Abstract: Disclosed are an image encoding method using a skip mode and a device using the method. The image encoding method may comprise the steps of: judging whether there is residual block data of a prediction target block on the basis of predetermined data indicating whether residual block data has been encoded; and, if there is residual block data, restoring the prediction target block on the basis of the residual block data and an intra-screen predictive value of the prediction target block. Consequently, encoding and decoding efficiency can be increased by carrying out the encoding and decoding of screen residual data only for prediction target blocks where there is a need for a residual data block in accordance with screen similarity.

Abstract: Disclosed herein is a flat panel display manufacturing apparatus in a predetermined process is performed using plasma generated therein. In such a flat panel display manufacturing apparatus, a process gas is supplied into a chamber in an evenly diffused state to generate even plasma inside a symmetrical interior space of the chamber. Consequently, the flat panel display manufacturing apparatus can appropriately control flow rate of the plasma, thereby being capable of performing even processing on a large-scale substrate. In the flat panel display manufacturing apparatus, a substrate pedestal thereof is provided with a combination of vertical and horizontal shielding members, thereby being entirely protected from attack of the plasma, resulting in an increased life-span.

Abstract: A transfer chamber for a flat display device manufacturing apparatus is provided. The transfer chamber may combine functions of a transfer chamber and a load-lock chamber. A robot may be provided aside from a center of the transfer chamber, and a buffer may be provided so as to avoid interference with the robot. An aligner may adjust a position of a substrate mounted on the buffer.

Abstract: A transfer chamber for a flat display device manufacturing apparatus is provided. The transfer chamber may provide a combination of the functions of a transfer and a load-lock chamber. A robot may be provided aside from a center of the transfer chamber, a buffer may be provided and be driven without interference with the robot, and an aligner may be provided to adjust a position of a substrate mounted on the buffer. A sealing member may be provided to seal a hole formed at a predetermined portion of the transfer chamber.

Abstract: Disclosed herein is a flat panel display manufacturing apparatus in a predetermined process is performed using plasma generated therein. In such a flat panel display manufacturing apparatus, a process gas is supplied into a chamber in an evenly diffused state to generate even plasma inside a symmetrical interior space of the chamber. Consequently, the flat panel display manufacturing apparatus can appropriately control flow rate of the plasma, thereby being capable of performing even processing on a large-scale substrate. In the flat panel display manufacturing apparatus, a substrate pedestal thereof is provided with a combination of vertical and horizontal shielding members, thereby being entirely protected from attack of the plasma, resulting in an increased life-span.

Abstract: The present invention relates to a transfer chamber for a flat display device manufacturing apparatus, and more particularly, to a transfer chamber for a flat display device manufacturing apparatus, having a combination of functions of transfer and load-lock chambers, in which a robot is provided aside from a center of the transfer chamber, a buffer is provided to be driven without interference of the robot, and a aligner is provided to adjust a position of a substrate mounted on the buffer. In order to achieve the aforementioned objects, there is provided a transfer chamber for a flat display device manufacturing apparatus, wherein a robot is provided aside from a center of the transfer chamber. In addition, in order to drive the robot, a sealing member is provided to seal a hole formed at a predetermined portion of the transfer chamber, and an aligner for adjusting the substrate in the transfer chamber and a buffer where the substrate is mounted on are provided.

Abstract: An FPD fabricating apparatus according to the present invention comprises two chambers of a process chamber 130 and a transfer chamber 120. The substrate 140 is mounted on and transferred by one of two carrier plates 150a and 150b, each of which have a forked shape. The carrier plate lift pins 160b are raised up and fallen down while avoiding contact with the forked prongs of the robot arm 122a, so that the carrier plates 150a and 150b can be raised up and fallen down. The substrate lift pins 160a which are raised up and fallen down while avoiding contact with all the forked prongs of the robot arm 122a and the carrier plates 150a and 150b, so that only the substrate 140 mounted on the carrier plates 150a and 150b can be raised up and fallen down. According to the present invention, a load-lock chamber for transferring a substrate and a transfer chamber is incorporated into a single transfer chamber, so that space of the apparatus can be remarkably reduced and cost of the apparatus can be reduced.

Abstract: The present invention provides a substrate support member of an FPD manufacturing apparatus comprising: a substrate support plate on which a glass substrate is horizontally put, the substrate support plate having a plurality of vertical through-holes, each of the vertical though-holes having an upper distal portion of a shape of a reverse cone; and a plurality of lift pins being inserted into the respective vertical though-holes, the lift pins 32 being moved up and down so that the substrate 40 is raised from the substrate support plate 36 or put down on the substrate support plate 36, each of the lift pins having an upper distal portion of a shape of a reverse cone to comply with the upper distal portion of the corresponding vertical through-hole.