Patents by Inventor Haeng-Deog Koh

Haeng-Deog Koh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200341341
    Abstract: An electrochromic material including a nanostructure including a nickel oxide wire which is three-dimensionally interconnected wherein a thickness of the nickel oxide wire is less than about 10 nanometers, and an electrochromic device, an optical device, and an electronic device including the same.
    Type: Application
    Filed: January 3, 2020
    Publication date: October 29, 2020
    Inventors: Haeng Deog KOH, Ha Jin KIM, Min Jong BAE
  • Patent number: 10556412
    Abstract: A composition for an adhesion layer of a gas barrier adhesive sheet including a gas blocking film and an adhesion layer including at least one compound selected from a compound represented by Chemical Formula 1, at least one compound selected from a compound represented by Chemical Formula 2, and optionally, a compound represented by Chemical Formula 3. wherein groups and variables in Chemical Formulae 1 to 3 are the same as described in the specification.
    Type: Grant
    Filed: July 31, 2015
    Date of Patent: February 11, 2020
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Haeng Deog Koh, Eun Joo Jang, Hyun A Kang
  • Patent number: 10053556
    Abstract: A barrier coating composition including: a monomer combination including a first monomer having at least two thiol groups at its terminal end and a second monomer having at least two carbon-carbon unsaturated bond-containing groups at its terminal end; and a plurality of organo-modified clay particles dispersed in the monomer combination, wherein the organo-modified clay particles include a compound having a hydrocarbyl group linked to a heteroatom, and wherein the compound is a primary, secondary, or tertiary amine, a quaternary organoammonium salt, a primary, secondary, or tertiary phosphine, a quaternary organophosphonium salt, a thiol including an amine group, or a combination thereof.
    Type: Grant
    Filed: October 22, 2015
    Date of Patent: August 21, 2018
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Tomoyuki Kikuchi, EunJoo Jang, Hyun A Kang, Nayoun Won, Oul Cho, Haeng Deog Koh
  • Patent number: 9963632
    Abstract: A quantum dot-resin nanocomposite including a nanoparticle including a curable resin and a plurality of quantum dots contacting the nanoparticle. Also, a method of preparing the nanocomposite, and a molded article including the nanocomposite.
    Type: Grant
    Filed: June 18, 2014
    Date of Patent: May 8, 2018
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Haeng Deog Koh, Hyun A Kang, Eun Joo Jang, Na Youn Won
  • Patent number: 9557639
    Abstract: A method of patterning a block copolymer layer, the method including: providing a substrate with a guide pattern formed on a surface thereof; forming a block copolymer layer on the substrate with the guide pattern, the block copolymer layer including a block copolymer; and directing self-assembly of the block copolymer on the substrate according to the guide pattern to form n/2 discrete domains, wherein the guide pattern includes a block copolymer patterning area having a 90-degree bending portion, and an outer apex and an inner apex of the 90-degree bending portion are each rounded, the outer apex having a first curvature radius r1, and the inner apex having a second curvature radius r2, respectively, and the width of the patterning area W, the first curvature radius r1 and the second curvature radius r2, satisfy Inequation 1: 2 + 2 - ( 1 + 2 ) [ ( n + 2 ) 2 n ? ( n + 1 ) ] 1 3 ? r 1 - r 2 W ? 2 + 2 - ( 1 + 2 ) [ ( n - 2 ) 2 n ? ( n - 1 )
    Type: Grant
    Filed: November 13, 2013
    Date of Patent: January 31, 2017
    Assignees: SAMSUNG ELECTRONICS CO., LTD., YONSEI UNIVESITY, UNIVERSITY-INDUSTRY FOUNDATION(UIF)
    Inventors: Mi-Jeong Kim, In Taek Han, June Huh, Seong-Jun Jeong, Haeng Deog Koh, Youn Jung Park
  • Patent number: 9417520
    Abstract: A method of patterning a block copolymer layer, the method including: providing a substrate including a topographic pattern on a surface of the substrate, wherein the topographic pattern includes a trench and a mesa; forming, on the surface of the substrate, an underlayer including a polymer, wherein the polymer includes a repeating unit derived from a substituted or unsubstituted aromatic vinyl monomer and has an anchoring group; heat-treating the underlayer to anchor the underlayer to the surface of the substrate via the anchoring group; irradiating the heat-treated underlayer with light to form a crosslinked polymer with a crosslink between carbon atoms of main chains of the polymer; forming a block copolymer layer on the underlayer including the crosslinked polymer; and heat-treating the block copolymer layer to form a self-assembled structure of the block copolymer directed by the topographic pattern.
    Type: Grant
    Filed: February 4, 2014
    Date of Patent: August 16, 2016
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Haeng Deog Koh, Mi-Jeong Kim, In Taek Han
  • Publication number: 20160160060
    Abstract: A barrier coating composition including: a monomer combination including a first monomer having at least two thiol groups at its terminal end and a second monomer having at least two carbon-carbon unsaturated bond-containing groups at its terminal end; and a plurality of organo-modified clay particles dispersed in the monomer combination, wherein the organo-modified clay particles include a compound having a hydrocarbyl group linked to a heteroatom, and wherein the compound is a primary, secondary, or tertiary amine, a quaternary organoammonium salt, a primary, secondary, or tertiary phosphine, a quaternary organophosphonium salt, a thiol including an amine group, or a combination thereof.
    Type: Application
    Filed: October 22, 2015
    Publication date: June 9, 2016
    Inventors: Tomoyuki KIKUCHI, EunJoo JANG, Hyun A KANG, Nayoun WON, Oul CHO, Haeng Deog KOH
  • Publication number: 20160032160
    Abstract: A composition for an adhesion layer of a gas barrier adhesive sheet including a gas blocking film and an adhesion layer including at least one compound selected from a compound represented by Chemical Formula 1, at least one compound selected from a compound represented by Chemical Formula 2, and optionally, a compound represented by Chemical Formula 3. wherein groups and variables in Chemical Formulae 1 to 3 are the same as described in the specification.
    Type: Application
    Filed: July 31, 2015
    Publication date: February 4, 2016
    Inventors: Haeng Deog KOH, Eun Joo JANG, Hyun A. KANG
  • Patent number: 9029271
    Abstract: A method of patterning a block copolymer layer includes: providing a guide pattern on a surface of a substrate, the guide pattern including sidewalls each elongated in a longitudinal direction and spaced apart from each other, a trench defined by a bottom surface and facing surfaces of the sidewalls, and having a uniform width over an entire length thereof in the longitudinal direction, and a latitudinal wall perpendicular to the longitudinal direction of the trench; providing a block copolymer layer on the surface of the substrate; and annealing the block copolymer to cause self-assembly of the block copolymer and to direct the same in the trench. The block copolymer has a microphase-separation into anisotropic discrete domains aligned with a period ?o in the trench by the annealing.
    Type: Grant
    Filed: December 24, 2013
    Date of Patent: May 12, 2015
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Youn Jung Park, Haeng Deog Koh, Mi-Jeong Kim, Seong-Jun Jeong
  • Publication number: 20150083970
    Abstract: A quantum dot-resin nanocomposite including a nanoparticle including a curable resin and a plurality of quantum dots contacting the nanoparticle. Also, a method of preparing the nanocomposite, and a molded article including the nanocomposite.
    Type: Application
    Filed: June 18, 2014
    Publication date: March 26, 2015
    Inventors: Haeng Deog KOH, Hyun A KANG, Eun Joo JANG, Na Youn Won
  • Publication number: 20140234589
    Abstract: A method of patterning a block copolymer layer, the method including: providing a substrate including a topographic pattern on a surface of the substrate, wherein the topographic pattern includes a trench and a mesa; forming, on the surface of the substrate, an underlayer including a polymer, wherein the polymer includes a repeating unit derived from a substituted or unsubstituted aromatic vinyl monomer and has an anchoring group; heat-treating the underlayer to anchor the underlayer to the surface of the substrate via the anchoring group; irradiating the heat-treated underlayer with light to form a crosslinked polymer with a crosslink between carbon atoms of main chains of the polymer; forming a block copolymer layer on the underlayer including the crosslinked polymer; and heat-treating the block copolymer layer to form a self-assembled structure of the block copolymer directed by the topographic pattern.
    Type: Application
    Filed: February 4, 2014
    Publication date: August 21, 2014
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Haeng Deog KOH, Mi-Jeong KIM, In Taek HAN
  • Publication number: 20140193614
    Abstract: A method of patterning a block copolymer layer, the method including: providing a substrate with a guide pattern formed on a surface thereof; forming a block copolymer layer on the substrate with the guide pattern, the block copolymer layer including a block copolymer; and directing self-assembly of the block copolymer on the substrate according to the guide pattern to form n/2 discrete domains, wherein the guide pattern includes a block copolymer patterning area having a 90-degree bending portion, and an outer apex and an inner apex of the 90-degree bending portion are each rounded, the outer apex having a first curvature radius r1and the inner apex having a second curvature radius r2, respectively, and the width of the patterning area W, the first curvature radius r1 and the second curvature radius r2, satisfy Inequation 1: 2 + 2 - ( 1 + 2 ) [ ( n + 2 ) 2 n ? ( n + 1 ) ] 1 3 ? r 1 - r 2 W ? 2 + 2 - ( 1 + 2 ) [ ( n - 2 ) 2 n ? ( n - 1 ) ]
    Type: Application
    Filed: November 13, 2013
    Publication date: July 10, 2014
    Applicants: Yonsei University, University - Industry Foundation(UIF), SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Mi-Jeong KIM, In Taek HAN, June HUH, Seong-Jun Jeong, Haeng Deog KOH, Youn Jung PARK
  • Publication number: 20140187054
    Abstract: A method of patterning a block copolymer layer includes: providing a guide pattern on a surface of a substrate, the guide pattern including sidewalls each elongated in a longitudinal direction and spaced apart from each other, a trench defined by a bottom surface and facing surfaces of the sidewalls, and having a uniform width over an entire length thereof in the longitudinal direction, and a latitudinal wall perpendicular to the longitudinal direction of the trench; providing a block copolymer layer on the surface of the substrate; and annealing the block copolymer to cause self-assembly of the block copolymer and to direct the same in the trench. The block copolymer has a microphase-separation into anisotropic discrete domains aligned with a period ?o in the trench by the annealing.
    Type: Application
    Filed: December 24, 2013
    Publication date: July 3, 2014
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Youn Jung PARK, Haeng Deog KOH, Mi-Jeong KIM, Seong-Jun JEONG
  • Publication number: 20140142250
    Abstract: An organic crystalline composition is provided. The organic crystalline composition includes a main material having ?-conjugated back bone and a functional group containing an atom having an unshared electron pair, and a linking material combining with the adjacent main material at the functional group by quaternization, organic material-metal interaction, ionic bonding, or hydrogen bonding.
    Type: Application
    Filed: December 3, 2013
    Publication date: May 22, 2014
    Applicant: Gwangju Institute of Science And Technology
    Inventors: Jae-Suk Lee, Changej Mohammad, Haeng-Deog Koh, Samal Shashadhar, Nam-Goo Kang, Won-Jung Shin, Young-Jae Kim, Hong-Joon Lee, Walaa Elsawy
  • Publication number: 20130104973
    Abstract: A conductive paste includes a conductive powder, a metallic glass, an inorganic additive for fire-through, and an organic vehicle, and an electronic device and a solar cell including an electrode formed using the conductive paste.
    Type: Application
    Filed: September 6, 2012
    Publication date: May 2, 2013
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sang Soo JEE, Suk Jun KIM, Haeng Deog KOH, Yun Hyuk CHOI, Eun Sung LEE
  • Publication number: 20130004716
    Abstract: A paste may include a functional water-soluble material, a surfactant surrounding the functional water-soluble material to form a reverse micelle structure, a binder, and a liposoluble organic solvent, and an electronic device including at least one of a pattern and an electrode may be formed using the paste.
    Type: Application
    Filed: May 22, 2012
    Publication date: January 3, 2013
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Haeng Deog Koh, Eun Sung Lee, Sang Soo Jee, Jeong Na Heo, Suk Jun Kim, Se Yun Kim, Yun-Hyuk Choi
  • Publication number: 20110124820
    Abstract: Provided is a crystalline organic polymer in which a main chain formed of amorphous polymer or monomer having a functional group is combined with a side chain by quaternization, cross-linking, hydrogen bonding or organic material-metal interaction. The main chain material having a functional group is combined with the side chain material to have crystallinity, and the organic polymer having crystallinity exhibits excellent diode characteristics.
    Type: Application
    Filed: May 15, 2008
    Publication date: May 26, 2011
    Inventors: Jae-Suk Lee, Changej Mohammad, Haeng-Deog Koh, Samal Shashadhar, Nam-Goo Kang, Won-Jung Shin, Young-Jae Kim