Patents by Inventor Gunter Antesberger

Gunter Antesberger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask with programmed defects and method for the fabrication thereof
    Patent number: 7045254
    Abstract: A mask, and in particular a phase shift product mask, utilizes predetermined defects being produced during the fabrication thereof in the so-called “second layer” process. The defects are identified by markers in their direct vicinity. The markers are quadrangular and indicate, by virtue of their number in combination with their configuration, information about the respectively assigned defect, such as, for example, defect type, defect size, etc.
    Type: Grant
    Filed: December 2, 2002
    Date of Patent: May 16, 2006
    Assignee: Infineon Technologies AG
    Inventors: Wolfgang Dettmann, Gunter Antesberger, Jan Heumann, Mario Hennig
  • Mask with programmed defects and method for the fabrication thereof
    Publication number: 20030134206
    Abstract: A mask, and in particular a phase shift product mask, utilizes predetermined defects being produced during the fabrication thereof in the so-called “second layer” process. The defects are identified by markers in their direct vicinity. The markers are quadrangular and indicate, by virtue of their number in combination with their configuration, information about the respectively assigned defect, such as, for example, defect type, defect size, etc.
    Type: Application
    Filed: December 2, 2002
    Publication date: July 17, 2003
    Inventors: Wolfgang Dettmann, Gunter Antesberger, Jan Heumann, Mario Hennig