Abstract: Disclosed is a washer idler roller and a wafer cleaner using the same in which the wafer cleaner prevents wafer slip and wafer hunting so that the wafer rotates stably, and it is possible to efficiently determine whether the wafer is clean or not by precise detection of a rotation state of the wafer. The wafer cleaner of semiconductor manufacturing equipment according to the present invention includes a wafer roller for rotating the wafer, an idler detecting a rotation speed of the wafer, and brushes respectively disposed at opposite sides of the wafer, wherein the idler includes a first body configured to rotate, a pair of first guide portions disposed at the first body, and a washer idler roller disposed between the first guide portions and being in contact with an outer circumferential surface of the wafer.

Abstract: Disclosed is a washer idler roller and a wafer cleaner using the same in which the wafer cleaner prevents wafer slip and wafer hunting so that the wafer rotates stably, and it is possible to efficiently determine whether the wafer is clean or not by precise detection of a rotation state of the wafer. The wafer cleaner of semiconductor manufacturing equipment according to the present invention includes a wafer roller for rotating the wafer, an idler detecting a rotation speed of the wafer, and brushes respectively disposed at opposite sides of the wafer, wherein the idler includes a first body configured to rotate, a pair of first guide portions disposed at the first body, and a washer idler roller disposed between the first guide portions and being in contact with an outer circumferential surface of the wafer.