Patents by Inventor Gyung-Sik Choi

Gyung-Sik Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10859907
    Abstract: The present invention relates to a method for preparing a column spacer, and is characterized in using a mask including first, second, and third patterns having different light transmittance. In addition, according to the method for preparing a column spacer of the present invention, a taper angle between a matrix part and a spacer part may increase during manufacturing a column spacer in which the matrix part and the spacer part are continuously connected, and critical dimension of the spacer part may decrease. Therefore, a column spacer with fine patterns may be simply and efficiently manufactured.
    Type: Grant
    Filed: September 28, 2016
    Date of Patent: December 8, 2020
    Assignee: Rohm and Haas Electronic Materials Korea Ltd
    Inventors: Yeonok Kim, Seok-Bong Park, Gyung-Sik Choi, Su Min Lee
  • Publication number: 20200299236
    Abstract: Disclosed herein is a colored photosensitive resin composition including a copolymer, an epoxy resin compound or a compound derived therefrom, a polymerizable compound, a photoinitiator, and a colorant, wherein the photoinitiator includes an oxime compound and a triazine compound. The composition, when formed into a cured film, may facilitate the fabrication of necessary height difference and satisfy the requirements of sensitivity and an exposure margin for light shielding spacers, and, thus, is useful as a material for manufacturing a light shielding spacer such as a black column spacer used in various electronic parts including the panels of an LCD and an OLED display.
    Type: Application
    Filed: June 12, 2020
    Publication date: September 24, 2020
    Inventors: Seok-Bong Park, Gyung-Sik Choi, Yeonok Kim
  • Patent number: 10656520
    Abstract: Disclosed herein are a photosensitive resin composition and a cured film prepared therefrom. By comprising a copolymer (A) and a photopolymerizable compound (B) in specific amounts, a photosensitive resin composition may form a cured film having pattern developability with high resolution and good elasticity recovery rate. The composition may be effectively used for the formation of a cured film, particularly a spacer of a display device such as a liquid crystal display and an organic electroluminescence device.
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: May 19, 2020
    Assignee: Rohm and Haas Electronic Materials Korea Ltd
    Inventors: Hyung-Tak Jeon, Seok-Bong Park, Gyung-Sik Choi
  • Publication number: 20180373144
    Abstract: Disclosed herein are a photosensitive resin composition and a cured film prepared therefrom. By comprising a copolymer (A) and a photopolymerizable compound (B) in specific amounts, a photosensitive resin composition may form a cured film having pattern developability with high resolution and good elasticity recovery rate. The composition may be effectively used for the formation of a cured film, particularly a spacer of a display device such as a liquid crystal display and an organic electroluminescence device.
    Type: Application
    Filed: September 30, 2016
    Publication date: December 27, 2018
    Inventors: Hyung-Tak Jeon, Seok-Bong Park, Gyung-Sik Choi
  • Publication number: 20180321535
    Abstract: The present invention relates to a method for preparing a column spacer, and is characterized in using a mask including first, second, and third patterns having different light transmittance. In addition, according to the method for preparing a column spacer of the present invention, a taper angle between a matrix part and a spacer part may increase during manufacturing a column spacer in which the matrix part and the spacer part are continuously connected, and critical dimension of the spacer part may decrease. Therefore, a column spacer with fine patterns may be simply and efficiently manufactured.
    Type: Application
    Filed: September 28, 2016
    Publication date: November 8, 2018
    Inventors: Yeonok Kim, Seok-Bong Park, Gyung-Sik Choi, Su Min Lee
  • Publication number: 20180305313
    Abstract: Disclosed herein is a colored photosensitive resin composition including a copolymer, an epoxy resin compound or a compound derived therefrom, a polymerizable compound, a photoinitiator, and a colorant, wherein the photoinitiator includes an oxime compound and a triazine compound. The composition, when formed into a cured film, may facilitate the fabrication of necessary height difference and satisfy the requirements of sensitivity and an exposure margin for light shielding spacers, and, thus, is useful as a material for manufacturing a light shielding spacer such as a black column spacer used in various electronic parts including the panels of an LCD and an OLED display.
    Type: Application
    Filed: September 23, 2016
    Publication date: October 25, 2018
    Inventors: Seok-Bong Park, Gyung-Sik Choi, Yeonok Kim