group, an ethyl group, or a C2-4 alkoxyalkyl group, which may be liquid at ambient temperature and ambient pressure.

Abstract: A novel isocyanuric acid derivative having two alkoxyalkyl groups and having a trialkoxysilyl group introduced therein, and a method for producing the isocyanuric acid derivative. An isocyanuric acid derivative of formula (1): wherein R1 is a methyl group or an ethyl group; two R2s are each a C1-2 alkylene group; and two R3s are each a methyl group, an ethyl group, or a C2-4 alkoxyalkyl group, which may be liquid at ambient temperature and ambient pressure.

Abstract: A resist underlayer film-forming composition having a dramatically improved crosslinking ability over conventional compositions, and further, a resist underlayer film-forming composition that crosslinks with a component of a resist material, in order to improve the adhesion of a resist underlayer film to a resist pattern. A resist underlayer film-forming composition for lithography including a copolymer having a structural unit of formula (1) and a structural unit of formula (2): (wherein each R1 is independently a hydrogen atom or a methyl group; each R2 is independently a C1-3 alkylene group; R3 is a single bond or a methylene group; A is a linear, branched, or cyclic aliphatic group having a carbon atom number of 1 to 12 and optionally having a substituent, or a C6-16 aromatic or heterocyclic group optionally having a substituent; and Pr is a protecting group); a crosslinking agent; an organic acid catalyst; and a solvent.

Abstract: A novel monothioglycoluril compound and a novel dithioglycoluril compound. A thioglycoluril compound of the following Formula (1): (wherein X is an oxygen atom or a sulfur atom, and four Rs are each a hydrogen atom, a linear, branched, or cyclic alkyl group having a carbon atom number of 1 to 4, a phenyl group, a naphthyl group, a benzyl group, or a C3-9 alkyl group having at least one ether bond on the main chain).

Abstract: There are provided novel glycolurils, and methods for producing the same.

Abstract: A novel monothioglycoluril compound and a novel dithioglycoluril compound. A thioglycoluril compound of the following Formula (1): (wherein X is an oxygen atom or a sulfur atom, and four Rs are each a hydrogen atom, a linear, branched, or cyclic alkyl group having a carbon atom number of 1 to 4, a phenyl group, a naphthyl group, a benzyl group, or a C3-9 alkyl group having at least one ether bond on the main chain).

Abstract: There is provided a highly conductive and good silicon thin film which is obtained by applying a coating-type polysilane composition prepared by use of a polysilane having a large weight average molecular weight to a substrate, followed by baking. A polysilane having a weight average molecular weight of 5,000 to 8,000. The polysilane may be a polymer of cyclopentasilane. A silicon film obtained by applying a polysilane composition in which the polysilane is dissolved in a solvent to a substrate, and baking the substrate at 100° C. to 425° C. The cyclopentasilane may be polymerized in the presence of a palladium catalyst supported on a polymer. The palladium catalyst supported on a polymer may be a catalyst in which palladium as a catalyst component is immobilized on a functional polystyrene. The palladium may be a palladium compound or a palladium complex.

Abstract: A method of producing a silicon hydride oxide-containing organic solvent (coating solution) is provided with which a silicon hydride oxide coating film can be formed on a substrate. Using the silicon hydride oxide-containing organic solvent makes it unnecessary to place a coating solution in non-oxidizing atmosphere at the time of coating or to heat the substrate after coating because the silicon hydride oxide is formed in the coating solution before it is coated. The method includes blowing an oxygen-containing gas through an organic solvent containing a silicon hydride or a polymer thereof. The silicon hydride oxide may contain a proportion of (residual Si-H groups)/(Si-H groups before oxidation) of 1 to 40 mol %. The silicon hydride can be obtained by reacting a cyclic silane with a hydrogen halide in the presence of an aluminum halide, and reducing the obtained cyclic halosilane.