Patents by Inventor Gustavo R. Paz-Pujalt

Gustavo R. Paz-Pujalt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5032221
    Abstract: ITO is etched by a plasma containing CH.sub.3. gas.
    Type: Grant
    Filed: May 7, 1990
    Date of Patent: July 16, 1991
    Assignee: Eastman Kodak Company
    Inventors: Paul L. Roselle, Gustavo R. Paz-Pujalt, Ronald M. Wexler
  • Patent number: 5017551
    Abstract: A circuit element is disclosed comprised of a substrate and an electrically conductive layer located on the substrate. The electrically conductive layer is comprised of a crystalline rare earth alkaline earth copper oxide. The substrate is formed of a material which increases the electrical resistance of the conductive layer when in contact with the rare earth alkaline earth copper oxide during crystallization of the latter to an electrically conductive form. A barrier layer is interposed between the electrically conductive layer and the substrate. The barrier layer contains magnesium, a group IVA metal, or a platinum group metal, either in an elemental state or in the form of an oxide or silicide.
    Type: Grant
    Filed: March 30, 1989
    Date of Patent: May 21, 1991
    Assignee: Eastman Kodak Company
    Inventors: John A. Agostinelli, Jose M. Mir, Gustavo R. Paz-Pujalt, Mark Lelental, Ralph A. Nicholas, III
  • Patent number: 4950643
    Abstract: A metalorganic deposition method is disclosed for manufacturing a heavy pnictide superconducting oxide film on a substrate, in which a mixed metalorganic precursor is coated and heated to its thermal decomposition temperature to create an amorphous mixed metal oxide layer. The amorphous layer is then converted to a crystalline coating by further heating followed by cooling in the presence of oxygen.
    Type: Grant
    Filed: May 31, 1989
    Date of Patent: August 21, 1990
    Assignee: Eastman Kodak Company
    Inventors: John A. Agostinelli, Gustavo R. Paz-Pujalt, Arun K. Mehrotra, Liang-Sun Hung
  • Patent number: 4880770
    Abstract: A metalorganic deposition method is disclosed for manufacturing a superconducting oxide film on a substrate, in which a mixed metalorganic precursor is coated and heated to its thermal decomposition temperature to create an amorphous mixed metal oxide layer. The amorphous layer is then converted to a crystalline coating by further heating followed by cooling in the presence of O.sub.2 atmosphere.
    Type: Grant
    Filed: May 4, 1987
    Date of Patent: November 14, 1989
    Assignee: Eastman Kodak Company
    Inventors: Jose M. Mir, John A. Agostinelli, David L. Peterson, Gustavo R. Paz-Pujalt, Brian J. Higberg, Gopalan Rajeswaran