Patents by Inventor H.Y. Chang

H.Y. Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and Method for Particle Monitoring in Immersion Lithography
    Publication number: 20070268469
    Abstract: The present disclosure provides an immersion lithography system. The system includes an imaging lens having a front surface; a substrate stage positioned underlying the front surface of the imaging lens; an immersion fluid retaining structure having a fluid inlet and a fluid outlet, configured to hold a fluid from the fluid inlet, at least partially filling a space between the front surface and a substrate on the substrate stage, and flowing the fluid out through the fluid outlet; and a particle monitor module integrated with the immersion fluid retaining structure.
    Type: Application
    Filed: May 17, 2006
    Publication date: November 22, 2007
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Tzung Chi Fu, Shu-Ping Hsu, H.Y. Chang