Abstract: A sensor device including a deflectable membrane made of a 2D nanomaterial, a first optical waveguide for guiding light, disposed adjacent to the membrane and extending along the surface of the membrane at least in a first section, as well as a measuring device for measuring, within the first section the influence of the membrane on an evanescent wave range of the light guided along the first optical waveguide. The influence of the membrane on the light guided in the optical waveguide, in particular on the evanescent wave range of the light, can be measured interferometrically by detecting phasing differences or phase shifts. This allows for a force-free readout of the membrane deflection. By using very thin 2D nanomaterials, the membrane can also react to very quick changes in force.

Abstract: A sensor device including a deflectable membrane made of a 2D nanomaterial, a first optical waveguide for guiding light, disposed adjacent to the membrane and extending along the surface of the membrane at least in a first section, as well as a measuring device for measuring, within the first section the influence of the membrane on an evanescent wave range of the light guided along the first optical waveguide. The influence of the membrane on the light guided in the optical waveguide, in particular on the evanescent wave range of the light, can be measured interferometrically by detecting phasing differences or phase shifts. This allows for a force-free readout of the membrane deflection. By using very thin 2D nanomaterials, the membrane can also react to very quick changes in force.

Abstract: In order to be able to measure topographies on wafers or devices in a fashion free from destruction, the invention provides a method for measuring three-dimensional topographic structures (22) on wafers (2) or devices in which with the aid of a confocal microscope (1) at least one fluorescing topographic structure (22) is scanned with excitation light, and the fluorescence light emitted from the focal point (17) in the focal plane (19) of the objective (15) and excited by the excitation light is detected, and measured data are obtained from the position of the focal point (17) and the detected fluorescence signal.

Abstract: The invention relates to a method of plasma etching substrates, in particular of etching tapered passages through substrates, using a process gas comprising at least one halogenide and oxygen.