Abstract: A shutter blade device for an exposure system of a lithography machine includes two shutter blades and two thermal insulation plates each attached to a respective one of the shutter blades. Attaching the thermal insulation plates to the respective shutter blades can hinder heat conduction from the blades to the rest of the shutter system, thus overcoming the problem of unstable performance or even burnout of the shutter system due to heat conduction from the shutter.

Abstract: A vertically-oriented lens assembly is disclosed which includes: a lens frame (1); an optical lens (2); two rigid supports (7) that are symmetric to each other with respect to a vertical central axis of the lens frame (1), both integral with the lens frame (1), and both in direct contact with the optical lens (2); an elastic support (4) disposed right under the optical lens (2) and brought into contact with the optical lens (2) by an adjusting screw (10); and a tightening screw (8) disposed on the top of the lens frame (1) for limiting radial displacement of the optical lens (2).

Abstract: A lithography projection objective (30) for focusing and imaging a pattern of a reticle onto a wafer including, from the reticle and along an optical axis: a first lens group G31 having a positive refractive power; a second lens group G32 having a positive refractive power; a third lens group G33 having a positive refractive power; and a fourth lens group G34 having a positive refractive power. These four lens groups form a 2× magnification design which has a partial field of view of not smaller than 100 mm; a wavelength band of I-line±5 nm can ensure a sufficient exposure light intensity. Moreover, the present invention also achieves, with a relatively simple structure, the demanded millimeter-level resolution as well as the correction of distortions, field curvatures, astigmatisms and chromatic aberrations in a large field.