Patents by Inventor Hae Seok Ji
Hae Seok Ji has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7504547Abstract: Disclosed herein is a method of preparing a perfluoroalkadiene. A dihaloperfluorocarbon used as a starting material is added dropwise to a nonpolar organic solvent, a metal powder and an organic metal compound. The dihaloperfluorocarbon is slowly added dropwise in a temperature range from 30° C. to 150° C. for a certain period of time. Moreover, the nonpolar organic solvent used may be benzene, toluene, xylene, etc., and the organic metal compound is used by being dissolved in ethyl ether or tetrahydrofuran at a concentration of 1 to 3M. The metal powder used may be Mg, Zn, Cd, etc.Type: GrantFiled: May 2, 2007Date of Patent: March 17, 2009Assignee: Foosung Co., Ltd.Inventors: Hae-Seok Ji, Ook-Jae Cho, Jae-Gug Ryu, Young-Hoon Ahn, Bong-Suk Kim, Dong-Hyun Kim
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Publication number: 20080262195Abstract: Disclosed herein is a method of preparing a perfluoroalkadiene. A dihaloperfluorocarbon used as a starting material is added dropwise to a nonpolar organic solvent, a metal powder and an organic metal compound. The dihaloperfluorocarbon is slowly added dropwise in a temperature range from 30° C. to 150° C. for a certain period of time. Moreover, the nonpolar organic solvent used may be benzene, toluene, xylene, etc., and the organic metal compound is used by being dissolved in ethyl ether or tetrahydrofuran at a concentration of 1 to 3M. The metal powder used may be Mg, Zn, Cd, etc.Type: ApplicationFiled: May 2, 2007Publication date: October 23, 2008Inventors: Hae-Seok Ji, Ook-Jae Cho, Jae-Gug Ryu, Young-Hoon Ahn, Bong-Suk Kim, Dong-Hyun Kim
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Publication number: 20080203353Abstract: The invention is a method for continuously preparing highly pure octafluorocyclopentene for use in dry-etching processes. The method includes reacting octachlorocyclopentene with KF in a continuous manner, and purifying crude octafluorocyclopentene. In the reacting step, two KF-charged filters are installed in parallel and allowed to communicate with a reactor containing octachlorocyclopentene in an alternating manner to produce crude octafluorocyclopentene. In the purifying step, organics having lower boiling points than octafluorocyclopentene are removed, and metal ingredients and organics having boiling points higher than octafluorocyclopentene are separated to recover octafluorocyclopentene as a gas. The gaseous octafluorocyclopentene composition contains C5F8 in an amount of 99.995 vol % or higher, nitrogen in an amount of 50 vol ppm or less, oxygen in an amount of 5 vol ppm or less, water in an amount of 5 vol ppm or less, and metal ingredients in an amount of 5 wt ppb or less.Type: ApplicationFiled: January 14, 2008Publication date: August 28, 2008Applicant: ULSAN CHEMICAL Co., Ltd.Inventors: Hae Seok JI, Ook Jae Cho, Jae Gug Ryu, Jong Yeol Yang, Young Hoon Ahn, Bong Suk Kim, Dong Hyun Kim
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Patent number: 7319174Abstract: The invention is a method for continuously preparing highly pure octafluorocyclopentene for use in dry-etching processes. The method includes reacting octachlorocyclopentene with KF in a continuous manner, and purifying crude octafluorocyclopentene. In the reacting step, two KF-charged filters are installed in parallel and allowed to communicate with a reactor containing octachlorocyclopentene in an alternating manner to produce crude octafluorocyclopentene. In the purifying step, organics having lower boiling points than octafluorocyclopentene are removed, and metal ingredients and organics having boiling points higher than octafluorocyclopentene are separated to recover octafluorocyclopentene as a gas. The gaseous octafluorocyclopentene composition contains C5F8 in an amount of 99.995 vol % or higher, nitrogen in an amount of 50 vol ppm or less, oxygen in an amount of 5 vol ppm or less, water in an amount of 5 vol ppm or less, and metal ingredients in an amount of 5 wt ppb or less.Type: GrantFiled: September 25, 2006Date of Patent: January 15, 2008Assignee: Ulsan Chemical Co., Ltd.Inventors: Hae Seok Ji, Ook Jae Cho, Jae Gug Ryu, Jong Yeol Yang, Young Hoon Ahn, Bong Suk Kim, Dong Hyun Kim
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Publication number: 20070265478Abstract: The invention is a method for continuously preparing highly pure octafluorocyclopentene for use in dry-etching processes. The method includes reacting octachlorocyclopentene with KF in a continuous manner, and purifying crude octafluorocyclopentene. In the reacting step, two KF-charged filters are installed in parallel and allowed to communicate with a reactor containing octachlorocyclopentene in an alternating manner to produce crude octafluorocyclopentene. In the purifying step, organics having lower boiling points than octafluorocyclopentene are removed, and metal ingredients and organics having boiling points higher than octafluorocyclopentene are separated to recover octafluorocyclopentene as a gas. The gaseous octafluorocyclopentene composition contains C5F8 in an amount of 99.995 vol % or higher, nitrogen in an amount of 50 vol ppm or less, oxygen in an amount of 5 vol ppm or less, water in an amount of 5 vol ppm or less, and metal ingredients in an amount of 5 wt ppb or less.Type: ApplicationFiled: September 25, 2006Publication date: November 15, 2007Applicant: ULSAN CHEMICAL Co., Ltd.Inventors: Hae Seok JI, Ook Jae Cho, Jae Gug Ryu, Jong Yeol Yang, Young Hoon Ahn, Bong Suk Kim, Dong Hyun Kim
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Patent number: 6841705Abstract: A method of producing difluoromethane (HFC-32), which includes firstly reacting methylene chloride with hydrogen fluoride in gas phase at 280 to 340° C. in the presence of a fluorination catalyst to produce chlorofluoro methane, and secondly reacting the chlorofluoro methane with hydrogen fluoride in liquid phase at 60 to 80° C. in the presence of an antimony chloride catalyst. The method is advantageous in that HFC-32 is produced in high yield under mild reaction conditions using a relatively small amount of energy.Type: GrantFiled: February 24, 2003Date of Patent: January 11, 2005Assignee: Ulsan Chemical Co., Ltd.Inventors: Iikubo Yuichi, Hae Seok Ji, Ook Jae Cho
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Publication number: 20040102659Abstract: Disclosed is a method of producing difluoromethane (HFC-32), which comprises firstly reacting methylene chloride with hydrogen fluoride in gas phase at 280 to 340° C. in the presence of a fluorinated catalyst to produce chlorofluoro methane, and secondly reacting the chlorofluoro methane with hydrogen fluoride in liquid phase at 60 to 80° C. in the presence of an antimony chloride catalyst. The method is advantageous in that HFC-32 is produced in high yield under mild reaction conditions using a relatively small amount of energy.Type: ApplicationFiled: February 24, 2003Publication date: May 27, 2004Applicant: ULSAN CHEMICAL Co., Ltd.Inventors: Iikubo Yuichi, Hae-Seok Ji, Ook-Jae Cho
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Publication number: 20040101448Abstract: Disclosed is a reactor for producing a hydrofluorocarbon compound by reacting a chlorinated organic compound with hydrogen fluoride in liquid phase in the presence of an antimony chlorofluoride catalyst, comprising an inner wall B lined with a polytetrafluoroethylene (PTFE) resin, and an outer wall A. A space G of 2 to 10 mm is formed between the inner wall and the outer wall, and maintained by spiral baffles. Additionally, a plurality of vent holes with diameter of 2 to 5 mm are formed, at regular intervals of 150 to 300 mm, on the whole inner wall of the reactor. The reactor is advantageous in that the PTFE resin lined on the inner wall of the reactor is not degraded, thereby prolonging a reactor's life span and easily supplying heat to the reactor.Type: ApplicationFiled: February 24, 2003Publication date: May 27, 2004Applicant: ULSAN CHEMICAL Co., Ltd.Inventors: Iikubo Yuichi, Hae-Seok Ji, Ook-Jae Cho