Patents by Inventor Haeng-Deog Koh
Haeng-Deog Koh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20200341341Abstract: An electrochromic material including a nanostructure including a nickel oxide wire which is three-dimensionally interconnected wherein a thickness of the nickel oxide wire is less than about 10 nanometers, and an electrochromic device, an optical device, and an electronic device including the same.Type: ApplicationFiled: January 3, 2020Publication date: October 29, 2020Inventors: Haeng Deog KOH, Ha Jin KIM, Min Jong BAE
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Patent number: 10556412Abstract: A composition for an adhesion layer of a gas barrier adhesive sheet including a gas blocking film and an adhesion layer including at least one compound selected from a compound represented by Chemical Formula 1, at least one compound selected from a compound represented by Chemical Formula 2, and optionally, a compound represented by Chemical Formula 3. wherein groups and variables in Chemical Formulae 1 to 3 are the same as described in the specification.Type: GrantFiled: July 31, 2015Date of Patent: February 11, 2020Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Haeng Deog Koh, Eun Joo Jang, Hyun A Kang
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Patent number: 10053556Abstract: A barrier coating composition including: a monomer combination including a first monomer having at least two thiol groups at its terminal end and a second monomer having at least two carbon-carbon unsaturated bond-containing groups at its terminal end; and a plurality of organo-modified clay particles dispersed in the monomer combination, wherein the organo-modified clay particles include a compound having a hydrocarbyl group linked to a heteroatom, and wherein the compound is a primary, secondary, or tertiary amine, a quaternary organoammonium salt, a primary, secondary, or tertiary phosphine, a quaternary organophosphonium salt, a thiol including an amine group, or a combination thereof.Type: GrantFiled: October 22, 2015Date of Patent: August 21, 2018Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Tomoyuki Kikuchi, EunJoo Jang, Hyun A Kang, Nayoun Won, Oul Cho, Haeng Deog Koh
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Patent number: 9963632Abstract: A quantum dot-resin nanocomposite including a nanoparticle including a curable resin and a plurality of quantum dots contacting the nanoparticle. Also, a method of preparing the nanocomposite, and a molded article including the nanocomposite.Type: GrantFiled: June 18, 2014Date of Patent: May 8, 2018Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Haeng Deog Koh, Hyun A Kang, Eun Joo Jang, Na Youn Won
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Patent number: 9557639Abstract: A method of patterning a block copolymer layer, the method including: providing a substrate with a guide pattern formed on a surface thereof; forming a block copolymer layer on the substrate with the guide pattern, the block copolymer layer including a block copolymer; and directing self-assembly of the block copolymer on the substrate according to the guide pattern to form n/2 discrete domains, wherein the guide pattern includes a block copolymer patterning area having a 90-degree bending portion, and an outer apex and an inner apex of the 90-degree bending portion are each rounded, the outer apex having a first curvature radius r1, and the inner apex having a second curvature radius r2, respectively, and the width of the patterning area W, the first curvature radius r1 and the second curvature radius r2, satisfy Inequation 1: 2 + 2 - ( 1 + 2 ) [ ( n + 2 ) 2 n ? ( n + 1 ) ] 1 3 ? r 1 - r 2 W ? 2 + 2 - ( 1 + 2 ) [ ( n - 2 ) 2 n ? ( n - 1 )Type: GrantFiled: November 13, 2013Date of Patent: January 31, 2017Assignees: SAMSUNG ELECTRONICS CO., LTD., YONSEI UNIVESITY, UNIVERSITY-INDUSTRY FOUNDATION(UIF)Inventors: Mi-Jeong Kim, In Taek Han, June Huh, Seong-Jun Jeong, Haeng Deog Koh, Youn Jung Park
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Patent number: 9417520Abstract: A method of patterning a block copolymer layer, the method including: providing a substrate including a topographic pattern on a surface of the substrate, wherein the topographic pattern includes a trench and a mesa; forming, on the surface of the substrate, an underlayer including a polymer, wherein the polymer includes a repeating unit derived from a substituted or unsubstituted aromatic vinyl monomer and has an anchoring group; heat-treating the underlayer to anchor the underlayer to the surface of the substrate via the anchoring group; irradiating the heat-treated underlayer with light to form a crosslinked polymer with a crosslink between carbon atoms of main chains of the polymer; forming a block copolymer layer on the underlayer including the crosslinked polymer; and heat-treating the block copolymer layer to form a self-assembled structure of the block copolymer directed by the topographic pattern.Type: GrantFiled: February 4, 2014Date of Patent: August 16, 2016Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Haeng Deog Koh, Mi-Jeong Kim, In Taek Han
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Publication number: 20160160060Abstract: A barrier coating composition including: a monomer combination including a first monomer having at least two thiol groups at its terminal end and a second monomer having at least two carbon-carbon unsaturated bond-containing groups at its terminal end; and a plurality of organo-modified clay particles dispersed in the monomer combination, wherein the organo-modified clay particles include a compound having a hydrocarbyl group linked to a heteroatom, and wherein the compound is a primary, secondary, or tertiary amine, a quaternary organoammonium salt, a primary, secondary, or tertiary phosphine, a quaternary organophosphonium salt, a thiol including an amine group, or a combination thereof.Type: ApplicationFiled: October 22, 2015Publication date: June 9, 2016Inventors: Tomoyuki KIKUCHI, EunJoo JANG, Hyun A KANG, Nayoun WON, Oul CHO, Haeng Deog KOH
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Publication number: 20160032160Abstract: A composition for an adhesion layer of a gas barrier adhesive sheet including a gas blocking film and an adhesion layer including at least one compound selected from a compound represented by Chemical Formula 1, at least one compound selected from a compound represented by Chemical Formula 2, and optionally, a compound represented by Chemical Formula 3. wherein groups and variables in Chemical Formulae 1 to 3 are the same as described in the specification.Type: ApplicationFiled: July 31, 2015Publication date: February 4, 2016Inventors: Haeng Deog KOH, Eun Joo JANG, Hyun A. KANG
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Patent number: 9029271Abstract: A method of patterning a block copolymer layer includes: providing a guide pattern on a surface of a substrate, the guide pattern including sidewalls each elongated in a longitudinal direction and spaced apart from each other, a trench defined by a bottom surface and facing surfaces of the sidewalls, and having a uniform width over an entire length thereof in the longitudinal direction, and a latitudinal wall perpendicular to the longitudinal direction of the trench; providing a block copolymer layer on the surface of the substrate; and annealing the block copolymer to cause self-assembly of the block copolymer and to direct the same in the trench. The block copolymer has a microphase-separation into anisotropic discrete domains aligned with a period ?o in the trench by the annealing.Type: GrantFiled: December 24, 2013Date of Patent: May 12, 2015Assignee: Samsung Electronics Co., Ltd.Inventors: Youn Jung Park, Haeng Deog Koh, Mi-Jeong Kim, Seong-Jun Jeong
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Publication number: 20150083970Abstract: A quantum dot-resin nanocomposite including a nanoparticle including a curable resin and a plurality of quantum dots contacting the nanoparticle. Also, a method of preparing the nanocomposite, and a molded article including the nanocomposite.Type: ApplicationFiled: June 18, 2014Publication date: March 26, 2015Inventors: Haeng Deog KOH, Hyun A KANG, Eun Joo JANG, Na Youn Won
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Publication number: 20140234589Abstract: A method of patterning a block copolymer layer, the method including: providing a substrate including a topographic pattern on a surface of the substrate, wherein the topographic pattern includes a trench and a mesa; forming, on the surface of the substrate, an underlayer including a polymer, wherein the polymer includes a repeating unit derived from a substituted or unsubstituted aromatic vinyl monomer and has an anchoring group; heat-treating the underlayer to anchor the underlayer to the surface of the substrate via the anchoring group; irradiating the heat-treated underlayer with light to form a crosslinked polymer with a crosslink between carbon atoms of main chains of the polymer; forming a block copolymer layer on the underlayer including the crosslinked polymer; and heat-treating the block copolymer layer to form a self-assembled structure of the block copolymer directed by the topographic pattern.Type: ApplicationFiled: February 4, 2014Publication date: August 21, 2014Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Haeng Deog KOH, Mi-Jeong KIM, In Taek HAN
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Publication number: 20140193614Abstract: A method of patterning a block copolymer layer, the method including: providing a substrate with a guide pattern formed on a surface thereof; forming a block copolymer layer on the substrate with the guide pattern, the block copolymer layer including a block copolymer; and directing self-assembly of the block copolymer on the substrate according to the guide pattern to form n/2 discrete domains, wherein the guide pattern includes a block copolymer patterning area having a 90-degree bending portion, and an outer apex and an inner apex of the 90-degree bending portion are each rounded, the outer apex having a first curvature radius r1and the inner apex having a second curvature radius r2, respectively, and the width of the patterning area W, the first curvature radius r1 and the second curvature radius r2, satisfy Inequation 1: 2 + 2 - ( 1 + 2 ) [ ( n + 2 ) 2 n ? ( n + 1 ) ] 1 3 ? r 1 - r 2 W ? 2 + 2 - ( 1 + 2 ) [ ( n - 2 ) 2 n ? ( n - 1 ) ]Type: ApplicationFiled: November 13, 2013Publication date: July 10, 2014Applicants: Yonsei University, University - Industry Foundation(UIF), SAMSUNG ELECTRONICS CO., LTD.Inventors: Mi-Jeong KIM, In Taek HAN, June HUH, Seong-Jun Jeong, Haeng Deog KOH, Youn Jung PARK
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Publication number: 20140187054Abstract: A method of patterning a block copolymer layer includes: providing a guide pattern on a surface of a substrate, the guide pattern including sidewalls each elongated in a longitudinal direction and spaced apart from each other, a trench defined by a bottom surface and facing surfaces of the sidewalls, and having a uniform width over an entire length thereof in the longitudinal direction, and a latitudinal wall perpendicular to the longitudinal direction of the trench; providing a block copolymer layer on the surface of the substrate; and annealing the block copolymer to cause self-assembly of the block copolymer and to direct the same in the trench. The block copolymer has a microphase-separation into anisotropic discrete domains aligned with a period ?o in the trench by the annealing.Type: ApplicationFiled: December 24, 2013Publication date: July 3, 2014Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Youn Jung PARK, Haeng Deog KOH, Mi-Jeong KIM, Seong-Jun JEONG
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Publication number: 20140142250Abstract: An organic crystalline composition is provided. The organic crystalline composition includes a main material having ?-conjugated back bone and a functional group containing an atom having an unshared electron pair, and a linking material combining with the adjacent main material at the functional group by quaternization, organic material-metal interaction, ionic bonding, or hydrogen bonding.Type: ApplicationFiled: December 3, 2013Publication date: May 22, 2014Applicant: Gwangju Institute of Science And TechnologyInventors: Jae-Suk Lee, Changej Mohammad, Haeng-Deog Koh, Samal Shashadhar, Nam-Goo Kang, Won-Jung Shin, Young-Jae Kim, Hong-Joon Lee, Walaa Elsawy
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Publication number: 20130104973Abstract: A conductive paste includes a conductive powder, a metallic glass, an inorganic additive for fire-through, and an organic vehicle, and an electronic device and a solar cell including an electrode formed using the conductive paste.Type: ApplicationFiled: September 6, 2012Publication date: May 2, 2013Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Sang Soo JEE, Suk Jun KIM, Haeng Deog KOH, Yun Hyuk CHOI, Eun Sung LEE
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Publication number: 20130004716Abstract: A paste may include a functional water-soluble material, a surfactant surrounding the functional water-soluble material to form a reverse micelle structure, a binder, and a liposoluble organic solvent, and an electronic device including at least one of a pattern and an electrode may be formed using the paste.Type: ApplicationFiled: May 22, 2012Publication date: January 3, 2013Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Haeng Deog Koh, Eun Sung Lee, Sang Soo Jee, Jeong Na Heo, Suk Jun Kim, Se Yun Kim, Yun-Hyuk Choi
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Publication number: 20110124820Abstract: Provided is a crystalline organic polymer in which a main chain formed of amorphous polymer or monomer having a functional group is combined with a side chain by quaternization, cross-linking, hydrogen bonding or organic material-metal interaction. The main chain material having a functional group is combined with the side chain material to have crystallinity, and the organic polymer having crystallinity exhibits excellent diode characteristics.Type: ApplicationFiled: May 15, 2008Publication date: May 26, 2011Inventors: Jae-Suk Lee, Changej Mohammad, Haeng-Deog Koh, Samal Shashadhar, Nam-Goo Kang, Won-Jung Shin, Young-Jae Kim