Patents by Inventor Guy Ben-Zvi
Guy Ben-Zvi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11832631Abstract: Taste-enhanced liquid, semi-solid and/or solid oil-based suspensions are provided, which consist of a carrier oil and edible solid particles (e.g., crystalline salt and/or sugar, and optionally spices) having median diameter of less than 15 ?m. The particles are reduced in size in the suspension, allowing enhancement of their organoleptic effects while reducing their amount to meet nutritional demands. The solid or semi-solid oil-derivatives comprise heterogeneous triglycerides of saturated fatty acids, including at least one saturated fatty acid having 12 carbons or more—selected to provide a required temperature-viscosity profile and/or a required melting temperature profile of the oil-derivative that corresponds to the food product. Also, non-oxidizing frying oil is provided, based on saturated fatty acids. The frying oil comprises triglycerides that include mostly or wholly saturated fatty acids, as well as small amounts of antioxidants that prevent residual oxidation of the oil during prolonged frying.Type: GrantFiled: January 7, 2022Date of Patent: December 5, 2023Assignee: Omega 3 Galilee Ltd.Inventors: Guy Ben-Zvi, Alisa Dunkel
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Publication number: 20220125066Abstract: Taste-enhanced liquid, semi-solid and/or solid oil-based suspensions are provided, which consist of a carrier oil and edible solid particles (e.g., crystalline salt and/or sugar, and optionally spices) having median diameter of less than 15 ?m. The particles are reduced in size in the suspension, allowing enhancement of their organoleptic effects while reducing their amount to meet nutritional demands. The solid or semi-solid oil-derivatives comprise heterogeneous triglycerides of saturated fatty acids, including at least one saturated fatty acid having 12 carbons or more—selected to provide a required temperature-viscosity profile and/or a required melting temperature profile of the oil-derivative that corresponds to the food product. Also, non-oxidizing frying oil is provided, based on saturated fatty acids. The frying oil comprises triglycerides that include mostly or wholly saturated fatty acids, as well as small amounts of antioxidants that prevent residual oxidation of the oil during prolonged frying.Type: ApplicationFiled: January 7, 2022Publication date: April 28, 2022Applicant: Omega 3 Galilee Ltd.Inventors: Guy BEN-ZVI, Alisa DUNKEL
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Publication number: 20220117250Abstract: Taste-enhanced liquid, semi-solid and/or solid oil-based suspensions are provided, which consist of a carrier oil and edible solid particles (e.g., crystalline salt and/or sugar, and optionally spices) having median diameter of less than 15 ?m. The particles are reduced in size in the suspension, allowing enhancement of their organoleptic effects while reducing their amount to meet nutritional demands. The solid or semi-solid oil-derivatives comprise heterogeneous triglycerides of saturated fatty acids, including at least one saturated fatty acid having 12 carbons or more—selected to provide a required temperature-viscosity profile and/or a required melting temperature profile of the oil-derivative that corresponds to the food product. Also, non-oxidizing frying oil is provided, based on saturated fatty acids. The frying oil comprises triglycerides that include mostly or wholly saturated fatty acids, as well as small amounts of antioxidants that prevent residual oxidation of the oil during prolonged frying.Type: ApplicationFiled: December 29, 2021Publication date: April 21, 2022Applicant: Omega 3 Galilee Ltd.Inventors: Guy BEN-ZVI, Alisa Dunkel
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Patent number: 9207530Abstract: A method includes generating, using a data processor, information showing variations of a parameter across a photo mask relative to an average value of the parameter measured at various locations on the photo mask. For example, the information can include data points, and each data point can be determined based on a ratio between a measurement value and an average of a plurality of measurement values.Type: GrantFiled: February 23, 2011Date of Patent: December 8, 2015Assignee: Carl Zeiss SMS Ltd.Inventors: Vladimir Dmitriev, Ofir Sharoni, Erez Graitzer, Igor Varvaruk, Guy Ben-Zvi
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Patent number: 9134112Abstract: A contribution to a wafer level critical dimension distribution from a scanner of a lithography system can be determined based on measured wafer level critical dimension uniformity distribution and a contribution to the wafer level critical dimension distribution from a photo mask. Light transmission (104) across the photo mask (162) can be measured, a transmittance variation distribution of the photo mask can be determined, and the contribution to the wafer level critical dimension distribution from the photo mask (162) can be determined (132) based on the transmittance variation distribution of the photo mask.Type: GrantFiled: February 23, 2011Date of Patent: September 15, 2015Assignee: Carl Zeiss SMS Ltd.Inventors: Ofir Sharoni, Vladimir Dmitriev, Eran Chason, Guy Ben-Zvi, Igor Varvaruk
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Patent number: 9034539Abstract: A system for processing a substrate includes a light source to provide light pulses, a stage to support a substrate, optics to focus the light pulses onto the substrate, a scanner to scan the light pulses across the substrate, a computer to control properties of the light pulses and the scanning of the light pulses such that color centers are generated in various regions of the substrate, and at least one of (i) an ultraviolet light source to irradiate the substrate with ultraviolet light or (ii) a heater to heat the substrate after formation of the color centers to stabilize a transmittance spectrum of the substrate.Type: GrantFiled: June 21, 2011Date of Patent: May 19, 2015Assignees: Carl Zeiss SMS GmbH, Carl Zeiss SMT GmbH, Carl Zeiss SMS Ltd.Inventors: Sergey Oshemkov, Ralph Klaesges, Markus Mengel, Vladimir Kruglyakov, Eitan Zait, Vladimir Dmitriev, Guy Ben-Zvi, Steven Labovitz
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Patent number: 8871409Abstract: A photo mask having a first set of patterns and a second set of patterns is provided in which the first set of patterns correspond to a circuit pattern to be fabricated on a wafer, and the second set of patterns have dimensions such that the second set of patterns do not contribute to the circuit pattern that is produced using a lithography process based on the first set of patterns under a first exposure condition. The critical dimension distribution of the photo mask is determined based on the second set of patterns that do not contribute to the circuit pattern produced using the lithography process based on the first set of patterns under the first exposure condition.Type: GrantFiled: July 25, 2011Date of Patent: October 28, 2014Assignee: Carl Zeiss SMS Ltd.Inventors: Rainer Pforr, Guy Ben-Zvi, Vladimir Dmitriev, Erez Graitzer
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Patent number: 8592770Abstract: Apparatus and method for transmittance mapping of an object which is at least partially transparent to deep ultraviolet radiation. The method comprises directing a wide-band deep ultraviolet radiation so as to illuminate different areas of an array of successive areas of the object; using an optical detector positioned on an opposite side of the object with respect to the radiation source detecting the wide-band deep ultraviolet radiation that emerges from the object; and processing signals from the optical detector to determine the transmittance of the radiation through the different areas of the array of successive areas of the object.Type: GrantFiled: July 10, 2008Date of Patent: November 26, 2013Assignee: Carl Zeiss SMS Ltd.Inventors: Guy Ben-Zvi, Eitan Zait, Vladimir J. Dmitriev, Steven M. Labovitz, Erez Graitzer, Ofir Sharoni
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Publication number: 20130295698Abstract: A photo mask having a first set of patterns and a second set of patterns is provided in which the first set of patterns correspond to a circuit pattern to be fabricated on a wafer, and the second set of patterns have dimensions such that the second set of patterns do not contribute to the circuit pattern that is produced using a lithography process based on the first set of patterns under a first exposure condition. The critical dimension distribution of the photo mask is determined based on the second set of patterns that do not contribute to the circuit pattern produced using the lithography process based on the first set of patterns under the first exposure condition.Type: ApplicationFiled: July 25, 2011Publication date: November 7, 2013Inventors: Rainer Pforr, Guy Ben-Zvi, Vladimir Dmitriev, Erez Graitzer
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Publication number: 20130209926Abstract: A system for processing a substrate includes a light source to provide light pulses, a stage to support a substrate, optics to focus the light pulses onto the substrate, a scanner to scan the light pulses across the substrate, a computer to control properties of the light pulses and the scanning of the light pulses such that color centers are generated in various regions of the substrate, and at least one of (i) an ultraviolet light source to irradiate the substrate with ultraviolet light or (ii) a heater to heat the substrate after formation of the color centers to stabilize a transmittance spectrum of the substrate.Type: ApplicationFiled: June 21, 2011Publication date: August 15, 2013Inventors: Sergey Oshemkov, Ralph Klaesges, Markus Mengel, Vladimir Kruglyakov, Eitan Zait, Vladimir Dmitriev, Guy Ben-Zvi, Steven Labovitz
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Patent number: 8421026Abstract: In general, in one aspect, a method includes determining a critical dimension (CD) distribution on a photomask by measuring deep Ultra-Violet (DUV) transmission across the photomask.Type: GrantFiled: January 2, 2009Date of Patent: April 16, 2013Assignee: Carl Zeiss SMS Ltd.Inventors: Guy Ben-Zvi, Vladimir Dmitriev, Eitan Zait, Erez Graitzer
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Publication number: 20130077101Abstract: A contribution to a wafer level critical dimension distribution from a scanner of a lithography system can be determined based on measured wafer level critical dimension uniformity distribution and a contribution to the wafer level critical dimension distribution from a photo mask. Light transmission (104) across the photo mask (162) can be measured, a transmittance variation distribution of the photo mask can be determined, and the contribution to the wafer level critical dimension distribution from the photo mask (162) can be determined (132) based on the transmittance variation distribution of the photo mask.Type: ApplicationFiled: February 23, 2011Publication date: March 28, 2013Inventors: Ofir Sharoni, Vladimir Dmitriev, Eran Chason, Guy Ben-Zvi, Igor Varvaruk
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Publication number: 20130028505Abstract: A method includes generating, using a data processor, information showing variations of a parameter across a photo mask relative to an average value of the parameter measured at various locations on the photo mask. For example, the information can include data points, and each data point can be determined based on a ratio between a measurement value and an average of a plurality of measurement values.Type: ApplicationFiled: February 23, 2011Publication date: January 31, 2013Inventors: Vladimir Dmitriev, Ofir Sharoni, Erez Graitzer, Igor Varvaruk, Guy Ben-Zvi
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Publication number: 20110122395Abstract: In general, in one aspect, a method includes determining a critical dimension (CD) distribution on a photomask by measuring deep Ultra-Violet (DUV) transmission across the photomask.Type: ApplicationFiled: January 2, 2009Publication date: May 26, 2011Inventors: Guy Ben-Zvi, Vladimir Dmitriev, Eitan Zait, Erez Graitzer
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Publication number: 20110101226Abstract: Apparatus and method for transmittance mapping of an object which is at least partially transparent to deep ultraviolet radiation. The method comprises directing a wide-band deep ultraviolet radiation so as to illuminate different areas of an array of successive areas of the object; using an optical detector positioned on an opposite side of the object with respect to the radiation source detecting the wide-band deep ultraviolet radiation that emerges from the object; and processing signals from the optical detector to determine the transmittance of the radiation through the different areas of the array of successive areas of the object.Type: ApplicationFiled: July 10, 2008Publication date: May 5, 2011Inventors: Guy Ben-Zvi, Eitan Zait, Vladimir J. Dmitriev, Steven M. Labovitz, Erez Graitzer, Ofir Sharoni
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Patent number: 7736819Abstract: A method for compensating for critical dimension (CD) variations of pattern lines of a wafer, by the correcting the CD of the corresponding photomask. The photomask comprises a transparent substrate having two substantially opposite surfaces, a first back surface and a second front surface on which front surface an absorbing coating is provided, on which the pattern lines were formed by removing the coating at the pattern lines. The method comprises: determining CD variations across regions of a wafer exposure field relating to the photomask; and providing Shading Elements (SE) within the substrate of the photomask in regions which correlates to regions of the wafer exposure field where CD variations greater than a predetermined target value were determined, whereby the shading elements attenuate light passing through the regions, so as to compensate for the CD variations on the wafer and hence provide and improved CD tolerance wafer.Type: GrantFiled: July 18, 2004Date of Patent: June 15, 2010Assignee: Pixer Technology LtdInventors: Eitan Zait, Vladimir Dmitriev, Nikolay N. Guletsky, Sergey Oshemkov, Guy Ben-Zvi
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Patent number: 7459242Abstract: A system and method for repairing a photomask (52) for use in a photolithography process is disclosed, the photomask (52), consisting of a substrate layer (38) and a chrome layer (36) over the substrate layer (38), having a defect (42) in the chrome layer (36), the method comprising: providing a pulsed laser source (1) for generating an ultra-short pulsed laser beam; providing optical elements for scanning, directing and focusing the pulsed laser beam at a desired target location; directing the pulsed laser beam through the substrate and focusing it on a target location located inside the substrate adjacent the defect (42) to write a diffractive optical element (34), thus changing the scattering properties of the substrate at the target location.Type: GrantFiled: December 12, 2002Date of Patent: December 2, 2008Assignee: Pixer Technology Ltd.Inventors: Eitan Zait, Vladimir J. Dmitriev, Sergey V Oshemkov, Nikolay N. Guletskiy, Guy Ben-Zvi
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Publication number: 20080165406Abstract: A reticle device is disclosed, comprising a transparent substrate provided with subsurface reticle design inscribed within the substrate.Type: ApplicationFiled: March 9, 2006Publication date: July 10, 2008Inventors: Ehud Galun, Nisim Hadar, Alon Tavory, Israel Vilenchik, Ephraim Argaman, Gidon Slosberg, Moshe Toker, Yosef Kigel, Guy Ben-Zvi, Rami Cohen, Vladimir Dmitriev, Sergey Oshemkov
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Publication number: 20070065729Abstract: A method for compensating for critical dimension (CD) variations of pattern lines of a wafer, by the correcting the CD of the corresponding photomask. The photomask comprises a transparent substrate having two substantially opposite surfaces, a first back surface and a second front surface on which front surface an absorbing coating is provided, on which the pattern lines were formed by removing the coating at the pattern lines. The method comprises: determining CD variations across regions of a wafer exposure field relating to the photomask; and providing Shading Elements (SE) within the substrate of the photomask in regions which correlates to regions of the wafer exposure field where CD variations greater than a predetermined target value were determined, whereby the shading elements attenuate light passing through the regions, so as to compensate for the CD variations on the wafer and hence provide and improved CD tolerance wafer.Type: ApplicationFiled: July 18, 2004Publication date: March 22, 2007Inventors: Eitan Zait, Vladimir Dmitriev, Nikolay Guletsky, Sergey Oshemkov, Guy Ben-Zvi
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Publication number: 20050084767Abstract: A system and method for repairing a photomask (52) for use in a photolithography process is disclosed, the photomask (52), consisting of a substrate layer (38) and a chrome layer (36) over the substrate layer (38), having a defect (42) in the chrome layer (36), the method comprising: providing a pulsed laser source (1) for generating an ultra-short pulsed laser beam; providing optical elements for scanning, directing and focusing the pulsed laser beam at a desired target location; directing the pulsed laser beam through the substrate and focusing it on a target location located inside the substrate adjacent the defect (42) to write a diffractive optical element (34), thus changing the scattering properties of the substrate at the target location.Type: ApplicationFiled: December 12, 2002Publication date: April 21, 2005Inventors: Eitan Zait, Vladimir Dmitriev, Sergey Oshemkov, Nikolay Guletskiv, Guy Ben-Zvi