Abstract: Provided is a method for etching an atomic layer. The method for etching the atomic layer includes providing a substrate to a process chamber, wherein the process chamber comprises a first chamber part and a second chamber part, and the substrate is provided in the second chamber part, generating adsorption gas plasma in the first chamber part, adsorbing radicals of the adsorption gas plasma to the substrate so as to form a treatment layer, generating etching gas plasma in the first chamber part, and allowing electrons and ions of the etching gas plasma to be alternately incident into the treatment layer so as to perform desorption of the treatment layer.

Abstract: The present invention relates to a hydraulic turbine for generating hydraulic power 100 comprising a rotating shaft 110 which is formed in a vertical direction; and a plurality of rotating wings 120 which is installed in a radial direction centering on the rotating shaft 110 to thereby efficiently convert hydraulic power from river into electric energy without building a dam.