Abstract: The present invention discloses a chemical mechanical polishing slurry, the chemical mechanical polishing slurry comprises silica abrasive particles, a corrosion inhibitor, a complexing agent, an oxidizer, and at least one kind of polyacrylic acid anionic surfactant. The polishing slurry of the present invention can decrease the removal rate of tantalum while increasing the removal rate of copper, and reduce copper dishing and dielectric erosion after polish.

Abstract: A laterally excited bulk wave resonator includes a supporting plate; a piezoelectric base having a back side attached to the supporting plate, in which a cavity is defined on a side of the supporting plate facing toward the piezoelectric base; a lower interdigital transducer provided at a back side of the piezoelectric base and located in the cavity; and an upper interdigital transducer provided at a front side of the piezoelectric base corresponding to the lower interdigital transducer. A first interdigital electrode of the lower interdigital transducer has a same polarity as a second interdigital electrode of the upper interdigital transducer at a position corresponding to the first interdigital electrode.

Abstract: The present application provides surface-modified novel targeting GVs (such as PH-GVs), lipid GVs and lipid targeting GVs, preparation methods therefor, and applications thereof in tumor diagnosis, imaging and treatment.

Abstract: An acoustic wave device and a preparation method therefor, and a temperature control method of the acoustic wave. The preparation method comprises: providing a first substrate and a second substrate (S110); forming an acoustic wave structure on the first substrate (S120); forming a temperature measuring resistor on the first substrate (S130); forming a TEC device on the second substrate (S140); and bonding the first substrate and the second substrate via metal fusion to produce the acoustic wave device (S150).

Abstract: The present invention discloses a chemical mechanical polishing slurry, the chemical mechanical polishing slurry comprises silica abrasive particles, a corrosion inhibitor, a complexing agent, an oxidizer, and at least one kind of polyacrylic acid anionic surfactant. The polishing slurry of the present invention can decrease the removal rate of tantalum while increasing the removal rate of copper, and reduce copper dishing and dielectric erosion after polish.

Abstract: A draft gauge, including: four balancing float tanks, a central control room, a first and second connection beam, a pump-valve chamber, a longitudinal connection beam, flexible centering brackets, a lateral connection beam, a scanning sensor, and a side scanner. The four balancing float tanks are arranged at two sides of a hull with every two balancing float tanks arranged at each side of the hull. The flexible centering brackets are fixed on an inner side of the first connection beam and on an inner side of the second connection beam, respectively. Every two balancing float tanks at opposite sides of the hull are connected via the lateral connection beam. The scanning sensors are evenly arranged on the lateral connection beam. The side scanner is arranged on one side of the balancing float tank in a close proximity to the hull.

Abstract: A draft gauge, including: four balancing float tanks, a central control room, a first and second connection beam, a pump-valve chamber, a longitudinal connection beam, flexible centering brackets, a lateral connection beam, a scanning sensor, and a side scanner. The four balancing float tanks are arranged at two sides of a hull with every two balancing float tanks arranged at each side of the hull. The flexible centering brackets are fixed on an inner side of the first connection beam and on an inner side of the second connection beam, respectively. Every two balancing float tanks at opposite sides of the hull are connected via the lateral connection beam. The scanning sensors are evenly arranged on the lateral connection beam. The side scanner is arranged on one side of the balancing float tank in a close proximity to the hull.