Patents by Inventor Gyeong Min PARK

Gyeong Min PARK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240128058
    Abstract: A substrate processing apparatus comprises a substrate support disposed in the chamber, a shutter including a valve body configured to open and close an opening of the chamber, and a baffle plate disposed between an inner peripheral side of the chamber and the substrate support and having a vertically inclined portion at an end portion on a substrate support side, and a contact member disposed on a side surface of the substrate support and formed of a conductive elastic member. In a state where the shutter is closed, contact between the end portion on the substrate support side and the contact member is maintained.
    Type: Application
    Filed: October 18, 2023
    Publication date: April 18, 2024
    Applicant: Tokyo Electron Limited
    Inventors: Takashi ARAMAKI, Kojiro MATSUZAKA, Atsushi OGATA, Lifu LI, Gyeong Min PARK
  • Publication number: 20240084256
    Abstract: The present invention pertains to a method for culturing cord blood-derived natural killer cells using transformed T-cells. The method for culturing natural killer cells using transformed T-cells according to the present invention can effectively propagate and produce natural killer cells from a small amount of raw cells. In addition, the method can also improve the cell-killing ability of natural killer cells. Thus, the method for culturing natural killer cells using transformed T-cells according to the present invention can be usefully used to commercialize cell therapeutic agents. Moreover, natural killer cells produced by the culturing method of the present invention can be usefully used as a cell therapeutic agent.
    Type: Application
    Filed: November 13, 2019
    Publication date: March 14, 2024
    Inventors: YUSUN KIM, EUN JI KIM, GYEONG-MIN PARK, BITNA YANG, BOKYUNG MIN, SUNGYOO CHO, YU KYEONG HWANG
  • Publication number: 20240020023
    Abstract: According to the present technology, a storage device may include a plurality of first memory devices, a second memory device, and a memory controller. Each of the plurality of first memory devices may include a plurality of zones in which sequential writing is performed. The second memory device may include a plurality of parity zones. The memory controller may allocate to a parity group, first zones included in the respective first memory devices and a first parity zone storing parity data for data stored in the first zones, release from the parity group, the first zone invalidated among the first zones by writing new data into a target zone different from the invalidated first zone among the zones included in the first memory device including the invalidated first zone, and allocate the target zone to the parity group.
    Type: Application
    Filed: February 23, 2023
    Publication date: January 18, 2024
    Inventors: Gyeong Min PARK, Jong Tack JUNG
  • Publication number: 20230215753
    Abstract: A substrate processing system includes a vacuum transfer module; a plasma process module; a transfer robot in the vacuum transfer module; a stage in the plasma process module; a first ring disposed on the stage and a second ring disposed on the first ring to surround a substrate that is placed on the stage, the second ring having an inner diameter smaller than an inner diameter of the first ring; actuators to move support pins vertically to raise the first and the second rings and a transfer jig; and a controller configured to selectively execute a simultaneous transfer mode in which the transfer robot is caused to simultaneously transfer the first ring and the second ring and a sole transfer mode in which the transfer robot is caused to transfer only the second ring.
    Type: Application
    Filed: March 13, 2023
    Publication date: July 6, 2023
    Inventors: Norihiko AMIKURA, Masatomo KITA, Toshiyuki MAKABE, Shin MATSUURA, Nobutaka SASAKI, Gyeong min PARK
  • Publication number: 20230178417
    Abstract: There is a substrate support comprising: a substrate supporting portion; a first ring disposed to surround the substrate supporting portion; a second ring surrounding the first ring without overlapping the first ring in plan view; a third ring disposed below the first ring and the second ring such that an inner portion of the third ring overlaps the first ring in plan view and an outer portion of the third ring overlaps the second ring in plan view, and having a hole at the inner portion of the third ring; a lifter having a first engaging portion protruding upward from the hole of the third ring and engaged with the first ring and a second engaging portion disposed below the first engaging portion and engaged with the third ring; and an actuator configured to raise and lower the lifter.
    Type: Application
    Filed: December 6, 2022
    Publication date: June 8, 2023
    Applicant: Tokyo Electron Limited
    Inventors: Shin MATSUURA, Nobutaka SASAKI, Gyeong min PARK
  • Publication number: 20220406575
    Abstract: A plasma processing apparatus, comprising a plasma processing chamber; a plasma generator to generate a plasma from a processing gas in the plasma processing chamber; and a substrate support disposed in the plasma processing chamber, is provided. The substrate support includes a base; an electrostatic chuck disposed above the base; a first annular member to surround a substrate on the substrate support; a second annular member disposed below the first annular member and having a plurality of through holes; a plurality of lift pins disposed to correspond to the respective through holes, each lift pin having an upper portion to support the first annular member through the corresponding through hole and a lower portion; at least one spacer fixed to at least one of the lift pins, disposed on the lower portion so as to surround the upper portion and support the second annular member; and at least one actuator to vertically move the lift pins.
    Type: Application
    Filed: June 9, 2022
    Publication date: December 22, 2022
    Applicant: Tokyo Electron Limited
    Inventors: Gyeong min PARK, Nobutaka SASAKI
  • Publication number: 20220122816
    Abstract: A substrate support includes a base, a support portion, a first pin member, a second pin member and a driving unit. The base has a first surface on which an object to be supported is placed, a second surface opposite to the first surface, and a first through-hole. The support portion has a third surface in contact with the second surface, a fourth surface opposite to the third surface, and a second through-hole. The first pin member is stored in the first through-hole and a second pin member is stored in the second through-hole. The first through-hole is larger on the second surface side than on the first surface side, and/or the second through-hole is larger on the third surface side than on the fourth surface side.
    Type: Application
    Filed: October 19, 2021
    Publication date: April 21, 2022
    Applicant: Tokyo Electron Limited
    Inventors: Nobutaka SASAKI, Shin MATSUURA, Gyeong min PARK, Toshiki AKAMA
  • Publication number: 20200108096
    Abstract: A method for culturing natural killer cells uses genetically modified T cells. The method for culturing natural killer cells, using genetically modified T cells enables the effective proliferation and production of natural killer cells from a smaller amount of source cells. In addition, the method enhances the cytolytic activity of natural killer cells. Therefore, the method for culturing natural killer cells, using genetically modified T cells may be suitable for various applications in commercializing cell therapy products. Further, the natural killer cells produced by the culturing method can be useful as a cell therapy product.
    Type: Application
    Filed: May 25, 2018
    Publication date: April 9, 2020
    Applicant: GREEN CROSS LAB CELL CORPORATION
    Inventors: Bokyung MIN, Gyeong Min PARK, Hyun Ah KIM, Bitna YANG, Yu Kyeong HWANG, Hyojin KIM