Patents by Inventor Hae-Kwang PYUN

Hae-Kwang PYUN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Aromatic resins for underlayers
    Patent number: 10377848
    Abstract: Polymeric reaction products of certain aromatic alcohols with certain diaryl-substituted aliphatic alcohols are useful as underlayers in semiconductor manufacturing processes.
    Type: Grant
    Filed: April 7, 2016
    Date of Patent: August 13, 2019
    Assignees: Rohm and Haas Electronic Materials LLC, Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Seon-Hwa Han, Sung Wook Cho, Hae-Kwang Pyun, Jung-June Lee, Shintaro Yamada
  • Aromatic resins for underlayers
    Patent number: 9334357
    Abstract: Polymeric reaction products of certain aromatic alcohols with certain diaryl-substituted aliphatic alcohols are useful as underlayers in semiconductor manufacturing processes.
    Type: Grant
    Filed: April 30, 2015
    Date of Patent: May 10, 2016
    Assignees: Rohm and Haas Electronic Materials LLC, Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Seon-Hwa Han, Sung Wook Cho, Hae-Kwang Pyun, Jung-June Lee, Shintaro Yamada
  • AROMATIC RESINS FOR UNDERLAYERS
    Publication number: 20150315333
    Abstract: Polymeric reaction products of certain aromatic alcohols with certain diaryl-substituted aliphatic alcohols are useful as underlayers in semiconductor manufacturing processes.
    Type: Application
    Filed: April 30, 2015
    Publication date: November 5, 2015
    Inventors: Seon-Hwa HAN, Sung Wook CHO, Hae-Kwang PYUN, Hae-Kwang Pyun, Jung-June LEE, Shintaro YAMADA