Patents by Inventor Guy Comans

Guy Comans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sputtering apparatus including cathode with rotatable targets, and related methods
    Patent number: 11094513
    Abstract: Certain example embodiments relate to sputtering apparatuses that include a plurality of targets such that a first one or ones of target(s) may be used for sputtering in a first mode, while a second one or ones of target(s) may be used for sputtering in a second mode. Modes may be switched in certain example embodiments by rotating the position of the targets, e.g., such that one or more target(s) to be used protrude into the main chamber of the apparatus, while one or more target(s) to be unused are recessed into a body portion of a cathode of (e.g., integrally formed with) the sputtering apparatus. The targets may be cylindrical magnetic targets or planar targets. At least one target location also may be made to accommodate an ion beam source.
    Type: Grant
    Filed: February 18, 2020
    Date of Patent: August 17, 2021
    Assignee: GUARDIAN EUROPE S.À R.L.
    Inventors: Marcel Schloremberg, Guy Comans, Philippe Uselding
  • SPUTTERING APPARATUS INCLUDING CATHODE WITH ROTATABLE TARGETS, AND RELATED METHODS
    Publication number: 20200185205
    Abstract: Certain example embodiments relate to sputtering apparatuses that include a plurality of targets such that a first one or ones of target(s) may be used for sputtering in a first mode, while a second one or ones of target(s) may be used for sputtering in a second mode. Modes may be switched in certain example embodiments by rotating the position of the targets, e.g., such that one or more target(s) to be used protrude into the main chamber of the apparatus, while one or more target(s) to be unused are recessed into a body portion of a cathode of (e.g., integrally formed with) the sputtering apparatus. The targets may be cylindrical magnetic targets or planar targets. At least one target location also may be made to accommodate an ion beam source.
    Type: Application
    Filed: February 18, 2020
    Publication date: June 11, 2020
    Applicant: GUARDIAN EUROPE S.À R.L.
    Inventors: Marcel SCHLOREMBERG, Guy COMANS, Philippe USELDING
  • Sputtering apparatus including cathode with rotatable targets, and related methods
    Patent number: 10586689
    Abstract: Certain example embodiments relate to sputtering apparatuses that include a plurality of targets such that a first one or ones of target(s) may be used for sputtering in a first mode, while a second one or ones of target(s) may be used for sputtering in a second mode. Modes may be switched in certain example embodiments by rotating the position of the targets, e.g., such that one or more target(s) to be used protrude into the main chamber of the apparatus, while one or more target(s) to be unused are recessed into a body portion of a cathode of (e.g., integrally formed with) the sputtering apparatus. The targets may be cylindrical magnetic targets or planar targets. At least one target location also may be made to accommodate an ion beam source.
    Type: Grant
    Filed: July 31, 2009
    Date of Patent: March 10, 2020
    Assignee: GUARDIAN EUROPE S.A.R.L.
    Inventors: Marcel Schloremberg, Guy Comans, Philippe Uselding
  • ENDBLOCK FOR ROTATABLE TARGET WITH ELECTRICAL CONNECTION BETWEEN COLLECTOR AND ROTOR AT PRESSURE LESS THAN ATMOSPHERIC PRESSURE
    Publication number: 20180037984
    Abstract: An endblock for a rotatable sputtering target, such as a rotatable magnetron sputtering target, is provided. A sputtering apparatus, including one or more such endblock(s), includes locating the electrical contact(s) (e.g., brush(es)) between the collector and rotor in the endblock(s) in an area under vacuum (as opposed to in an area at atmospheric pressure).
    Type: Application
    Filed: October 18, 2017
    Publication date: February 8, 2018
    Inventors: Gilbert GALAN, Jean-Philippe USELDING, Guy COMANS, Marcel SCHLOREMBERG
  • Endblock for rotatable target with electrical connection between collector and rotor at pressure less than atmospheric pressure
    Patent number: 9809876
    Abstract: An endblock for a rotatable sputtering target, such as a rotatable magnetron sputtering target, is provided. A sputtering apparatus, including one or more such endblock(s), includes locating the electrical contact(s) (e.g., brush(es)) between the collector and rotor in the endblock(s) in an area under vacuum (as opposed to in an area at atmospheric pressure).
    Type: Grant
    Filed: January 13, 2014
    Date of Patent: November 7, 2017
    Assignee: Centre Luxembourgeois de Recherches pour le Verre et la Ceramique (C.R.V.C.) SaRL
    Inventors: Gilbert Galan, Jean-Philippe Uselding, Guy Comans, Marcel Schloremberg
  • ENDBLOCK FOR ROTATABLE TARGET WITH ELECTRICAL CONNECTION BETWEEN COLLECTOR AND ROTOR AT PRESSURE LESS THAN ATMOSPHERIC PRESSURE
    Publication number: 20150197847
    Abstract: An endblock for a rotatable sputtering target, such as a rotatable magnetron sputtering target, is provided. A sputtering apparatus, including one or more such endblock(s), includes locating the electrical contact(s) (e.g., brush(es)) between the collector and rotor in the endblock(s) in an area under vacuum (as opposed to in an area at atmospheric pressure).
    Type: Application
    Filed: January 13, 2014
    Publication date: July 16, 2015
    Applicant: Centre Luxembourgeois de Recherches pour le Verre et la Ceramique (C.R.V.C.) SaRL
    Inventors: Gilbert GALAN, Jean-Philippe USELDING, Guy COMANS, Marcel SCHLOREMBERG
  • Sputtering apparatus including cathode with rotatable targets, and related methods
    Publication number: 20110024284
    Abstract: Certain example embodiments relate to sputtering apparatuses that include a plurality of targets such that a first one or ones of target(s) may be used for sputtering in a first mode, while a second one or ones of target(s) may be used for sputtering in a second mode. Modes may be switched in certain example embodiments by rotating the position of the targets, e.g., such that one or more target(s) to be used protrude into the main chamber of the apparatus, while one or more target(s) to be unused are recessed into a body portion of a cathode of (e.g., integrally formed with) the sputtering apparatus. The targets may be cylindrical magnetic targets or planar targets. At least one target location also may be made to accommodate an ion beam source.
    Type: Application
    Filed: July 31, 2009
    Publication date: February 3, 2011
    Applicant: Centre Luxembourgeois de Recherches pour le Verre et la Ceramique S.A. (C.R.V.C.)
    Inventors: Marcel Schloremberg, Guy Comans, Philippe Uselding