Patents by Inventor Hae-sung Kim

Hae-sung Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10442692
    Abstract: The present invention relates to a method of manufacturing aluminum nitride and aluminum nitride prepared by the same. Pure aluminum powder having a median particle size (D50) of 1.52 ?m was heated to a temperature in a range of 595° C.˜900° C. in a nitrogen containing atmosphere comprising nitrogen and argon gases, at atmospheric pressure for one hour to obtain aluminum nitride with a degree of nitridation exceeding 93%. According to the present invention aluminum nitride may be produced with high yield using a simple and inexpensive one-step heating method in a relatively short period of time.
    Type: Grant
    Filed: May 26, 2016
    Date of Patent: October 15, 2019
    Assignees: ALCOM, SENUS Corp.
    Inventors: Kon-Bae Lee, Jae-Pyoung Ahn, Hae Sung Kim
  • Patent number: 10094006
    Abstract: The present invention is related to a method of fabricating an aluminum matrix composite by a simple process of heating a mixture of a ceramic reinforcing phase and aluminum in nitrogen containing atmosphere and an aluminum matrix composite fabricated by the same. The aluminum matrix composite may be fabricated by heating to temperatures even lower than the melting temperature of aluminum as well as to temperatures higher. The exothermic nitridation reaction contributes to the melting of the aluminum matrix and the aluminum nitride formed in-situ as a result may act as an additional reinforcing phase.
    Type: Grant
    Filed: July 6, 2015
    Date of Patent: October 9, 2018
    Assignees: ALCOM, SENUS CORP.
    Inventors: Kon-Bae Lee, Jae-Pyoung Ahn, Hae Sung Kim, Hyunjoo Choi
  • Publication number: 20170260050
    Abstract: The present invention relates to a method of manufacturing aluminum nitride and aluminum nitride prepared by the same. Pure aluminum powder having a median particle size (D50) of 1.52 ?m was heated to a temperature in a range of 595° C.˜900° C. in a nitrogen containing atmosphere comprising nitrogen and argon gases, at atmospheric pressure for one hour to obtain aluminum nitride with a degree of nitridation exceeding 93%. According to the present invention aluminum nitride may be produced with high yield using a simple and inexpensive one-step heating method in a relatively short period of time.
    Type: Application
    Filed: May 26, 2016
    Publication date: September 14, 2017
    Inventors: Kon-Bae Lee, Jae-Pyoung Ahn, Hae Sung Kim
  • Publication number: 20160168668
    Abstract: The present invention is related to a method of fabricating an aluminum matrix composite by a simple process of heating a mixture of a ceramic reinforcing phase and aluminum in nitrogen containing atmosphere and an aluminum matrix composite fabricated by the same. The aluminum matrix composite may be fabricated by heating to temperatures even lower than the melting temperature of aluminum as well as to temperatures higher. The exothermic nitridation reaction contributes to the melting of the aluminum matrix and the aluminum nitride formed in-situ as a result may act as an additional reinforcing phase.
    Type: Application
    Filed: July 6, 2015
    Publication date: June 16, 2016
    Inventors: Kon-Bae LEE, Jae-Pyoung AHN, Hae Sung KIM, Hyunjoo CHOI
  • Patent number: 8920153
    Abstract: A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.
    Type: Grant
    Filed: September 3, 2013
    Date of Patent: December 30, 2014
    Assignee: Seagate Technology LLC
    Inventors: Hae-sung Kim, Hyoung-soo Ko, Seung-bum Hong, Jin-seung Sohn, Sung-hoon Choa, Chee-kheng Lim
  • Publication number: 20140004325
    Abstract: A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.
    Type: Application
    Filed: September 3, 2013
    Publication date: January 2, 2014
    Inventors: Hae-sung Kim, Hyoung-soo Ko, Seung-bum Hong, Jin-seung Sohn, Sung-hoon Choa, Chee-kheng Lim
  • Patent number: 8523555
    Abstract: A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.
    Type: Grant
    Filed: September 15, 2012
    Date of Patent: September 3, 2013
    Assignee: Seagate Technology LLC
    Inventors: Hae-sung Kim, Hyoung-soo Ko, Seung-bum Hong, Jin-seung Sohn, Sung-hoon Choa, Chee-kheng Lim
  • Publication number: 20130064918
    Abstract: A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.
    Type: Application
    Filed: September 15, 2012
    Publication date: March 14, 2013
    Applicant: SEAGATE TECHNOLOGY LLC
    Inventors: Hae-sung Kim, Hyoung-soo Ko, Seung-bum Hong, Jin-seung Sohn, Sung-hoon Choa, Chee-kheng Lim
  • Patent number: 8367164
    Abstract: Disclosed is a method for manufacturing a template for a high-density patterned medium and a high-density magnetic storage medium using the same. In the method, magnetic particles are used as a mask and no lithographic process is required.
    Type: Grant
    Filed: December 28, 2009
    Date of Patent: February 5, 2013
    Assignee: Seagate Technology International
    Inventors: Hae-sung Kim, Myung Bok Lee, Jin Seung Sohn
  • Patent number: 8363185
    Abstract: Example embodiments relate to a photonic crystal optical filter, a transmissive color filter, a transflective color filter, and a display apparatus using the photonic crystal optical filter. The transmissive color filter may include a transparent substrate; a barrier layer formed on the transparent substrate and having a plurality of pixel areas; and a plurality of photonic crystal units formed on the plurality of pixel areas. Each of the plurality of photonic crystal units may have a structure such that a first material having a relatively high refractive index and a second material having a relatively low refractive index are periodically arranged so as to transmit light having a wavelength band corresponding to a photonic band gap. An optical cut-off layer may be formed on the first material.
    Type: Grant
    Filed: August 14, 2009
    Date of Patent: January 29, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Eun-hyoung Cho, Jin-seung Sohn, Seock-hwan Kang, Hae-sung Kim
  • Patent number: 8349527
    Abstract: A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.
    Type: Grant
    Filed: May 23, 2011
    Date of Patent: January 8, 2013
    Inventors: Hae-sung Kim, Hyoung-soo Ko, Seung-bum Hong, Jin-seung Sohn, Sung-hoon Choa, Chee-kheng Lim
  • Publication number: 20120258283
    Abstract: A super-hydrophobic surface may include a first sink pattern and a second sink pattern disposed in a base. The first sink pattern may include first sink grooves extending below an upper surface of the base. The second sink pattern may include second sink grooves which have a size smaller than that of the first sink grooves. The second sink grooves may extend below the upper surface of the base (which may also be a wall of the first sink pattern). Thus, the super-hydrophobic surface may have a structure in which at least two sink patterns are included.
    Type: Application
    Filed: April 4, 2012
    Publication date: October 11, 2012
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jin-seung Sohn, Eun-hyoung Cho, Hae-sung Kim
  • Patent number: 8264637
    Abstract: Example embodiments relate to a photonic crystal optical filter, a reflective color filter using the photonic crystal optical filter, a display apparatus using the reflective color filter, and a method of manufacturing the reflective color filter. The photonic crystal optical filter may include a transparent substrate; a barrier layer formed on the transparent substrate; and a photonic crystal layer formed on the barrier layer. The photonic crystal layer may have a structure in which a first material having a relatively high refractive index and a second material having a relatively low refractive index are periodically arranged so as to reflect light having a wavelength band corresponding to a photonic band gap.
    Type: Grant
    Filed: August 12, 2009
    Date of Patent: September 11, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Eun-hyoung Cho, Jin-seung Sohn, Seock-hwan Kang, Hae-sung Kim, Xianyu Wenxu
  • Patent number: 8029681
    Abstract: Provided are a master recording medium and a method of manufacturing the master recording medium. The master recording medium includes: a plate; and a magnetic layer which is formed on the plate for magnetically transferring of a servo pattern that is to be formed on a magnetic recording medium. The method of manufacturing a master recording medium includes: engraving a polymer layer by nano imprinting to form an engraved pattern corresponding to a servo pattern to be formed on a magnetic recording medium; forming a magnetic layer which fills in the engraved pattern of the polymer layer; forming a back plate layer on the magnetic layer; and performing processing to expose the servo pattern on a surface of the magnetic layer that is opposite a surface of the magnetic layer on which the back plate layer is formed.
    Type: Grant
    Filed: May 22, 2009
    Date of Patent: October 4, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Kyoung-won Na, Sang-chul Sul, Du-hyun Lee, Myung-bok Lee, Hae-sung Kim, Jin-seung Sohn
  • Publication number: 20110223279
    Abstract: A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.
    Type: Application
    Filed: May 23, 2011
    Publication date: September 15, 2011
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Hae-sung Kim, Hyoung-soo Ko, Seung-bum Hong, Jin-seung Sohn, Sung-hoon Choa, Chee-kheng Lim
  • Patent number: 7998661
    Abstract: A method of nano-patterning, a method of manufacturing a nano-imprinting master and a discrete track magnetic recording medium are all provided. The method of nano-patterning includes (a) sequentially forming on a substrate an etching object material layer, a photoresist layer, and a metal layer patterned to a first pattern having a structure in which line patterns are repeatedly arranged with a predetermined interval; (b) irradiating light onto a surface of the metal layer to excite surface plasmon so that the photoresist layer is exposed to a second pattern by the surface plasmon; (c) removing the metal layer and developing the photoresist layer; and (d) etching the etching object material layer using the photoresist layer patterned to the second pattern as a mask.
    Type: Grant
    Filed: March 14, 2008
    Date of Patent: August 16, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hae-sung Kim, Myung-bok Lee, Jin-seung Sohn
  • Publication number: 20110170042
    Abstract: A reflective color filter may include a substrate, a photonic crystal layer including a plurality of photonic crystal patterns, and a light energy conversion device. The substrate may be between the light energy conversion device and the photonic crystal patterns. A reflective display device may include a liquid crystal layer having a light transmittance that is electrically controlled, a thin film transistor (TFT)-array layer including a plurality of TFTs for driving the liquid crystal layer according to image information, and a reflective color filter adapted to reflect light having a wavelength band corresponding to a photonic band gap from among light incident through the liquid crystal layer.
    Type: Application
    Filed: September 13, 2010
    Publication date: July 14, 2011
    Inventors: Eun-hyoung Cho, Oleg Prudnikov, Jin-seung Sohn, Hae-sung Kim
  • Patent number: 7968253
    Abstract: A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.
    Type: Grant
    Filed: May 8, 2007
    Date of Patent: June 28, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hae-sung Kim, Hyoung-soo Ko, Seung-bum Hong, Jin-seung Sohn, Sung-hoon Choa, Chee-kheng Lim
  • Patent number: 7858010
    Abstract: A pattern template includes a flexible substrate, a template mold formed on the flexible substrate to include a pattern, and an alignment mark, the alignment mark has a greater refractive index than that of the template mold. The template is manufactured by providing a master template including a pattern area, coating resin for mold in the pattern area, forming a template mold by installing a flexible plate on the resin for mold and curing the resin for mold by radiating UV rays, separating the template mold and the master template, coating a metal thin film on the template mold, and forming an alignment mark at both sides of the template mold.
    Type: Grant
    Filed: November 27, 2007
    Date of Patent: December 28, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Eun-hyoung Cho, Sung-hoon Choa, Jin-seung Sohn, Du-hyun Lee, Hae-sung Kim
  • Patent number: 7742368
    Abstract: A near field light generating device generating near field light from incident light by using a solid immersion mirror and a heat assisted magnetic recording head with the same are provided. The near field light generating device includes a light source; a waveguide core which transmits light; and a solid immersion mirror, which generates near field light, including an upper transmission surface through which light from the waveguide core is transmitted into the solid immersion mirror, a lower reflection surface, opposite the upper transmission surface, which reflections light incident thereon, lateral reflection surfaces, facing each other at sides of the solid immersion mirror, which reflect light incident thereon, and a lower transmission region disposed at a center of the lower reflection surface. Light reflected from the lateral reflection surfaces forms a light spot on the lower transmission region.
    Type: Grant
    Filed: July 26, 2006
    Date of Patent: June 22, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Myung-bok Lee, Jin-seung Sohn, Sung-dong Suh, Hae-sung Kim