Patents by Inventor Gyeayoung Kwak

Gyeayoung Kwak has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7749461
    Abstract: An apparatus for converting gas using gliding plasma. The apparatus includes: a reaction chamber; an electrode member inside the reaction chamber and insulated from the reaction chamber; a power source applying electricity to the reaction chamber and the electrode member; a magnetic field generating unit installed outside the reaction chamber to rotate plasma induced inside the reaction chamber in a circumferential direction of the electrode member for forming a plasma region; and a gas supplying unit supplying material gas into the reaction chamber to allow the material gas to pass through the plasma region for converting the material gas into a different gas by energy received from the plasma. In the gas conversion apparatus, the plasma region can be widely formed in the reaction chamber to increase gas conversion rate.
    Type: Grant
    Filed: June 22, 2006
    Date of Patent: July 6, 2010
    Assignee: LG Chem, Ltd.
    Inventors: Soonhwa Jung, Gyeayoung Kwak, Ju Hwa Cheong, Wonho Lee
  • Publication number: 20070120495
    Abstract: An apparatus for converting gas using gliding plasma. The apparatus includes: a reaction chamber; an electrode member inside the reaction chamber and insulated from the reaction chamber; a power source applying electricity to the reaction chamber and the electrode member; a magnetic field generating unit installed outside the reaction chamber to rotate plasma induced inside the reaction chamber in a circumferential direction of the electrode member for forming a plasma region; and a gas supplying unit supplying material gas into the reaction chamber to allow the material gas to pass through the plasma region for converting the material gas into a different gas by energy received from the plasma. In the gas conversion apparatus, the plasma region can be widely formed in the reaction chamber to increase gas conversion rate.
    Type: Application
    Filed: June 22, 2006
    Publication date: May 31, 2007
    Inventors: Soonhwa Jung, Gyeayoung Kwak, Ju Cheong, Wonho Lee