Patents by Inventor Gyeong Guk HAM

Gyeong Guk HAM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11001780
    Abstract: Disclosed is a cutting oil composition, which is vastly superior in view of layer separation, dispersibility, viscosity, ingot-cleaning time after sawing, and wafer warpage after sawing, compared to conventional cutting oil compositions, and which includes mineral oil that is highly hydrogenated, as represented by Chemical Formulas 1 to 3, bentonite clay as a thickener, and glycerol trioleate as a dispersant. A cutting method using the cutting oil composition is also provided.
    Type: Grant
    Filed: May 31, 2018
    Date of Patent: May 11, 2021
    Assignee: YOUNG CHANG CHEMICAL CO., LTD
    Inventors: Seung Hun Lee, Seung Hyun Lee, Seong Hwan Kim, Gyeong Guk Ham
  • Patent number: 10717878
    Abstract: The present invention relates to an anti-reflective coating solution composition and an anti-reflective coating film using the same. More particularly, an anti-reflective coating solution composition is provided, which has a low refractive index to thus improve transmittance and can also increase abrasion resistance to thus maintain an anti-reflective effect for a long period of time, whereby an anti-reflective coating film for improving solar cell module efficiency can be formed, and thus can be applied not only to a solar cell module glass but also to glass in a variety of fields.
    Type: Grant
    Filed: January 17, 2017
    Date of Patent: July 21, 2020
    Assignee: YOUNG CHANG CHEMICAL CO., LTD
    Inventors: Seung Hun Lee, Seung Hyun Lee, Gyeong Guk Ham
  • Publication number: 20200190423
    Abstract: Disclosed is a cutting oil composition, which is vastly superior in view of layer separation, dispersibility, viscosity, ingot-cleaning time after sawing, and wafer warpage after sawing, compared to conventional cutting oil compositions, and which includes mineral oil that is highly hydrogenated, as represented by Chemical Formulas 1 to 3, bentonite clay as a thickener, and glycerol trioleate as a dispersant. A cutting method using the cutting oil composition is also provided.
    Type: Application
    Filed: May 31, 2018
    Publication date: June 18, 2020
    Inventors: Seung Hun LEE, Seung Hyun LEE, Seong Hwan KIM, Gyeong Guk HAM
  • Publication number: 20180319994
    Abstract: The present invention relates to an anti-reflective coating solution composition and an anti-reflective coating film using the same. More particularly, an anti-reflective coating solution composition is provided, which has a low refractive index to thus improve transmittance and can also increase abrasion resistance to thus maintain an anti-reflective effect for a long period of time, whereby an anti-reflective coating film for improving solar cell module efficiency can be formed, and thus can be applied not only to a solar cell module glass but also to glass in a variety of fields.
    Type: Application
    Filed: January 17, 2017
    Publication date: November 8, 2018
    Inventors: Seung Hun LEE, Seung Hyun LEE, Gyeong Guk HAM
  • Patent number: 9829797
    Abstract: Disclosed are a cleaning composition for photolithography and a method of forming a photoresist pattern using the same. The cleaning composition, necessary for forming a photoresist pattern having a high aspect ratio, includes water and a compound represented by Chemical Formula 1 below: wherein R is H or OH, x is an integer selected from 1 to 100, y is an integer selected from 0 to 100, and z is an integer selected from 0 to 100. This cleaning composition is useful for forming a pattern using any of a variety of light sources, and also, even when it is difficult to form a fine pattern as desired using a photoresist alone, a fine pattern can be realized at a desired level of fineness and production costs can be reduced.
    Type: Grant
    Filed: June 14, 2016
    Date of Patent: November 28, 2017
    Assignee: YOUNG CHANG CHEMICAL CO., LTD
    Inventors: Seung Hun Lee, Seung Hyun Lee, Sang Woong Yoon, Gyeong Guk Ham
  • Publication number: 20170017161
    Abstract: Disclosed are a cleaning composition for photolithography and a method of forming a photoresist pattern using the same. The cleaning composition, necessary for forming a photoresist pattern having a high aspect ratio, includes water and a compound represented by Chemical Formula 1 below: wherein R is H or OH, x is an integer selected from 1 to 100, y is an integer selected from 0 to 100, and z is an integer selected from 0 to 100. This cleaning composition is useful for forming a pattern using any of a variety of light sources, and also, even when it is difficult to form a fine pattern as desired using a photoresist alone, a fine pattern can be realized at a desired level of fineness and production costs can be reduced.
    Type: Application
    Filed: June 14, 2016
    Publication date: January 19, 2017
    Applicant: YOUNG CHANG CHEMICAL CO., LTD.
    Inventors: Seung Hun LEE, Seung Hyun LEE, Sang Woong YOON, Gyeong Guk HAM