Patents by Inventor Guy Eristoff

Guy Eristoff has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9157145
    Abstract: A substrate processing system particularly suitable for fabricating solar cells. The system has a front end module transporting cassettes, each cassette holding a preset number of substrates therein; a loading module coupled to the front end module and having mechanism for loading substrates from the cassettes onto carriers; and a plurality of processing chambers coupled to each other in series, each having tracks for transporting the carriers directly from one chamber to the next; wherein selected chambers of the plurality of processing chambers comprise at least one combination source having a sputtering module and an evaporation module arranged linearly in the direction of travel of the carriers.
    Type: Grant
    Filed: July 29, 2009
    Date of Patent: October 13, 2015
    Assignee: INTEVAC, INC.
    Inventors: D. Guy Eristoff, Michael S. Barnes, Arthur C. Wall, Terry Bluck
  • Patent number: 8188560
    Abstract: An optical color sensor system is provided including providing a substrate having an optical sensor therein and forming a passivation layer over the substrate. The passivation layer is planarized and color filters are formed over the passivation layer. A planar transparent layer is formed over the color filters and microlenses are formed on the planar transparent layer over the color filters.
    Type: Grant
    Filed: September 30, 2008
    Date of Patent: May 29, 2012
    Assignee: GLOBALFOUNDRIES Singapore Pte. Ltd.
    Inventors: Guy Eristoff, Kian Siong Ang, Sung Woon Choo, Hao Wang
  • Publication number: 20100024731
    Abstract: A substrate processing system particularly suitable for fabricating solar cells. The system has a front end module transporting cassettes, each cassette holding a preset number of substrates therein; a loading module coupled to the front end module and having mechanism for loading substrates from the cassettes onto carriers; and a plurality of processing chambers coupled to each other in series, each having tracks for transporting the carriers directly from one chamber to the next; wherein selected chambers of the plurality of processing chambers comprise at least one combination source having a sputtering module and an evaporation module arranged linearly in the direction of travel of the carriers.
    Type: Application
    Filed: July 29, 2009
    Publication date: February 4, 2010
    Inventors: D. Guy ERISTOFF, Michael S. Barnes, Arthur C. Wall, Terry Bluck
  • Publication number: 20090026568
    Abstract: An optical color sensor system is provided including providing a substrate having an optical sensor therein and forming a passivation layer over the substrate. The passivation layer is planarized and color filters are formed over the passivation layer. A planar transparent layer is formed over the color filters and microlenses are formed on the planar transparent layer over the color filters.
    Type: Application
    Filed: September 30, 2008
    Publication date: January 29, 2009
    Applicant: CHARTERED SEMICONDUCTOR MANUFACTURING LTD.
    Inventors: Guy Eristoff, Kian Siong Ang, Sung Woon Choo, Hao Wang
  • Patent number: 7446386
    Abstract: An optical color sensor system is provided including providing a substrate having an optical sensor therein and forming a passivation layer over the substrate. The passivation layer is planarized and color filters are formed over the passivation layer. A planar transparent layer is formed over the color filters and microlenses are formed on the planar transparent layer over the color filters.
    Type: Grant
    Filed: October 15, 2005
    Date of Patent: November 4, 2008
    Assignee: Chartered Semiconductor Manufacturing Ltd.
    Inventors: Guy Eristoff, Kian Siong Ang, Sung Woon Choo, Hao Wang
  • Publication number: 20070085120
    Abstract: An optical color sensor system is provided including providing a substrate having an optical sensor therein and forming a passivation layer over the substrate. The passivation layer is planarized and color filters are formed over the passivation layer. A planar transparent layer is formed over the color filters and microlenses are formed on the planar transparent layer over the color filters.
    Type: Application
    Filed: October 15, 2005
    Publication date: April 19, 2007
    Applicant: Chartered Semiconductor Manufacturing Ltd.
    Inventors: Guy Eristoff, Kian Ang, Sung Choo, Hao Wang
  • Patent number: 6699788
    Abstract: An integrated nucleation and bulk deposition process is disclosed for forming a CVD metal film over a semiconductor substrate that has structures formed thereon. In the integrated deposition process of the present invention, nucleation seed deposition and bulk deposition are performed in an integrated and contemporaneous manner. In one embodiment, a reactant gas and a reducing agent gas flow into a pressurized reaction chamber. As the integrated deposition process progresses, pressure and flow of reactant gas are increased while flow of reducing agent gas is decreased. The integrated deposition process of the present invention gives a significant decrease in process time as compared to prior art processes. Moreover, the integrated deposition process of the present invention gives good fill characteristics while providing sufficient protection to underlying structures.
    Type: Grant
    Filed: November 13, 2001
    Date of Patent: March 2, 2004
    Assignee: Chartered Semiconductors Manufacturing Limited
    Inventors: Guy Eristoff, Sarion C. S. Lee, Liew San Leong, Goh Khoon Meng
  • Publication number: 20030096499
    Abstract: An integrated nucleation and bulk deposition process is disclosed for forming a CVD metal film over a semiconductor substrate that has structures formed thereon. In the integrated deposition process of the present invention, nucleation seed deposition and bulk deposition are performed in an integrated and contemporaneous manner. In one embodiment, a reactant gas and a reducing agent gas flow into a pressurized reaction chamber. As the integrated deposition process progresses, pressure and flow of reactant gas are increased while flow of reducing agent gas is decreased. The integrated deposition process of the present invention gives a significant decrease in process time as compared to prior art processes. Moreover, the integrated deposition process of the present invention gives good fill characteristics while providing sufficient protection to underlying structures.
    Type: Application
    Filed: November 13, 2001
    Publication date: May 22, 2003
    Applicant: CHARTERED SEMICONDUCTORS MANUFACTURED LIMITED
    Inventors: Guy Eristoff, Sarion C.S. Lee, Liew San Leong, Goh Khoon Meng