Abstract: A target for sputtering comprises SiZrxOy wherein x is higher than 0.02 but not higher than 5, and y is higher than 0.03 but not higher than 2*(1+x), wherein the target has an XRD pattern with silicon 2-theta peak at 28.29°+/?0.3°, or a tetragonal phase ZrO2 2-theta peak at 30.05°+/?0.3°. The target has a low resistivity, below 1000 ohm·cm, preferably below 100 ohm·cm, more preferably below 10 ohm·cm, even lower than 1 ohm·cm.

Abstract: A target for sputtering comprises SiZrxOy wherein x is higher than 0.02 but not higher than 5, and y is higher than 0.03 but not higher than 2*(1+x), wherein the target has an XRD pattern with silicon 2-theta peak at 28.29°+/?0.3°, or a tetragonal phase ZrO2 2-theta peak at 30.05°+/?0.3°. The target has a low resistivity, below 1000 ohm·cm, preferably below 100 ohm·cm, more preferably below 10 ohm·cm, even lower than 1 ohm·cm.

Abstract: An end-block for rotatably carrying a sputtering target tube and for rotatably restraining a magnet bar inside the sputtering target tube includes a receptacle for receiving a magnet bar fitting. The receptacle comprises a first part of a signal connector arranged to receive a second part of a signal connector from the magnet bar fitting, and allow a signal connector between the end-block and the magnet bar to be formed. The end-block is adapted for providing protection means to the signal connector for protecting it from degradation, destruction or interference of a power and/or data signal transmitted between the end-block and the magnet bar, due to surrounding cooling fluid and/or surrounding high energy fields. The disclosure provides a corresponding magnet bar, and a method for adjusting a magnetic configuration of a magnet bar in a cylindrical sputtering apparatus.

Abstract: A sputter system for applying a coating on a substrate is described. The sputter system comprises at least two cylindrical sputter units for the joint sputtering of a single coating. Each sputter unit comprising an elongated magnet configuration and at least one elongated magnet configuration comprising a plurality of magnet structures and magnet structure control systems along the length direction of the elongated magnet configuration. At least one magnet structure is adjustable in position and/or shape by a magnet structure control system, while a sputter target is mounted on the sputter unit.

Abstract: A cover for a configurable measuring system of a configurable sputtering system which is adapted for sputtering multilayer coatings with varying compositions and comprising a plurality of sputtering zones and having a plurality of apertures on which the cover is detachably attachable, and wherein the cover comprises a sensor system for in situ detection of a property of the multilayer coating on a substrate, wherein said at least one sensor system is attached to the cover.

Abstract: An end-block for rotatably carrying a sputtering target tube and for rotatably restraining a magnet bar inside the sputtering target tube includes a receptacle for receiving a magnet bar fitting. The receptacle comprises a first part of a signal connector arranged to receive a second part of a signal connector from the magnet bar fitting, and allow a signal connector between the end-block and the magnet bar to be formed. The end-block is adapted for providing protection means to the signal connector for protecting it from degradation, destruction or interference of a power and/or data signal transmitted between the end-block and the magnet bar, due to surrounding cooling fluid and/or surrounding high energy fields. The disclosure provides a corresponding magnet bar, and a method for adjusting a magnetic configuration of a magnet bar in a cylindrical sputtering apparatus.

Abstract: A method of heating in a vacuum atmosphere in the presence of a plasma, comprises the following steps: a) providing infrared radiation means (16) in a vacuum chamber (10); b) providing a first electrical conductor (18) to the infrared radiation means (16); c) providing a second electrical conductor (20) from the infrared radiation means (16); d) putting an electrical voltage over said infrared radiation means (16); e) preventing the first conductor (18) and the second conductor (20) from having an electrical voltage above +55 Volt. The advantage is that arcing is avoided.

Abstract: A sputtering magnetron arrangement is disclosed, comprising a magnetic field generator (1) and a target (4) which is associated with said magnetic field generator (1). The magnetic field generator (1) includes a magnetically active element (5-9) and an adjusting means (20-25) which is adapted to deform or deflect locally the magnetically active element (5-9) so as to alter with respect to the target (4) the position of at least a portion of the magnetic field generator (1).

Abstract: Material utilization and process stability for a rotating cylindrical magnetron target used in a sputtering system are improved by incorporation of a second magnet structure or “race track”, allowing the power density on the target surface to be reduced by approximately 50% for any given point where magnetic confinement of the plasma exists. Offsetting one race track relative to the other along the longitudinal axis of the target reduces the power density at each turn-around area (relative to the longitudinal area). Modestly increasing the target material thickness at the ends of the target allows nearly all of the material between the turn-around areas to be sputtered.

Abstract: An apparatus to releasably affix a rotating cylindrical magnetron target to a spindle utilizes a threaded spindle collar engaging threads on the outside surface of the target, with a single water-to-vacuum seal located at the target and spindle interface. The threads may be removable from the target, enabling efficient assembly/disassembly and recycling.

Abstract: The invention relates to a sealing element to be applied when feeding at least one elongated object through a vacuum apparatus, the sealing element comprising a casing with a first detachable part having a projection on its underside that tapers from a first end of the casing to a second end of the casing and a second detachable part having a hollow portion that tapers from the first end of the casing to the second end. The projection fits in and partially fills the hollow portion creating a gap between the projection and the hollow portion. The second detachable part has a groove around a portion of its perimeter on an upper surface which contains a resilient sealing means that allows the first and second detachable parts to be sealed when abutted against one another.