Patents by Inventor Guo Wang
Guo Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6667527Abstract: In at least one embodiment, the invention is a temperature sensor having a temperature sensitive material positioned within a shell. The shell has a first section and a second section, which are attached together by a non-adhesive bond. The non-adhesive bond being an atomic bond, such as a diffusion bond. The temperature sensitive material is capable of emitting a radiation signal which varies in its magnitude and character as the material's temperature changes. The shell allows transmission of the radiation signal through the shell to an external processor. Analysis of the emitted radiation signal by the processor can provide a temperature measurement. The temperature sensitive material is a phosphorescent, such as a phosphor. The shell may be made of a material which can be diffusion bonded, such materials include a silicon comprising material, a glass, a plastic, a sapphire and a quartz.Type: GrantFiled: May 10, 2002Date of Patent: December 23, 2003Assignee: Applied Materials, IncInventors: Brian Lue, Tetsuya Ishikawa, Liang-Guo Wang
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Publication number: 20030209773Abstract: In at least one embodiment, the invention is a temperature sensor having a temperature sensitive material positioned within a shell. The shell has a first section and a second section, which are attached together by a non-adhesive bond. The non-adhesive bond being an atomic bond, such as a diffusion bond. The temperature sensitive material is capable of emitting a radiation signal which varies in its magnitude and character as the material's temperature changes. The shell allows transmission of the radiation signal through the shell to an external processor. Analysis of the emitted radiation signal by the processor can provide a temperature measurement. The temperature sensitive material is a phosphorescent, such as a phosphor. The shell may be made of a material which can be diffusion bonded, such materials include a silicon comprising material, a glass, a plastic, a sapphire and a quartz.Type: ApplicationFiled: May 10, 2002Publication date: November 13, 2003Applicant: Applied Materials, Inc.Inventors: Brian Lue, Tatsuya Ishikawa, Liang-Guo Wang
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Publication number: 20030206325Abstract: A multi-gas sensor is provided which modulates a polarized light beam over a broadband of wavelengths between two alternating orthogonal polarization components. The two orthogonal polarization components of the polarization modulated beam are directed along two distinct optical paths. At least one optical path contains one or more spectral discrimination means, with each spectral discrimination means having spectral absorption features of one or more gases of interest being measured. The two optical paths then intersect, and one orthogonal component of the intersected components is transmitted and the other orthogonal component is reflected. The combined polarization modulated beam is partitioned into one or more smaller spectral regions of interest where one or more gases of interest has an absorption band.Type: ApplicationFiled: June 2, 2003Publication date: November 6, 2003Inventors: Glen W. Sachse, Liang-Guo Wang, Peter J. Lebel, Tommy C. Steele, Mauro Rana
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Patent number: 6642489Abstract: A conduit has a heating system disposed therein. The heating system generates heat in response to magnetic flux generated by an inductive coil. The heating system has a heat transfer element and a plurality of ferromagnetic elements. The heat transfer element may be displaced within the conduit to control the amount of heat generated.Type: GrantFiled: January 9, 2001Date of Patent: November 4, 2003Assignee: Applied Materials, Inc.Inventors: Kartik Ramaswamy, Dennis S. Grimard, Philip M. Salzman, Liang-Guo Wang, Kwok Manus Wong
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Patent number: 6494958Abstract: A process chamber 110 capable of processing a substrate 30 in a plasma of process gas. The chamber 110 comprises a support 200 having a dielectric 210 covering an electrode 220 and a conductor 230 below the electrode 220. A voltage supply 180 supplies a gas energizing voltage to the conductor 220, and the conductor is adapted to capacitively couple the voltage to the electrode 220 to energize the process gas. Alternatively, the voltage may be supplied to the electrode 220 through a connector 195 which can capacitively couple with the conductor 230. A DC power supply 190 may also provide an electrostatic chucking voltage to the electrode 220. In one version, the conductor 230 comprises an interposer 280.Type: GrantFiled: June 29, 2000Date of Patent: December 17, 2002Assignee: Applied Materials Inc.Inventors: Shamouil Shamouilian, Jon M. McChesney, Kwok Manus Wong, Liang-Guo Wang, Alexander M. Veytser, Dennis S. Grimard
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Patent number: 6481886Abstract: Apparatus for measuring wafer support assembly temperature in a semiconductor wafer processing system. The apparatus is a modular plug that is mounted to the support assembly. The plug contains a photoluminescent material that exhibits a decay in luminescence after an excitement which is indicative of the temperature of the support assembly.Type: GrantFiled: February 24, 2000Date of Patent: November 19, 2002Assignee: Applied Materials Inc.Inventors: Kadthala R. Narendrnath, Liang-Guo Wang, Shamouil Shamouilian, Paul E. Luscher, Hamid Noorbakhsh
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Patent number: 6478924Abstract: A process chamber 110 capable of processing a substrate 50 in a plasma comprises a dielectric 210 covering a first electrode 220 and a second electrode 230, a conductor 250 supporting the dielectric 210, and a voltage supply 170 to supply an RF voltage to the first electrode 220 or the second electrode 230 in the dielectric 210. The first electrode 220 capacitively couples with a process electrode 225 to energize process gas in the process chamber 110 and RF voltage applied to the second electrode 230 is capacitively coupled to the conductor 250 and through a collar 260 or the second electrode 230 is directly capacitively coupled through the collar 260.Type: GrantFiled: March 7, 2000Date of Patent: November 12, 2002Assignee: Applied Materials, Inc.Inventors: Shamouil Shamouilian, Arnold Kholodenko, Kwok Manus Wong, Liang-Guo Wang, Alexander M. Veytser, Dennis S. Grimard
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Patent number: 6438431Abstract: Briefly, a preferred embodiment of the present invention includes an apparatus for tuning a regulator in a process controller. The digitized output from a standard relay and a parasitic relay are fed through digital to analog converter providing signals at 0.5&ohgr;c, &ohgr;c and 1.5&ohgr;c to the process, where &ohgr;c is the process critical frequency. The apparatus records the digitized relay output u′ and the digitized process output y′ until stationary oscillations are reached. The outputs u′ and y′ are then used to calculate the process frequency response at 0.50&ohgr;c, &ohgr;c and 1.5&ohgr;c. This data is then used to design the regulator, the output of which is converted to analog form and inputted to control the process.Type: GrantFiled: August 12, 1998Date of Patent: August 20, 2002Assignee: National University of SingaporeInventors: Qing-Guo Wang, Chang Chieh Hang, Qiang Bi
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Publication number: 20020111758Abstract: A simple yet effective and robust identification method is presented using process step responses for process identification that can provide a continuous transfer function with time-delay without iteration. A cascade relay provides accurate and reliable more points on the process frequency response. The internal model principle is employed to design single-loop controller of PID or high-order types with best achievable control performance for controller tuning, e.g. both single and multivariable cases are covered. The process identification and control design portions can be easily integrated into a control system auto-tuning package. Further, a general control scheme for disturbance rejection is given which can significantly improve disturbance rejection performance over conventional feedback systems with time delays. Practical issues such as noises, real-time implementation and tuning guidelines are also provided.Type: ApplicationFiled: October 18, 2001Publication date: August 15, 2002Inventors: Qing-Guo Wang, Tong-Heng Lee, Yong Zhang, Yu Zhang, Xue-Ping Yang
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Publication number: 20020096257Abstract: A plasma processing apparatus and a method of operating a plasma processing apparatus are disclosed. In one embodiment, a first RF signal at a carrier frequency and a second RF signal at a second frequency are generated. An amplitude modulated signal is formed by modulating the first RF signal with the second RF signal. A plasma is generated within the plasma processing chamber using the amplitude modulated signal. Generating plasma using a frequency modulated signal is also disclosed.Type: ApplicationFiled: January 22, 2001Publication date: July 25, 2002Applicant: Applied Materials, Inc.Inventors: Liang-Guo Wang, Kwok M. Wong, Shamouil Shamouilian, Kartik Ramaswamy
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Publication number: 20020088797Abstract: A conduit has a heating system disposed therein. The heating system generates heat in response to magnetic flux generated by an inductive coil. The heating system comprises a transfer element and a plurality of ferromagnetic elements. The heat transfer element may be displaced within the conduit to control the amount of heat generated.Type: ApplicationFiled: January 9, 2001Publication date: July 11, 2002Applicant: Applied Materials, Inc.Inventors: Kartik Ramaswamy, Dennis S. Grimard, Philip M. Salzman, Liang-Guo Wang, Kwok Manus Wong
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Publication number: 20020066292Abstract: There is provided robust diameter-controlled optical fiber during optical fiber drawing process and an optical fiber drawing process which comprises drawing the optical fiber from a perform therefor under tension to form the optical fiber while heating and melting the preform, wherein an outer diameter of the preform is measured (at a safe position immediately) above the furnace, an outer diameter of the optical fiber on which no coating has been provided is measured at one process position or two process positions before coating, and drawing conditions are robustly controlled based on the deviation of the measured optical fiber diameter data and the measured preform diameter data from a preselected outer diameter of the optical fiber and a preselected outer diameter of the preform.Type: ApplicationFiled: November 20, 2001Publication date: June 6, 2002Inventor: Sheng-Guo Wang
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Patent number: 6151203Abstract: A semiconductor wafer chuck for retaining a semiconductor wafer during semiconductor wafer processing in a semiconductor wafer processing system including a connector connecting DC chucking voltage and RF biasing power to an electrode embedded in the body of the chuck. The connector for the chuck includes two or more members joined by resilient banana connections. The connector may be adapted for use as a high temperature connector for an electrostatic chuck operated at an elevated temperature and such connector includes a thermal impedance for reducing the heat transferred from the chuck to the bottom of the connector.Type: GrantFiled: December 14, 1998Date of Patent: November 21, 2000Assignee: Applied Materials, Inc.Inventors: Shamouil Shamouilian, Ananda Kumar, Arnold Kholodenko, Dennis S. Grimard, Liang Guo Wang, Gerhard Schneider, Michael G. Chafin, Semyon Kats, Alexander Veytser, Senh Thach
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Patent number: 6094334Abstract: An electrostatic chuck 20 for holding a substrate 25 in a process chamber 30 comprises an electrostatic member 115 comprising a polymer 120 covering an electrode 125, the polymer 120 having a receiving surface 135 for receiving the substrate 25. A heater 130 abutting the polymer 120 is provided to heat the substrate 25 during processing of the substrate 25. The heater 130 has a resistance that is sufficiently low to heat the substrate 25 without causing excessive thermal degradation of the polymer 120.Type: GrantFiled: March 2, 1999Date of Patent: July 25, 2000Assignee: Applied Materials, Inc.Inventors: Surinder S. Bedi, Shamouil Shamouilian, Syed H. Askari, Arnold Kholodenko, Jon T. Clinton, Alexander M. Veytser, Liang-Guo Wang, You Wang
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Patent number: 6076951Abstract: A frequency domain auto-tuning and continually adapting control regulating apparatus is applied to a linear stable process. A FFT based identification is applied to non-transformable samples of transient signals to obtain simultaneous and accurate multiple-point estimates of a frequency domain approximation of the process transfer function as an estimate of a frequency response. A linear least squares multiple-point-fitting process provides regulator design parameters. A multiple-point-fitting transfer function modeling process is disclosed, and an adaptive regulator design process is applied to compensate for changes in the process set-point or for load disturbances. In addition, techniques are provided for auto-tuning of multivariable regulators.Type: GrantFiled: October 30, 1998Date of Patent: June 20, 2000Assignee: National University of SingaporeInventors: Qing Guo Wang, Chang Chieh Hang
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Patent number: 6008928Abstract: A multi-gas sensor is provided which modulates a polarized light beam over a broadband of wavelengths between two alternating orthogonal polarization components. The two orthogonal polarization components of the polarization modulated beam are directed along two distinct optical paths. At least one optical path contains one or more spectral discrimination element, with each spectral discrimination element having spectral absorption features of one or more gases of interest being measured. The two optical paths then intersect, and one orthogonal component of the intersected components is transmitted and the other orthogonal component is reflected. The combined polarization modulated beam is partitioned into one or more smaller spectral regions of interest where one or more gases of interest has an absorption band.Type: GrantFiled: February 5, 1998Date of Patent: December 28, 1999Assignee: The United States as represented by the Administrator of the National Aeronautics and Space AdministrationInventors: Glenn W. Sachse, Liang-guo Wang, Peter J. LeBel, Tommy C. Steele, Mauro Rana
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Patent number: 5451769Abstract: A high speed, metal-semiconductor-metal photodetector includes a pair of generally circular, electrically conductive electrodes formed on an optically active semiconductor layer. Various embodiments of the invention include a spiral, intercoiled electrode geometry and an electrode geometry having substantially circular, concentric electrodes which are interposed. These electrode geometries result in photodetectors with lower capacitances, dark currents and lower inductance which reduces the ringing seen in the optical pulse response.Type: GrantFiled: January 5, 1994Date of Patent: September 19, 1995Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space AdministrationInventors: James A. McAdoo, Elias Towe, William L. Bishop, Liang-Guo Wang
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Patent number: 5128797Abstract: A non-mechanical optical switch is provided for alternately switching a monochromatic or quasi-monochromatic light beam along two optical paths. A polarizer polarizes light into a single, e.g., vertical component which is then rapidly modulated into vertical and horizontal components by a polarization modulator. A polarization beam splitter then reflects one of these components along one path and transmits the other along the second path. In the specific application of gas filter correlation radiometry, one path is directed through a vacuum cell and one path is directed through a gas correlation cell containing a desired gas. Reflecting mirrors cause these two paths to intersect at a second polarization beam splitter which reflects one component and transmits the other to recombine them into a polarization modulated beam which can be detected by an appropriate single sensor.Type: GrantFiled: February 11, 1991Date of Patent: July 7, 1992Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space AdministrationInventors: Glen W. Sachse, Liang-Guo Wang
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Patent number: 5064823Abstract: Pentacyclic triterpenoid compounds such as .alpha. boswelic acid and its acetate, .beta.-boswellic acid and its acetate, which have an inhibitory effect on topoisomerase I and topoisomerase II, are disclosed. Compositions based on the pentacyclic triterpenoid compounds which can be used to treat various cancers in mammals are also disclosed.Type: GrantFiled: May 1, 1990Date of Patent: November 12, 1991Assignee: Research Triangle InstituteInventors: Yue-Wei Lee, Qi-Cheng Fang, Zhen-Guo Wang, De-Hua Li, C. E. Cook