Abstract: A wafer process for molded chip scale package (MCSP) comprises: depositing metal bumps on bonding pads of chips on a wafer; forming a first packaging layer at a front surface of the wafer to cover the metal bumps; forming an un-covered ring at an edge of the wafer to expose two ends of each scribe line of a plurality of scribe lines; thinning the first packaging layer to expose metal bumps; forming cutting grooves; grinding a back surface of the wafer to form a recessed space and a support ring at the edge of the wafer; depositing a metal seed layer at a bottom surface of the wafer in the recessed space; cutting off an edge portion of the wafer; flipping and mounting the wafer on a substrate; depositing a metal layer covering the metal seed layer; removing the substrate from the wafer; and separating individual chips from the wafer by cutting through the first packaging layer, the wafer, the metal seed layers and the metal layers along the scribe lines.

Abstract: A wafer process for molded chip scale package (MCSP) comprises: depositing metal bumps on bonding pads of chips on a wafer; forming a first packaging layer at a front surface of the wafer to cover the metal bumps; forming an un-covered ring at an edge of the wafer to expose two ends of each scribe line of a plurality of scribe lines; thinning the first packaging layer to expose metal bumps; forming cutting grooves; grinding a back surface of the wafer to form a recessed space and a support ring at the edge of the wafer; depositing a metal seed layer at a bottom surface of the wafer in the recessed space; cutting off an edge portion of the wafer; flipping and mounting the wafer on a substrate; depositing a metal layer covering the metal seed layer; removing the substrate from the wafer; and separating individual chips from the wafer by cutting through the first packaging layer, the wafer, the metal seed layers and the metal layers along the scribe lines.

Abstract: A wafer process for MCSP comprises: depositing a metal bump on bonding pads of chips; forming a first packaging layer at front surface of wafer covering metal bumps while forming an un-covered ring at the edge of wafer to expose the ends of each scribe line located between two adjacent chips; thinning first packaging layer to expose metal bumps; grinding back surface of wafer to form a recessed space and a support ring at the edge of the wafer; depositing a metal seed layer and a thick metal layer at bottom surface of wafer in recessed space in a sequence; cutting off the edge portion of wafer; and separating individual chips from wafer by cutting through first packaging layer, the wafer and the metal seed and metal layers along the scribe line.

Abstract: A wafer process for MCSP comprises: depositing a metal bump on bonding pads of chips; forming a first packaging layer at front surface of wafer covering metal bumps while forming an un-covered ring at the edge of wafer to expose the ends of each scribe line located between two adjacent chips; thinning first packaging layer to expose metal bumps; grinding back surface of wafer to form a recessed space and a support ring at the edge of the wafer; depositing a metal seed layer and a thick metal layer at bottom surface of wafer in recessed space in a sequence; cutting off the edge portion of wafer; and separating individual chips from wafer by cutting through first packaging layer, the wafer and the metal seed and metal layers along the scribe line.

Abstract: A semiconductor package is provided with an Aluminum alloy lead-frame without noble metal plated on the Aluminum base lead-frame. Aluminum alloy material with proper alloy composition and ratio for making an aluminum alloy lead-frame is provided. The aluminum alloy lead-frame is electroplated with a first metal electroplating layer, a second electroplating layer and a third electroplating layer in a sequence. The lead-frame electroplated with the first, second and third metal electroplating layers is then used in the fabrication process of a power semiconductor package including chip connecting, wire bonding, and plastic molding. After the molding process, the area of the lead-frame not covered by the molding compound is electroplated with a fourth metal electroplating layer that is not easy to be oxidized when exposing to air.

Abstract: A semiconductor package is provided with an Aluminum alloy lead-frame without noble metal plated on the Aluminum base lead-frame. Aluminum alloy material with proper alloy composition and ratio for making an aluminum alloy lead-frame is provided. The aluminum alloy lead-frame is electroplated with a first metal electroplating layer, a second electroplating layer and a third electroplating layer in a sequence. The lead-frame electroplated with the first, second and third metal electroplating layers is then used in the fabrication process of a power semiconductor package including chip connecting, wire bonding, and plastic molding. After the molding process, the area of the lead-frame not covered by the molding compound is electroplated with a fourth metal electroplating layer that is not easy to be oxidized when exposing to air.