Abstract: Disclosed in the present invention are a microporous polyethylene film and a method of manufacture thereof. The polyethylene microporous film manufactured according to the present invention may contribute to an increased productivity of stable products as its extrusion and stretching may be done readily. And thus manufactured product may be used for battery separators and various filters owing to its high gas permeability, superior puncture strength, and small ratio of shrinkage.

Abstract: The present invention is related to microporous polyolefin films that may be used for battery separators and the methods of manufacturing the same. These microporous polyolefin films are characterized by being manufactured in a method comprising the steps of melt-extruding a composition, comprised of 20-50 weight % of a resin composition, comprised of 90-98 weight % of polyethylene (Component I) having a weight average molecular weight of 2×105˜4×105 and less than 5 weight % of molecules of which molecular weight is less than 1×104 and less than 5 weight % of molecules of which molecular weight is greater than 1×106, and 2-10 weight % of polypropylene (Component II) of which weight average molecular weight is 3.0×104˜8.0×105 and the peak of the melting point is higher than 145° C., and 80-50 weight % of a diluent (Component III), to mold in the form of sheets; stretching the above sheets to the form of films; extracting the diluent from the above films; and heat-setting the above films.

Abstract: The present invention relates to a process for manufacturing a microporous polyolefin film which can be used for various battery separators, separating filters and membranes for microfiltration. The process for manufacturing a microporous polyolefin film according to the invention comprises mixing/extrusion through efficient and separate injection of 15-55% by weight of polyolefin (Component I), and 85-45% by weight of a diluent (Component II) which forms thermodynamic single phase with the polyolefin and a diluent (Component III) which can undergo thermodynamic liquid-liquid phase separation with the polyolefin, into an extruder.

Abstract: The present invention relates to an organic silicate polymer prepared by mixing silane compound with organic solvent to prepare a first mixture, and hydrolyzing and condensing the first mixture by adding water and catalyst, the first mixture being selected from a group consisting of oxidized hydrosilane, cyclic siloxane, a second mixture of oxidized hydrosilane and silane or silane oligomer, and a third mixture of cyclic siloxane and silane or silane oligomer, a composition for forming an insulation film of semiconductor devices prepared by using the organic silicate polymer, a method for preparing an insulation film using the composition, and a semiconductor device comprising the insulation film.

Abstract: The present invention relates to organic siloxane resins and insulating films using the same. The insulating films are manufactured by using organic siloxane resins, wherein organic siloxane resins are hydrolysis-condensation polymers of silane compounds comprising one or more kinds of hydrosilane compounds. They have superior mechanical properties and a low electric property, and therefore, are properly usable for highly integrated semiconductor devices.

Abstract: The present invention relates to a process for manufacturing a microporous polyolefin film which can be used for various battery separators, separating filters and membranes for microfiltration. The process for manufacturing a microporous polyolefin film according to the invention comprises mixing/extrusion through efficient and separate injection of 15-55% by weight of polyolefin (Component I), and 85-45% by weight of a diluent (Component II) which forms thermodynamic single phase with the polyolefin and a diluent (Component III) which can undergo thermodynamic liquid-liquid phase separation with the polyolefin, into an extruder.

Abstract: The present invention relates to a coating composition for insulating film production, a preparation method of a low dielectric insulating film using the same, a low dielectric insulating film for a semiconductor device prepared therefrom, and a semiconductor device comprising the same, and more particularly to a coating composition for insulating film production having a low dielectric constant and that is capable of producing an insulating film with superior mechanical strength (elasticity), a preparation method of a low dielectric insulating film using the same, a low dielectric insulating film for a semiconductor device prepared therefrom, and a semiconductor device comprising the same. The coating composition of the present invention comprises an organic siloxane resin having a small molecular weight, and water, and significantly improves low dielectricity and mechanical strength of an insulating film.

Abstract: The present invention relates to a coating composition for insulating film production, a preparation method of a low dielectric insulating film using the same, a low dielectric insulating film for a semiconductor device prepared therefrom, and a semiconductor device comprising the same, and more particularly to a coating composition for insulating film production having a low dielectric constant and that is capable of producing an insulating film with superior mechanical strength (elasticity), a preparation method of a low dielectric insulating film using the same, a low dielectric insulating film for a semiconductor device prepared therefrom, and a semiconductor device comprising the same. The coating composition of the present invention comprises an organic siloxane resin having a small molecular weight, and water, and significantly improves low dielectricity and mechanical strength of an insulating film.

Abstract: The present invention relates to a coating composition for insulating film production, a preparation method of a low dielectric insulating film using the same, a low dielectric insulating film for a semiconductor device prepared therefrom, and a semiconductor device comprising the same, and more particularly to a coating composition for insulating film production having a low dielectric constant and that is capable of producing an insulating film with superior mechanical strength (elasticity), a preparation method of a low dielectric insulating film using the same, a low dielectric insulating film for a semiconductor device prepared therefrom, and a semiconductor device comprising the same. The coating composition of the present invention comprises an organic siloxane resin having a small molecular weight, and water, and significantly improves low dielectricity and mechanical strength of an insulating film.

Abstract: Disclosed in the present invention are a microporous polyethylene film and a method of manufacture thereof. The polyethylene microporous film manufactured according to the present invention may contribute to an increased productivity of stable products as its extrusion and stretching may be done readily. And thus manufactured product may be used for battery separators and various filters owing to its high gas permeability, superior puncture strength, and small ratio of shrinkage.

Abstract: The present invention is related to microporous polyolefin films that may be used for battery separators and the methods of manufacturing the same. These microporous polyolefin films are characterized by being manufactured in a method comprising the steps of melt-extruding a composition, comprised of 20-50 weight % of a resin composition, comprised of 90-98 weight % of polyethylene (Component I) having a weight average molecular weight of 2×105˜4×105 and less than 5 weight % of molecules of which molecular weight is less than 1×104 and less than 5 weight % of molecules of which molecular weight is greater than 1×106, and 2-10 weight % of polypropylene (Component II) of which weight average molecular weight is 3.0×104˜8.0×105 and the peak of the melting point is higher than 145° C., and 80-50 weight % of a diluent (Component III), to mold in the form of sheets; stretching the above sheets to the form of films; extracting the diluent from the above films; and heat-setting the above films.

Abstract: The present invention is related to microporous polyolefin films that may be used for battery separators and the methods of manufacturing the same. These microporous polyolefin films are characterized by being manufactured in a method comprising the steps of melt-extruding a composition, comprised of 20-50 weight % of a resin composition, comprised of 90-98 weight % of polyethylene (Component I) having a weight average molecular weight of 2×105-4×105 and less than 5 weight % of molecules of which molecular weight is less than 1×104 and less than 5 weight % of molecules of which molecular weight is greater than 1×106, and 2-10 weight % of polypropylene (Component II) of which weight average molecular weight is 3.0×104-8.0×105 and the peak of the melting point is higher than 145° C., and 80-50 weight % of a diluent (Component III), to mold in the form of sheets; stretching the above sheets to mold in the form of films; extracting the diluent from the above films; and heat-setting the above films.

Abstract: Provided is a process for manufacturing an insulating film for a semiconductor device. The process includes preparing a composition for forming an insulating film, wherein the composition comprises a) an organosilicate polymer and b) an organic solvent. The composition is coated on a substrate of a semiconductor device to prepare a coated insulating film, and the coated insulated film is dried and cured. Also provided are an insulating film prepared as described as well as a semiconductor device comprising the insulating film.

Abstract: Microporous films of the semicrystalline polymer resin according to the present invention are obtained by stretching semicrystalline polymer resin sheets extruded through a die by the phase separation between a semicrystalline polymer resin and a diluent, of which cross-section is comprised of a pore region and a non-crystalline region which is in the main matrix phase and is a swelling region swelled by the diluent, and extracting the diluent. The pore region has irregular sizes and shapes, has an average diameter of 0.01 (m to 2 (m, is connected in three dimensions, penetrates the thickness of the sheet, has gas permeability, has a volume ratio with respect to the volume of the entire resin composition of 10% to 40%. The swelled non-crystalline region has a swelling ratio of 200% or greater and is a region making minute cells of which average diameter is 0.01 (m to 1 (m as the region is split and cells are formed during the process of stretching.

Abstract: Microporous films of the semicrystalline polymer according to the present invention are obtained by stretching semicrystalline polymer sheets extruded through a die with the phase separation between a semicrystalline polymer resin and a diluent, of which sheet is comprised of a crystalline region, a pore region, and a non-crystalline region which is a swollen region swollen by the diluent, and extracting the diluent. The pore region has irregular sizes and shapes, has an average diameter of 0.01 ?m to 2 ?m, is connected in three dimensions, penetrates the thickness of the sheet, has gas permeability, and has a volume ratio with respect to the volume of the entire composition of 10% to 40%. The swollen non-crystalline region has a swelling ratio of 200% or greater and is a region making micropores of which average diameter is 0.1 ?m to 1 ?m as the region is split and pores are generated during the process of stretching. Thus manufactured microporous films are characterized by having a gas permeability of 1.

Abstract: Disclosed in the present invention are a microporous polyethylene film and a method of manufacture thereof. The polyethylene microporous film manufactured according to the present invention may contribute to an increased productivity of stable products as its extrusion and stretching may be done readily. And thus manufactured product may be used for battery separators and various filters owing to its high gas permeability, superior puncture strength, and small ratio of shrinkage.

Abstract: The present invention relates to an organic silicate polymer prepared by mixing silane compound with organic solvent to prepare a first mixture, and hydrolyzing and condensing the first mixture by adding water and catalyst, the first mixture being selected from a group consisting of oxidized hydrosilane, cyclic siloxane, a second mixture of oxidized hydrosilane and silane or silane oligomer, and a third mixture of cyclic siloxane and silane or silane oligomer, a composition for forming an insulation film of semiconductor devices prepared by using the organic silicate polymer, a method for preparing an insulation film using the composition, and a semiconductor device comprising the insulation film.

Abstract: The present invention relates to a nanopore-forming material for forming an insulating film for a semiconductor device, and more particularly to a nanopore-forming organic material containing a triazine functional group and preparation thereof, and a composition for forming an insulating film for a semiconductor device comprising the same, an insulating film using the same, and a manufacturing process thereof. The pore-forming material of the present invention is easy to synthesize, and the molecular weight, molecular structure, and microenvironment thereof are easy to control, and thus it is suitable for a nanopore-forming material.

Abstract: The present invention relates to organic siloxane resins and insulating films using the same. The insulating films are manufactured by using organic siloxane resins, wherein organic siloxane resins are hydrolysis-condensation polymers of silane compounds comprising one or more kinds of hydrosilane compounds. They have superior mechanical properties and a low electric property, and therefore, are properly usable for highly integrated semiconductor devices.

Abstract: The present invention relates to a composition for forming a low dielectric insulating film for a semiconductor device, particularly to an organosilicate polymer prepared by mixing a thermally decomposable organic silane compound that is capped with a silane compound at both its ends, and a common silane compound or silane oligomer, and then adding water and a catalyst to conduct hydrolysis and condensation, as well as to a coating composition for an insulating film for a semiconductor device comprising the same, a coating composition for an insulating film for a semiconductor device further comprising a pore-forming organic substance, a method for preparing an insulating film for a semiconductor device by coating the composition and curing, and a semiconductor device comprising a low dielectric insulating film prepared by the method.