Patents by Inventor Gunther Detlef

Gunther Detlef has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020163735
    Abstract: Disclosed are systems for, and methods of forming and applying 40 micron or greater diameter, substantially radially homogeneous, relatively high, (eg. 30-60 or greater J/cm 2), energy density, preferably 200-380 nm UV wavelength, (typically Nd-YAG Iraser produced 213 nm or 266 nm wavelength), electromagnetic radiation laser pulse(s), or equivalent in a continuous wave, to uniformly substantially purely optically ablate material from sample systems; coupled with analysis thereof in (ICP-OES), (ICP-MS), (MIP-OES), (MIP-MS) or other plasma based analysis systems, with relative freedom from calibration errors arising from element fractionation.
    Type: Application
    Filed: January 10, 2001
    Publication date: November 7, 2002
    Inventors: Gunther Detlef, Ingo Horn, Marcel Guillong