Patents by Inventor H. A. van Mierlo

H. A. van Mierlo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • OPTICAL ELEMENT FOR RADIATION IN THE EUV AND/OR SOFT X-RAY REGION AND AN OPTICAL SYSTEM WITH AT LEAST ONE OPTICAL ELEMENT
    Publication number: 20100067653
    Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
    Type: Application
    Filed: November 24, 2009
    Publication date: March 18, 2010
    Applicant: Carl Zeiss SMT AG
    Inventors: Marco Wedowski, Markus Weiss, Stephan Mûllender, Johann Trenkler, Hartmut Enkisch, Gisela Sipos, H.A. van Mierlo, Michiel David Nijkerk, Fokko Pieter Wieringa, Nadyeh Shariloo
  • Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element
    Patent number: 7646004
    Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
    Type: Grant
    Filed: May 24, 2006
    Date of Patent: January 12, 2010
    Assignee: Carl Zeiss SMT AG
    Inventors: Marco Wedowski, Nadyeh Shariloo, legal representative, Markus Weiss, Stephan Müllender, Johann Trenkler, Hartmut Enkisch, Gisela Sipos, H. A. van Mierlo, Michiel David Nijkerk, Fokko Pieter Wieringa
  • Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least on optical element
    Publication number: 20070114466
    Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
    Type: Application
    Filed: May 24, 2006
    Publication date: May 24, 2007
    Inventors: Marco Wedowski, Markus Weiss, Stephan Mullender, Johann Trenkler, Hartmut Enkisch, Gisela Sipos, H.A. van Mierlo, Michiel Nijkerk, Fokko Wieringa, Nadyeh Shariloo