Patents by Inventor Hafez Hemmati

Hafez Hemmati has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Rapid large-scale fabrication of metasurfaces with complex unit cells
    Patent number: 12007695
    Abstract: A method of fabricating a metasurface comprises coating a photoresist film onto a substrate and loading the coated substrate into a laser interference lithography setup, exposing the photoresist film via a laser with a first interference pattern, the first interference pattern having a first period and a first exposure energy, subsequently exposing the coated substrate with a second interference pattern, the second interference pattern having a second period and a second exposure energy, developing the exposed portions of the photoresist film to form a periodic pattern in the photoresist, and transferring the periodic pattern into the substrate, the substrate supporting an appropriate film system that embodies the final metasurface device.
    Type: Grant
    Filed: January 15, 2021
    Date of Patent: June 11, 2024
    Assignee: BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM
    Inventors: Robert Magnusson, Kyu Lee, Hafez Hemmati, Pawarat Bootpakdeetam
  • RAPID LARGE-SCALE FABRICATION OF METASURFACES WITH COMPLEX UNIT CELLS
    Publication number: 20210216020
    Abstract: A method of fabricating a metasurface comprises coating a photoresist film onto a substrate and loading the coated substrate into a laser interference lithography setup, exposing the photoresist film via a laser with a first interference pattern, the first interference pattern having a first period and a first exposure energy, subsequently exposing the coated substrate with a second interference pattern, the second interference pattern having a second period and a second exposure energy, developing the exposed portions of the photoresist film to form a periodic pattern in the photoresist, and transferring the periodic pattern into the substrate, the substrate supporting an appropriate film system that embodies the final metasurface device.
    Type: Application
    Filed: January 15, 2021
    Publication date: July 15, 2021
    Inventors: Robert Magnusson, Kyu Lee, Hafez Hemmati, Pawarat Bootpakdeetam