Abstract: A technique for providing information about defects in a mask pattern is described. In this technique, defects in the mask pattern may be determined based on differences between a calculated pattern produced at an image plane in the photolithographic process, when the mask pattern, illuminated by an associated source pattern, is at an object plane in the photolithographic process, and a target pattern that excludes the defects. Then the defect information may be provided to the user, such as a spatial map of the determined defects, where the spatial map is associated with at least the portion of the mask pattern.

Abstract: A technique for providing information about defects in a mask pattern is described. In this technique, defects in the mask pattern may be determined based on differences between a calculated pattern produced at an image plane in the photolithographic process, when the mask pattern, illuminated by an associated source pattern, is at an object plane in the photolithographic process, and a target pattern that excludes the defects. Then the defect information may be provided to the user, such as a spatial map of the determined defects, where the spatial map is associated with at least the portion of the mask pattern.

Abstract: A technique for selecting a subset of determined defects in a mask pattern is described. In this technique, defects in the mask pattern may be determined based on differences between a pattern produced at an image plane in a photolithographic process, when the mask pattern, illuminated by an associated source pattern, is at an object plane in the photolithographic process, and a target pattern that excludes the defects. These defects may be classified by associating them with types of geometric features in the target pattern and/or the mask pattern. Moreover, the subset may be selected by filtering the defects associated with the types of geometric features. For example, the subset may defects corresponding to the differences that exceed filtering values that are associated with the types of geometric features.

Abstract: A chaotic circuit for truly random number generation is provided. The chaotic dynamical system used in the circuit is implemented based on the charge redistribution of capacitors. The random number generator circuit is a switched network including four capacitors and eight switches that are controlled by two-phase non-overlapping clock signals. The two clocks turn on switches alternatively. The circuit further includes inverter chain and amplifier. When a first clock signal turns on, four capacitors are charged by the inverter chain and the amplifier that connected as a unity gain buffer. When a second clock signal turns on, the charges are redistributed. The voltage of output terminal of the amplifier is function of its previous status, and thus a random bit stream is generated at an output terminal of the inverter chain. A smaller core area and lower power consumption is provided since circuit is simpler and no resistor is required.