Abstract: A semiconductor device includes a semiconductor die, a detection structure, a path control circuit and a detection circuit. The semiconductor die includes a central region in which a semiconductor integrated circuit is provided and an external region surrounding the central region. The detection structure is provided in the external region. The path control circuit includes a plurality of switches that controls electrical connection of the detection structure. The detection circuit determines whether a defect is present in the semiconductor die and a location of the defect based on a difference signal. The difference signal corresponds to a difference between a forward direction test output signal and a backward direction test output signal obtained by propagating a test input signal through the detection structure in a forward direction and a backward direction, respectively, via the path control circuit.

Abstract: A method of manufacturing a semiconductor device is provided. The method includes: forming a first structure on a first wafer; forming a second structure on a second wafer including second chip regions and a second scribe lane region surrounding the second chip regions; separating first ones of the second chip regions in a central portion of the second wafer in a plan view by a first dicing process; bonding the first ones of the second chip regions with the first wafer; separating second ones of the second chip regions in an edge portion of the second wafer in a plan view by a second dicing process; bonding the second ones of the second chip regions with the first wafer, and separating the bonded first and second wafers by a third dicing process.

Abstract: A semiconductor device with a structure in which a plurality of chips are stacked includes: a chip area; a scribe lane at a circumference of the chip area; a dam structure that separates the chip area and the scribe lane; a detection wire that extends from the chip area to the scribe lane by passing through the dam structure; and a detection circuit in the chip area that is electrically connected to the detection wire and is configured to detect a defect in the scribe lane.

Abstract: An embodiment provides a test element group (TEG) circuit, including: a first pad configured for a test voltage to be applied; an amplifier including a first input terminal connected to the first pad, a second input terminal connected to a first terminal of a test transistor, and an output terminal electrically connected to the second input terminal; a variable resistor including one terminal connected to the output terminal of the amplifier and the other terminal connected to the first terminal of the test transistor; and a gate driving circuit that supplies a gate voltage to a gate of the test transistor.

Abstract: Provided is a non-volatile memory device including a page buffer circuit having a multi-stage structure, wherein a stage of the multi-stage structure includes a high voltage region, a first low voltage region, and a second low voltage region. The high voltage region includes a first high voltage transistor connected to one of first to sixth bit lines and a second high voltage transistor connected to one of seventh to twelfth bit lines, the first low voltage region includes a first transistor connected to the first high voltage transistor, and the second low voltage region includes a second transistor connected to the second high voltage transistor. Each of the first low voltage region and the second low voltage regions has a first width corresponding to a pitch of six bit lines, and the high voltage region has a second width corresponding to a pitch of twelve bit lines.

Abstract: An integrated circuit (IC) device includes a peripheral circuit structure and cell array structure. The peripheral circuit structure includes a circuit substrate, a peripheral circuit, a first insulating layer covering the circuit substrate and the peripheral circuit, and a first bonding pad. The cell array structure includes an insulating structure having first and second surfaces opposing each other, a conductive plate on the first surface, a memory cell array on the conductive plate, a second insulating layer, a second bonding pad disposed on the second insulating layer, first and second wiring lines spaced apart from each other on the second surface, a conductive via passing through the insulating structure and connecting the conductive plate to the first wiring line, and a contact structure electrically connecting the first wiring line to the second bonding pad. The first bonding pad is in contact with the second bonding pad.

Abstract: The present disclosure provides serial-gate transistors and nonvolatile memory devices including serial-gate transistors. In some embodiments, a nonvolatile memory device includes a plurality of memory blocks, a plurality of pass transistor blocks, and a plurality of gates sequentially arranged in a horizontal direction in a gate region above a semiconductor substrate. Each of the plurality of pass transistor blocks includes a plurality of serial-gate transistors configured to transfer a plurality of driving signals to a corresponding memory block of the plurality of memory blocks. Each of the plurality of serial-gate transistors includes a first source-drain region, a gate region, and a second source-drain region that are sequentially arranged in a horizontal direction at a semiconductor substrate. The plurality of gates are electrically decoupled from each other. A plurality of block selection signals respectively applied to the plurality of gates are controlled independently of each other.

Abstract: Various example embodiments provide a flash memory device, comprising a cell string having a plurality of memory cells; a page buffer connected to the cell string and a bit line and configured to sense data stored in a selected memory cell from among the plurality of memory cells by precharging a sensing node connected to the bit line; and a voltage regulator providing a source voltage to the page buffer. The page buffer comprises a latch including first and second inverters coupled between a latch node and an inverted latch node; and a pull-down NMOS transistor for tripping the sensing result of the selected memory cell to the latch node. The voltage regulator adjusts a trip voltage by providing the source voltage to the pull-down NMOS transistor. The flash memory device according to the embodiment of the present invention may reduce a trip voltage variation range by using only the pull-down NMOS transistor characteristics.

Abstract: A nonvolatile memory device includes a memory cell, a bit line, a page buffer, and a control logic. The page buffer is connected to the memory cell through the bit line and the page buffer is configured to precharge the bit line to perform a desired operation. The desired operation may be one of a read operation and a verify operation. The control logic is configured to control bit line development time differently according to a temperature after precharging the bit line during the desired operation. The control logic is configured to determine the bit line development time according to a period of a reference clock signal that includes a different frequency depending on the temperature and/or a temperature compensation pulse signal including a pulse width that varies based on the temperature.

Abstract: A nonvolatile memory device includes a memory cell, a bit line, a page buffer, and a control logic. The page buffer is connected to the memory cell through the bit line and the page buffer is configured to precharge the bit line to perform a desired operation. The desired operation may be one of a read operation and a verify operation. The control logic is configured to control bit line development time differently according to a temperature after precharging the bit line during the desired operation. The control logic is configured to determine the bit line development time according to a period of a reference clock signal that includes a different frequency depending on the temperature and/or a temperature compensation pulse signal including a pulse width that varies based on the temperature.

Abstract: A nonvolatile memory device includes a substrate, a plurality of memory cells stacked in a direction perpendicular to the substrate, word lines connected to the memory cells, a ground select transistor between the memory cells and the substrate, a ground select transistor between the memory cells and the substrate, a ground select line connected to the ground select transistor, a bit line on the memory cells, and a string select transistor between the memory cells and the bit line. In an erase operation, the ground select line is floated at a time when a specific time passes after the erase voltage is provided to the substrate. And the ground select line is floated at different times depending on a temperature.