Abstract: A thermosensitive nanosensor includes a substrate having a plurality of vertically standing nanostructures attached thereto, the plurality of vertically standing nanostructure being covered with a conductive material to form conductive coated nanostructures; a thermosensitive hydrogel adjacent to the plurality of conductive coated nanostructures; and a cover layer on top of the thermosensitive hydrogel to prevent loss of moisture and mechanical stress.

Abstract: A system and method is provided for depositing nanosensors including directing a plasma stream onto a low energy substrate having a surface energy of from 10 mN/m to 43 mN/m to increase the surface energy of the substrate to from 44 mN/m to 80 mN/m, applying an adhesive layer to the plasma discharge treated substrate; and depositing nanosensors on the adhesive coated substrate of step (b) via electrostatic force assisted deposition using a high strength electrostatic field of from 2 kV/cm to 10 kV/cm to form vertically standing nanosensors.

Abstract: A system and method is provided for depositing nanosensors including directing a plasma stream onto a low energy substrate having a surface energy of from 10 mN/m to 43 mN/m to increase the surface energy of the substrate to from 44 mN/m to 80 mN/m, applying an adhesive layer to the plasma discharge treated substrate; and depositing nanosensors on the adhesive coated substrate of step (b) via electrostatic force assisted deposition using a high strength electrostatic field of from 2 kV/cm to 10 kV/cm to form vertically standing nanosensors.

Abstract: A system and method is provided for depositing nanosensors including directing a plasma stream onto a low energy substrate having a surface energy of from 10 mN/m to 43 mN/m to increase the surface energy of the substrate to from 44 mN/m to 80 mN/m, applying an adhesive layer to the plasma discharge treated substrate; and depositing nanosensors on the adhesive coated substrate of step (b) via electrostatic force assisted deposition using a high strength electrostatic field of from 2 kV/cm to 10 kV/cm to form vertically standing nanosensors.

Abstract: A thermosensitive nanosensor includes a substrate having a plurality of vertically standing nanostructures attached thereto, the plurality of vertically standing nanostructure being covered with a conductive material to form conductive coated nanostructures; a thermosensitive hydrogel adjacent to the plurality of conductive coated nanostructures; and a cover layer on top of the thermosensitive hydrogel to prevent loss of moisture and mechanical stress.

Abstract: A system and method is provided for of characterizing nanostructured surfaces. A nanostructure sample is placed in an SEM chamber and imaged. The system and method locates one of the nanostructures using images from the SEM imaging, excises a top portion of the nanostructure, places said top portion on a substrate such that the nanostructures are perpendicular to the substrate and a base of the top portion contacts the substrate, performs high energy ion beam assisted deposition of metal at the base to attach the top portion to the substrate, SEM imaging the top portions in the SEM chamber, determining coordinates of the top portions relative to the substrate from the SEM imaging of the top portions, placing the substrate in an AFM chamber, and performing AFM imaging of the top portions using the coordinates previously determined.

Abstract: A system and method is provided for of characterizing nanostructured surfaces. A nanostructure sample is placed in an SEM chamber and imaged. The system and method locates one of the nanostructures using images from the SEM imaging, excises a top portion of the nanostructure, places said top portion on a substrate such that the nanostructures are perpendicular to the substrate and a base of the top portion contacts the substrate, performs high energy ion beam assisted deposition of metal at the base to attach the top portion to the substrate, SEM imaging the top portions in the SEM chamber, determining coordinates of the top portions relative to the substrate from the SEM imaging of the top portions, placing the substrate in an AFM chamber, and performing AFM imaging of the top portions using the coordinates previously determined.

Abstract: A system and method is provided for of characterizing nanostructured surfaces. A nanostructure sample is placed in an SEM chamber and imaged. The system and method locates one of the nanostructures using images from the SEM imaging, excises a top portion of the nanostructure, places said top portion on a substrate such that the nanostructures are perpendicular to the substrate and a base of the top portion contacts the substrate, performs high energy ion beam assisted deposition of metal at the base to attach the top portion to the substrate, SEM imaging the top portions in the SEM chamber, determining coordinates of the top portions relative to the substrate from the SEM imaging of the top portions, placing the substrate in an AFM chamber, and performing AFM imaging of the top portions using the coordinates previously determined.

Abstract: A system and method is provided for depositing nanosensors including directing a plasma stream onto a low energy substrate having a surface energy of from 10 mN/m to 43 mN/m to increase the surface energy of the substrate to from 44 mN/m to 80 mN/m, applying an adhesive layer to the plasma discharge treated substrate; and depositing nanosensors on the adhesive coated substrate of step (b) via electrostatic force assisted deposition using a high strength electrostatic field of from 2 kV/cm to 10 kV/cm to form vertically standing nanosensors.

Abstract: A system and method is provided for of characterizing nanostructured surfaces. A nanostructure sample is placed in an SEM chamber and imaged. The system and method locates one of the nanostructures using images from the SEM imaging, excises a top portion of the nanostructure, places said top portion on a substrate such that the nanostructures are perpendicular to the substrate and a base of the top portion contacts the substrate, performs high energy ion beam assisted deposition of metal at the base to attach the top portion to the substrate, SEM imaging the top portions in the SEM chamber, determining coordinates of the top portions relative to the substrate from the SEM imaging of the top portions, placing the substrate in an AFM chamber, and performing AFM imaging of the top portions using the coordinates previously determined.