Patents by Inventor H. Ufuk Alpay

H. Ufuk Alpay has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Damage resistant photomask construction
    Patent number: 6841309
    Abstract: A method for fabricating a damage resistant photomask includes forming a photomask pattern on a substrate and forming a transparent, protective coating on the photomask pattern. The protective coating may be an electrical insulator (e.g., spin-on glass). In addition, an antireflective layer may be applied to the protective coating. A pellicle may also be attached over the protective coating. The protective coating may prevent electrostatic energy from forming on or arcing between features on the photomask pattern and damaging the features. The protective layer may also prevent the photomask pattern from being damaged by or reacting with other substances, such as cleaning solutions.
    Type: Grant
    Filed: January 11, 2002
    Date of Patent: January 11, 2005
    Assignee: DuPont Photomasks, Inc.
    Inventors: H. Ufuk Alpay, Joseph S. Gordon, Gregory P. Hughes, Franklin D. Kalk