Patents by Inventor Gyo-Woog Koo

Gyo-Woog Koo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8287333
    Abstract: Provided are a single type substrate treating apparatus and method. A polishing unit is disposed in a process chamber for polishing a substrate chemically and mechanically, and a cleaning unit is disposed in the same process chamber for cleaning the substrate. Therefore, according to the single substrate treating apparatus and method, a polishing process and a cleaning process can be performed on a substrate in the same process chamber by a single substrate treating method in which substrates are treated one by one.
    Type: Grant
    Filed: November 18, 2008
    Date of Patent: October 16, 2012
    Assignee: Semes Co., Ltd
    Inventors: Ki Hoon Choi, Gyo-Woog Koo, Jung Bong Choi
  • Patent number: 8113918
    Abstract: Provided are a substrate supporting unit and a single type substrate polishing apparatus using the substrate supporting unit. During a polishing process, the bottom surface of a substrate is attached to the substrate supporting unit by vacuum suction, and during a post-cleaning process, the substrate is supported by the substrate supporting unit at a position spaced apart from the substrate supporting unit for cleaning the bottom surface of the substrate. Therefore, according to the substrate supporting unit and the substrate polishing apparatus using the substrate supporting unit, in a state where the substrate is supported by the single type substrate supporting unit, a process for polishing the top surface of the substrate and a post-process for cleaning the top and bottom surfaces of the substrate can be sequentially performed.
    Type: Grant
    Filed: November 19, 2008
    Date of Patent: February 14, 2012
    Assignee: Semes Co., Ltd.
    Inventors: Gyo-Woog Koo, Chang-Ro Yoon, Jung-Gun Cho, Ki-Hoon Choi, Jung-Bong Choi, Duk-Hyun Son, Se-Hun Goo
  • Publication number: 20090325469
    Abstract: Provided are a substrate supporting unit and a single type substrate polishing apparatus using the substrate supporting unit. During a polishing process, the bottom surface of a substrate is attached to the substrate supporting unit by vacuum suction, and during a post-cleaning process, the substrate is supported by the substrate supporting unit at a position spaced apart from the substrate supporting unit for cleaning the bottom surface of the substrate. Therefore, according to the substrate supporting unit and the substrate polishing apparatus using the substrate supporting unit, in a state where the substrate is supported by the single type substrate supporting unit, a process for polishing the top surface of the substrate and a post-process for cleaning the top and bottom surfaces of the substrate can be sequentially performed.
    Type: Application
    Filed: November 19, 2008
    Publication date: December 31, 2009
    Applicant: SEMES CO., Ltd.
    Inventors: Gyo-Woog KOO, Chang-Ro Yoon, Jung-Gun Cho, Ki-Hoon Choi, Jung-Bong Choi, Duk-Hyun Son, Se-Hun Goo
  • Publication number: 20090305613
    Abstract: Provided are a single type substrate treating apparatus and method. A polishing unit is disposed in a process chamber for polishing a substrate chemically and mechanically, and a cleaning unit is disposed in the same process chamber for cleaning the substrate. Therefore, according to the single substrate treating apparatus and method, a polishing process and a cleaning process can be performed on a substrate in the same process chamber by a single substrate treating method in which substrates are treated one by one.
    Type: Application
    Filed: November 18, 2008
    Publication date: December 10, 2009
    Applicant: SEMES CO., LTD
    Inventors: Ki Hoon Choi, Gyo-Woog Koo, Jung-Bong Choi