Patents by Inventor H. Silvis
H. Silvis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11807777Abstract: Amorphous coatings and coated articles having amorphous coatings are disclosed. The amorphous coating comprises a first layer and a second layer, the first layer being proximal to a metal substrate compared to the second layer, the second layer being distal from the metal substrate compared to the first layer. The first layer and the second layer comprise carbon, hydrogen, and silicon. The first layer further comprises oxygen.Type: GrantFiled: February 26, 2020Date of Patent: November 7, 2023Assignee: Silcotek Corp.Inventors: David A. Smith, James B. Mattzela, Paul H. Silvis, Gary A. Barone, Martin E. Higgins
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Patent number: 11292924Abstract: A coated article is disclosed. The article includes a coating formed by thermal decomposition, oxidation then functionalization. The article is configured for a marine environment, the marine environment including fouling features. The coating is resistant to the fouling features. Additionally or alternatively, the article is a medical device configured for a protein-containing environment, the protein-containing environment including protein adsorption features. The coating is resistant to the protein adsorption features.Type: GrantFiled: April 7, 2015Date of Patent: April 5, 2022Assignee: Silcotek Corp.Inventors: David A. Smith, Min Yuan, James B. Mattzela, Paul H. Silvis
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Patent number: 10876206Abstract: Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The thermal chemical vapor deposition coated article includes a substrate and a coating on the substrate, the coating having multiple layers and being positioned on regions of the thermal chemical vapor deposition coated article that are unable to be concurrently coated through line-of-sight techniques. The coating has a concentration of particulate from gas phase nucleation, per 100 square micrometers, of fewer than 6 particles having a dimension of greater than 0.5 micrometers. The thermal chemical vapor deposition process includes introducing a multiple aliquot of a silicon-containing precursor to the enclosed vessel with intermediate gaseous soaking to produce the coated article.Type: GrantFiled: August 31, 2016Date of Patent: December 29, 2020Assignee: SILCOTEK CORP.Inventors: Thomas F. Vezza, James B. Mattzela, Gary A. Barone, William David Grove, Paul H. Silvis
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Patent number: 10731247Abstract: The present invention relates to a coated article. The coated article includes a first layer, a second layer, and a diffusion region between the first layer and the second layer. The first layer has a first atomic concentration of C, a first atomic concentration of Si, and a first atomic concentration of O. The second layer has a first atomic concentration of Fe, a first atomic concentration of Cr, and a first atomic concentration of Ni. The diffusion region has a second atomic concentration of the C, a second atomic concentration of the Si, a second atomic concentration of the O, a second atomic concentration of the Fe, a second atomic concentration of the Cr, and a second atomic concentration of the Ni. All of the atomic concentrations are based upon Auger Electron Spectroscopy.Type: GrantFiled: August 22, 2017Date of Patent: August 4, 2020Assignee: SILCOTEK CORP.Inventors: David A. Smith, James B. Mattzela, Paul H. Silvis, Gary A. Barone
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Publication number: 20200190336Abstract: Amorphous coatings and coated articles having amorphous coatings are disclosed. The amorphous coating comprises a first layer and a second layer, the first layer being proximal to a metal substrate compared to the second layer, the second layer being distal from the metal substrate compared to the first layer. The first layer and the second layer comprise carbon, hydrogen, and silicon. The first layer further comprises oxygen.Type: ApplicationFiled: February 26, 2020Publication date: June 18, 2020Inventors: David A. SMITH, James B. Mattzela, Paul H. Silvis, Gary A. Barone, Martin E. Higgins
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Patent number: 10604660Abstract: A wear coating is disclosed that includes a layer treated by a trifunctional organosilane. An article is also disclosed, the article having a surface to which the wear coating is applied. A method of applying the wear coating is also disclosed. In some embodiments, the organosilane is trimethylsilane and the wear coating is applied by chemical vapor deposition, followed by heat treating the wear coating in the presence of the trimethylsilane.Type: GrantFiled: October 5, 2011Date of Patent: March 31, 2020Assignee: SILCOTEK CORP.Inventors: David A. Smith, James B. Mattzela, Paul H. Silvis, Gary A. Barone, Martin E. Higgins
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Patent number: 10487402Abstract: Coated articles are disclosed. One embodiment of a coated article includes a substrate capable of being subjected to corrosion and a deposited coating on the substrate. The deposited coating has silicon with the substrate resisting corrosion with the deposited coating on the substrate when exposed to 15% NaClO by a rate of at least 5% greater than the corrosion rate of a coating applied with the same process but without introducing the deposition gas at the sub-decomposition temperature and/or the substrate with the deposited coating having a 15% NaClO corrosion rate of between 0 and 3 mils per year.Type: GrantFiled: February 13, 2018Date of Patent: November 26, 2019Assignee: SILCOTEK CORPInventors: Min Yuan, David A. Smith, Paul H. Silvis, James B. Mattzela
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Patent number: 10323321Abstract: Thermal chemical vapor deposition processes and coated articles are disclosed. The coated article includes a surface having a surface impurity and a coating on the surface formed by thermally reacting a gas. In comparison to a comparable coating without the surface impurity, the coating on the surface has substantially the same level of adhesion, corrosion resistance over 24 hours in 6M HCl, corrosion resistance over 72 hours in NaClO, and electrochemical impedance spectroscopy results. Additionally or alternatively, the surface impurity has properties that reduce or eliminate adhesion of a comparative coating produced by decomposition of silane on a comparative surface following exposure of the surface to a temperature.Type: GrantFiled: January 8, 2016Date of Patent: June 18, 2019Assignee: SILCOTEK CORP.Inventors: Min Yuan, Paul H. Silvis, James B. Mattzela
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Patent number: 9975143Abstract: Chemical vapor deposition articles and processes include a chemical vapor deposition functionalization on a material, the material including an sp3 arrangement of carbon. The chemical vapor deposition functionalization is positioned to be contacted by a process fluid, a hydrocarbon, an analyte, exhaust, or a combination thereof. Additionally or alternatively, the chemical vapor deposition functionalization is not of a refrigerator shelf or a windshield.Type: GrantFiled: May 14, 2014Date of Patent: May 22, 2018Assignee: Silcotek Corp.Inventors: David A. Smith, Paul H. Silvis
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Patent number: 9915001Abstract: A chemical vapor deposition process and coated article are disclosed. The chemical vapor deposition process includes positioning an article in a chemical vapor deposition chamber, then introducing a deposition gas to the chemical vapor deposition chamber at a sub-decomposition temperature that is below the thermal decomposition temperature of the deposition gas, and then heating the chamber to a super-decomposition temperature that is equal to or above the thermal decomposition temperature of the deposition gas resulting in a deposited coating on at least a surface of the article from the introducing of the deposition gas. The chemical vapor deposition process remains within a pressure range of 0.01 psia and 200 psia and/or the deposition gas is dimethylsilane. The coated article includes a substrate subject to corrosion and a deposited coating on the substrate, the deposited coating having silicon, and corrosion resistance.Type: GrantFiled: August 10, 2015Date of Patent: March 13, 2018Assignee: Silcotek Corp.Inventors: Min Yuan, David A. Smith, Paul H. Silvis, James B. Mattzela
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Patent number: 9777368Abstract: The present invention relates to a chemical vapor deposition coating, a chemical vapor deposition article, and a chemical vapor deposition method. The coating, article, and method involve thermal decomposition of dimethylsilane to achieve desired surface properties.Type: GrantFiled: October 26, 2010Date of Patent: October 3, 2017Assignee: Silcotek Corp.Inventors: David A. Smith, James B. Mattzela, Paul H. Silvis, Gary A. Barone
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Patent number: 8656753Abstract: A sleeve unit for preparing a sample for gas chromatographic analysis comprises an inlet liner having a bore therein, an inlet to the bore, and an outlet from the bore, and an inlet liner insert located with the bore. The inlet liner insert extends across the bore to cause a sample being prepared for gas chromatographic analysis to flow through the inlet liner insert. The inlet liner insert comprises an arrangement of wire, the arrangement creating a restricted pathway for the sample as the sample flows through the bore of the inlet liner to the outlet of the bore, and the wire having a surface having a high thermal conductivity and being substantially chemically inert to the sample.Type: GrantFiled: June 6, 2008Date of Patent: February 25, 2014Inventors: Paul H. Silvis, Thomas E. Kane
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Publication number: 20130244025Abstract: A wear coating is disclosed that includes a layer treated by a trifunctional organosilane. An article is also disclosed, the article having a surface to which the wear coating is applied. A method of applying the wear coating is also disclosed. In some embodiments, the organosilane is trimethylsilane and the wear coating is applied by chemical vapor deposition, followed by heat treating the wear coating in the presence of the trimethylsilane.Type: ApplicationFiled: October 5, 2011Publication date: September 19, 2013Applicant: SILCOTEK CORP.Inventors: David A. Smith, James B. Mattzela, Paul H. Silvis, Gary A. Barone, Martin E. Higgins
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Publication number: 20120251797Abstract: The present invention relates to a chemical vapor deposition coating, a chemical vapor deposition article, and a chemical vapor deposition method. The coating, article, and method involve thermal decomposition of dimethylsilane to achieve desired surface properties.Type: ApplicationFiled: October 26, 2010Publication date: October 4, 2012Applicant: SILCOTEK CORP.Inventors: David A. Smith, James B. Mattzela, Paul H. Silvis, Gary A. Barone
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Publication number: 20080090007Abstract: A method comprising forming a coating solution which comprises a matrix precursor material, a porogen material and a solvent, by selecting a polyarylene matrix precursor material which cross-links to form a matrix with a calculated cross-link moeity density of at least 0.003 moles/ml, and reacting the polyarylene matrix precursor material with a porogen which is linear oligomer or polymer which is formed from monomers comprising alkenyl or alkynyl functional monomers, which has reactive end groups and a weight average molecular weight in the range of less than about 5000, where the porogen is present in amounts in the range of about 10 to less than 50 percent by weight based on total weight of porogens and matrix precursor material.Type: ApplicationFiled: June 10, 2004Publication date: April 17, 2008Inventors: Q. Jason Niu, Jerry Hahnfeld, John Lyons, James Sedon, H. Silvis
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Patent number: 7316730Abstract: An inlet seal assembly for sealing an injection port member in a chromatography instrument , comprising an injection port member having a raised metal ring, an inlet seal member with an upper surface, a peripheral groove formed in the inlet seal member upper surface, a soft resinous plastic material ring positioned in the peripheral groove opposite the raised metal sealing ring, a reducing nut holding the inlet seal member against the injection port member, and threads connecting the reducing nut to the injection port member whereby to press the soft ring against the raised metal sealing ring to form a seal. The inlet seal assembly also may have a bottom seal between the inlet seal member and the reducing nut. A method of making and using the inlet seal assembly.Type: GrantFiled: July 9, 2004Date of Patent: January 8, 2008Assignee: Restek CorporationInventors: Bradley R. Rightnour, Michael A. Goss, Paul H. Silvis, Christopher S. Cox
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Publication number: 20060267000Abstract: A monomer suitable for use in forming low dielectric constant films in semiconductor devices comprising i) two dienophile groups (A-functional groups) attached to a single aromatic ring and ii) a second ring structure comprising two conjugated carbon-to-carbon double bonds and a leaving group L (B-functional group), characterized in that said single aromatic ring is directly covalently attached to one of the double bonded carbons of the B functional group or to a fused aromatic ring containing two such double bonded carbons of the B-functional group, and one A-functional group of one monomer is capable of reaction under cycloaddition reaction conditions with the B-functional group of a second monomer to thereby form a polymer.Type: ApplicationFiled: April 1, 2004Publication date: November 30, 2006Inventors: James Godschalx, Robert Hefner, Q. Niu, H. Silvis
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Patent number: 5487569Abstract: An easily-assembled, heat resistant connector for releasably joining end portions of three capillary tubes for use in chromatography without interrupting flow or interfering with chromatographic results comprises a main body, and a glass insert which has first, second and third hollow legs that are connected together at a central portion, and a connector that connects each leg of the glass insert to a capillary tube. Each leg of the glass insert extends outwardly from the central portion towards an open end portion, and each leg has an inboard bore with a taper that receives and end portion of one of the capillary tubes. The taper is wider near the open end portion of the leg and narrower near the central portion. The connectors are mounted on the main body and a sealing ferrule is provided in each connector for making a seal between the capillary tubes and the legs of the glass insert.Type: GrantFiled: October 12, 1994Date of Patent: January 30, 1996Assignee: Restek CorporationInventors: Paul H. Silvis, Bradley R. Rightnour
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Patent number: 5288113Abstract: An easily-assembled, heat-resistant connector for releasably joining end portions of two capillary tubes in end-to-end fashion for use in chromatography without interrupting fluid flow or interfering with chromatographic results, comprises a cylindrical sleeve which has a bore which tapers toward a center point to form press-fit seals with the tips of two capillary tubes. A first ferrule is mounted on the end portion of a first capillary tube, and a second ferrule is mounted on the end portion of a second capillary tube. A jacket surrounds and contains the sleeve, and a first adjustment screw mounted on the jacket pushes against the first ferrule to deform the ferrule into sealing contact with the outside surface of the first capillary tube and with the inside surface of the sleeve. A second adjustment screw mounted on the jacket pushes against the second ferrule to deform the ferrule into sealing contact with the outside surface of the second capillary tube and with the inside surface of the sleeve.Type: GrantFiled: December 24, 1992Date of Patent: February 22, 1994Assignee: Restek CorporationInventors: Paul H. Silvis, Bradley R. Rightnour, Richard A. Morehead
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Patent number: 5119669Abstract: A sleeve unit for converting a liquid sample into a sample gas and for mixing the sample gas and a carrier gas into a uniform gas mixture and delivering the gas mixture to the inlet end of a capillary tube of a gas chromatograph comprises a tubular liner having a bore, an inlet expansion chamber in the bore for changing a liquid sample into a sample gas, a mixing chamber in the bore next to the inlet chamber, a spiral core baffle inside the mixing chamber for thoroughly mixing the sample gas and the carrier gas into a uniform gas mixture by guiding the sample gas and the carrier gas into a spiral path around the spiral core baffle between the baffle and the liner, and an outlet chamber next to the mixing chamber for delivering the thoroughly mixed sample and carrier gases to an inlet end of a capillary tube of a gas chromatograph.Type: GrantFiled: July 31, 1990Date of Patent: June 9, 1992Assignee: Restek CorporationInventors: Paul H. Silvis, Joseph W. Walsh, David M. Shelow