Patents by Inventor Haek-seung Han

Haek-seung Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods of correcting optical parameters in photomasks
    Patent number: 8435705
    Abstract: A method of correcting an optical parameter in a photomask is provided. The method includes providing a photomask, exposing the photomask, detecting an aerial image to estimate the photomask, and irradiating gas cluster ion beams to the photomask based on an estimation result to correct the optical parameter in the photomask in relation to the aerial image. The gas cluster ion beams may be irradiated to a front surface of the photomask on which a mask pattern is formed or a rear surface of the photomask on which the mask pattern is not formed.
    Type: Grant
    Filed: March 28, 2011
    Date of Patent: May 7, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Haek-seung Han, Dong-seok Nam, Sang-gyun Woo
  • Methods of Correcting Optical Parameters in Photomasks
    Publication number: 20110244374
    Abstract: A method of correcting an optical parameter in a photomask is provided. The method includes providing a photomask, exposing the photomask, detecting an aerial image to estimate the photomask, and irradiating gas cluster ion beams to the photomask based on an estimation result to correct the optical parameter in the photomask in relation to the aerial image. The gas cluster ion beams may be irradiated to a front surface of the photomask on which a mask pattern is formed or a rear surface of the photomask on which the mask pattern is not formed.
    Type: Application
    Filed: March 28, 2011
    Publication date: October 6, 2011
    Inventors: Haek-seung Han, Dong-seok Nam, Sang-gyun Woo