Patents by Inventor Gyoung Pyo Kong

Gyoung Pyo Kong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150133039
    Abstract: Polishing pad and method of manufacturing the same, the method, whereby materials for forming a polishing layer are mixed and solidified by a chemical reaction so as to manufacture the polishing pad, the method including: grinding organic materials by using a physical method so as to form micro-organic particles; mixing the micro-organic particles formed in the operation with the materials for forming the polishing layer; mixing at least one selected from the group consisting of inert gas, a capsule type foaming agent, and a chemical foaming agent that are capable of controlling sizes of pores, with the mixture in the operation so as to form gaseous pores; performing gelling and hardening of the mixture generated in the operation so as to form a polishing layer; and processing the polishing layer so as to distribute open pores defined by opening gaseous pores on a surface of the polishing layer.
    Type: Application
    Filed: February 12, 2013
    Publication date: May 14, 2015
    Inventors: Bong-Su Ahn, Young-Jun Jang, Jin-Su Jeong, Sang-Mok Lee, Kee-Cheon Song, Seung-Geun Kim, Jang-Won Seo, Jeong-Seon Choo, Hak-Su Kang, Gyoung-Pyo Kong
  • Patent number: 8916672
    Abstract: The present disclosure relates to a transparent polyarylene ether polymer with high heat resistance and a method for preparing the same. More particularly, the present disclosure relates to a polyarylene ether polymer and a method for preparing the same, wherein the polyarylene ether polymer has a repeating structure in which cardo-type aromatic diols having a large molecular volume, polyether sulfones which are amorphous polymers having a high glass transition temperature and superior film formability, and polyether ketones which are crystalline polymers having superior heat resistance and mechanical properties are sequentially arranged. The polyarylene ether polymer is both transparent and heat resistant and, thus, can be used, for example, for a flexible plastic substrate.
    Type: Grant
    Filed: December 10, 2010
    Date of Patent: December 23, 2014
    Assignee: ICUF-HYU (Industry-University Cooperation Foundation Hanyang University)
    Inventors: Yang Kyoo Han, Gyoung Pyo Kong, Moon Ki Kim, Bo Ra Hong, Hyun Aee Chun
  • Publication number: 20120130041
    Abstract: The present disclosure relates to a transparent polyarylene ether polymer with high heat resistance and a method for preparing the same. More particularly, the present disclosure relates to a polyarylene ether polymer and a method for preparing the same, wherein the polyarylene ether polymer has a repeating structure in which cardo-type aromatic diols having a large molecular volume, polyether sulfones which are amorphous polymers having a high glass transition temperature and superior film formability, and polyether ketones which are crystalline polymers having superior heat resistance and mechanical properties are sequentially arranged. The polyarylene ether polymer is both transparent and heat resistant and, thus, can be used, for example, for a flexible plastic substrate.
    Type: Application
    Filed: December 10, 2010
    Publication date: May 24, 2012
    Applicant: IUCF-HYU (Industry-University Coperation Foundatio Hanyang University
    Inventors: Yang Kyoo Han, Gyoung Pyo Kong, Moon Ki Kim, Bo Ra Hong, Hyun Aee Chun