Patents by Inventor H. Daniel Dulman
H. Daniel Dulman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7350182Abstract: The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.Type: GrantFiled: August 4, 2004Date of Patent: March 25, 2008Assignee: Micron Technology, Inc.Inventors: H. Daniel Dulman, William A. Stanton, John R. C. Futrell
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Patent number: 7291425Abstract: The invention includes, for example, a radiation patterning tool which can be utilized to form relatively circular contacts in situations in which an array of contacts has a different pitch along a row of the array than along a column of the array. An alternating phase shift can give a well-defined contact in the small pitch (dense) direction. Rim shifters are added in the larger pitch direction to force the circular form of the contact openings. In further aspects of the invention, side-lobe-suppressing patterns can be added between adjacent rims. The invention also includes methods of forming radiation patterning tools.Type: GrantFiled: September 1, 2004Date of Patent: November 6, 2007Assignee: Micron Technology, Inc.Inventor: H. Daniel Dulman
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Patent number: 7226707Abstract: The invention encompasses a radiation-patterning tool. The tool is configured to be utilized to print a pair of structures in a radiation-sensitive material. The tool includes two separate and discrete features, with one of the features corresponding to one of the structures of the pair of structures and the other of the two features correspond to the other of the structures. At least one element is between the features. The at least one element is at least partially transparent to radiation passing through the radiation-patterning tool, but does not correspond to a discrete structure printed in the radiation-sensitive material. The element modifies the structures printed from the pair of features. The invention also includes printing methods and methods of forming aligned structures with radiation-sensitive material.Type: GrantFiled: March 24, 2004Date of Patent: June 5, 2007Assignee: Micron Technology, Inc.Inventors: H. Daniel Dulman, William A. Stanton
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Patent number: 7107572Abstract: The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.Type: GrantFiled: August 4, 2004Date of Patent: September 12, 2006Assignee: Micron Technology, Inc.Inventors: H. Daniel Dulman, William A. Stanton, John R. C. Futrell
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Patent number: 7093227Abstract: The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.Type: GrantFiled: August 4, 2004Date of Patent: August 15, 2006Assignee: Micron Technology, Inc.Inventors: H. Daniel Dulman, William A. Stanton, John R. C. Futrell
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Patent number: 7086031Abstract: The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.Type: GrantFiled: August 4, 2004Date of Patent: August 1, 2006Assignee: Micron Technology, Inc.Inventors: H. Daniel Dulman, William A. Stanton, John R. C. Futrell
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Patent number: 7073161Abstract: The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.Type: GrantFiled: August 4, 2004Date of Patent: July 4, 2006Assignee: Micron Technology, Inc.Inventors: H. Daniel Dulman, William A. Stanton, John R. C. Futrell
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Patent number: 7008738Abstract: A method of formulating and fabricating a mask pattern and resulting mask for forming isolated or closely spaced contact holes in an integrated circuit. The mask has a transparent mask substrate and patterned regions of attenuating phase shift material and opaque, partially transmissive or transparent material arranged to reduce the effect of side lobes and improve depth of focus. The rims, frames and outrigger patterns for the attenuating phase shift material and opaque, partially transmissive or transparent material are determined according to calculations performed on a processor with imaging software for various optical conditions and exposed feature criteria.Type: GrantFiled: May 18, 2004Date of Patent: March 7, 2006Assignee: Micron Technology, Inc.Inventors: H. Daniel Dulman, William A. Stanton
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Patent number: 6911301Abstract: The invention encompasses a radiation-patterning tool. The tool is configured to be utilized to print a pair of structures in a radiation-sensitive material. The tool includes two separate and discrete features, with one of the features corresponding to one of the structures of the pair of structures and the other of the two features correspond to the other of the structures. At least one element is between the features. The at least one element is at least partially transparent to radiation passing through the radiation-patterning tool, but does not correspond to a discrete structure printed in the radiation-sensitive material. The element modifies the structures printed from the pair of features. The invention also includes printing methods and methods of forming aligned structures with radiation-sensitive material.Type: GrantFiled: March 24, 2004Date of Patent: June 28, 2005Assignee: Micron Technology, Inc.Inventors: H. Daniel Dulman, William A. Stanton
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Patent number: 6887629Abstract: The invention encompasses a radiation-patterning tool. The tool is configured to be utilized to print a pair of structures in a radiation-sensitive material. The tool includes two separate and discrete features, with one of the features corresponding to one of the structures of the pair of structures and the other of the two features correspond to the other of the structures. At least one element is between the features. The at least one element is at least partially transparent to radiation passing through the radiation-patterning tool, but does not correspond to a discrete structure printed in the radiation-sensitive material. The element modifies the structures printed from the pair of features. The invention also includes printing methods and methods of forming aligned structures with radiation-sensitive material.Type: GrantFiled: August 21, 2002Date of Patent: May 3, 2005Assignee: Micron Technology, Inc.Inventors: H. Daniel Dulman, William A. Stanton
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Patent number: 6841310Abstract: The invention includes, for example, a radiation patterning tool which can be utilized to form relatively circular contacts in situations in which an array of contacts has a different pitch along a row of the array than along a column of the array. An alternating phase shift can give a well-defined contact in the small pitch (dense) direction. Rim shifters are added in the larger pitch direction to force the circular form of the contact openings. In further aspects of the invention, side-lobe-suppressing patterns can be added between adjacent rims. The invention also includes methods of forming radiation patterning tools.Type: GrantFiled: February 5, 2002Date of Patent: January 11, 2005Assignee: Micron Technology, Inc.Inventor: H. Daniel Dulman
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Patent number: 6842889Abstract: The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.Type: GrantFiled: August 6, 2002Date of Patent: January 11, 2005Assignee: Micron Technology, Inc.Inventors: H. Daniel Dulman, William A. Stanton, John R. C. Futrell
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Publication number: 20040214096Abstract: A method of formulating and fabricating a mask pattern and resulting mask for forming isolated or closely spaced contact holes in an integrated circuit. The mask has a transparent mask substrate and patterned regions of attenuating phase shift material and opaque, partially transmissive or transparent material arranged to reduce the effect of side lobes and improve depth of focus. The rims, frames and outrigger patterns for the attenuating phase shift material and opaque, partially transmissive or transparent material are determined according to calculations performed on a processor with imaging software for various optical conditions and exposed feature criteria.Type: ApplicationFiled: May 18, 2004Publication date: October 28, 2004Inventors: H. Daniel Dulman, William A. Stanton
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Patent number: 6803155Abstract: A method of formulating and fabricating a mask pattern and resulting mask for forming isolated or closely spaced contact holes in an integrated circuit. The mask has a transparent mask substrate and patterned regions of attenuating phase shift material and opaque, partially transmissive or transparent material arranged to reduce the effect of side lobes and improve depth of focus. The rims, frames and outrigger patterns for the attenuating phase shift material and opaque, partially transmissive or transparent material are determined according to calculations performed on a processor with imaging software for various optical conditions and exposed feature criteria.Type: GrantFiled: July 31, 2001Date of Patent: October 12, 2004Assignee: Micron Technology, Inc.Inventors: H. Daniel Dulman, William A. Stanton
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Publication number: 20040180272Abstract: The invention encompasses a radiation-patterning tool. The tool is configured to be utilized to print a pair of structures in a radiation-sensitive material. The tool includes two separate and discrete features, with one of the features corresponding to one of the structures of the pair of structures and the other of the two features correspond to the other of the structures. At least one element is between the features. The at least one element is at least partially transparent to radiation passing through the radiation-patterning tool, but does not correspond to a discrete structure printed in the radiation-sensitive material. The element modifies the structures printed from the pair of features. The invention also includes printing methods and methods of forming aligned structures with radiation-sensitive material.Type: ApplicationFiled: March 24, 2004Publication date: September 16, 2004Inventors: H. Daniel Dulman, William A. Stanton
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Publication number: 20040180273Abstract: The invention encompasses a radiation-patterning tool. The tool is configured to be utilized to print a pair of structures in a radiation-sensitive material. The tool includes two separate and discrete features, with one of the features corresponding to one of the structures of the pair of structures and the other of the two features correspond to the other of the structures. At least one element is between the features. The at least one element is at least partially transparent to radiation passing through the radiation-patterning tool, but does not correspond to a discrete structure printed in the radiation-sensitive material. The element modifies the structures printed from the pair of features. The invention also includes printing methods and methods of forming aligned structures with radiation-sensitive material.Type: ApplicationFiled: March 24, 2004Publication date: September 16, 2004Inventors: H. Daniel Dulman, William A. Stanton
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Patent number: 6737200Abstract: A method for fabricating a mask which includes a printable contact and/or line area which is aligned with a phase-shifter. The method includes preparing a mask-in-process comprising a substrate underlying a first layer, an opaque layer overlying the first layer, and a first resist material overlying the opaque layer, and subjecting the mask-in-process to a plurality of exposures and at least one etching to create a phase-shifter and to open a printable contact and/or line area surrounded by a second resist material, wherein the printable contact and/or line area is aligned with the phase-shifter.Type: GrantFiled: January 29, 2001Date of Patent: May 18, 2004Assignee: Micron Technology, Inc.Inventors: H. Daniel Dulman, William A. Stanton
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Publication number: 20040038134Abstract: The invention encompasses a radiation-patterning tool. The tool is configured to be utilized to print a pair of structures in a radiation-sensitive material. The tool includes two separate and discrete features, with one of the features corresponding to one of the structures of the pair of structures and the other of the two features correspond to the other of the structures. At least one element is between the features. The at least one element is at least partially transparent to radiation passing through the radiation-patterning tool, but does not correspond to a discrete structure printed in the radiation-sensitive material. The element modifies the structures printed from the pair of features. The invention also includes printing methods and methods of forming aligned structures with radiation-sensitive material.Type: ApplicationFiled: August 21, 2002Publication date: February 26, 2004Inventors: H. Daniel Dulman, William A. Stanton
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Publication number: 20040031013Abstract: The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.Type: ApplicationFiled: August 6, 2002Publication date: February 12, 2004Inventors: H. Daniel Dulman, William A. Stanton, John R.C. Futrell
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Publication number: 20030152844Abstract: The invention includes, for example, a radiation patterning tool which can be utilized to form relatively circular contacts in situations in which an array of contacts has a different pitch along a row of the array than along a column of the array. An alternating phase shift can give a well-defined contact in the small pitch (dense) direction. Rim shifters are added in the larger pitch direction to force the circular form of the contact openings. In further aspects of the invention, side-lobe-suppressing patterns can be added between adjacent rims. The invention also includes methods of forming radiation patterning tools.Type: ApplicationFiled: February 5, 2002Publication date: August 14, 2003Inventor: H. Daniel Dulman