Abstract: A process for electrodespositing a conductive material on a substrate is disclosed which comprises movably mounting the substrate in a first conductive liquid electroplating bath which contains the conductive material, maintaining substantially constant conditions of temperature and liquid circulation in the first bath, passing an electric current through the substrate and the first bath so as to deposit the conductive material on the substrate, periodically transferring the substrate to a second liquid bath, the second bath containing a liquid of the same composition or lower concentrations of dissolved ingredients as compared to the first bath, weighing the substrate when immersed in the second bath and calculating therefrom the weight in air of conductive material deposited, returning the substrate to the first bath, and continuing the plating in a series of stages of plating, weighing in liquid and plating until the desired deposit is built up.Apparatus for carrying on the method is also disclosed.