Patents by Inventor Hai Chiang

Hai Chiang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140351039
    Abstract: A time-restricted product sale promotion system includes a promotion platform, at least one seller system, at least one buyer system and a promotion management unit. A time-restricted product sale promotion method includes: providing a time-restricted degressive mechanism on the promotion platform and connecting with a real-time price reporting system to generate a real-time price reference; a seller utilizing the mechanism to calculate optimum degressive sale prices within a restricted promotion time interval and sending the optimum degressive sale prices and the real-time price reference to a buyer; the buyer sending a purchase order to the promotion platform according to the promotion price; comparing the promotion price with the purchase order; displaying a bargain information on the promotion platform if the purchase order is verified.
    Type: Application
    Filed: May 27, 2013
    Publication date: November 27, 2014
    Inventors: Hai Chiang, Shao-Yin Cheng
  • Patent number: 7427776
    Abstract: A thin-film transistor (TFT) is fabricated by providing a substrate, depositing and patterning a metal gate, anodizing the patterned metal gate to form a gate dielectric on the metal gate, depositing and patterning a channel layer comprising a multi-cation oxide over at least a portion of the gate dielectric, and depositing and patterning a conductive source and conductive drain spaced apart from each other and disposed in contact with the channel layer.
    Type: Grant
    Filed: October 7, 2004
    Date of Patent: September 23, 2008
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Randy Hoffman, Peter Mardilovich, Hai Chiang
  • Patent number: 7382421
    Abstract: Apparatus comprising a thin film transistor having passivation layer disposed adjacent to a second surface of said channel layer, wherein said passivation layer comprises one or more wide-bandgap dielectric materials.
    Type: Grant
    Filed: October 12, 2004
    Date of Patent: June 3, 2008
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Randy Hoffman, John Wager, David Hong, Hai Chiang
  • Publication number: 20070023750
    Abstract: A semiconductor device can include a channel including a zinc-indium oxide film.
    Type: Application
    Filed: October 4, 2006
    Publication date: February 1, 2007
    Inventors: Hai Chiang, Randy Hoffman, David Hong, Nicole Dehuff, John Wager
  • Publication number: 20070018163
    Abstract: A semiconductor device can include a channel including a zinc-indium oxide film.
    Type: Application
    Filed: September 26, 2006
    Publication date: January 25, 2007
    Inventors: Hai Chiang, Randy Hoffman, David Hong, Nicole Dehuff, John Wager
  • Publication number: 20060079034
    Abstract: Embodiments of methods, apparatuses, devices, and/or systems for forming a passivation layer are described.
    Type: Application
    Filed: October 12, 2004
    Publication date: April 13, 2006
    Inventors: Randy Hoffman, John Wager, David Hong, Hai Chiang
  • Publication number: 20060079037
    Abstract: A thin-film transistor (TFT) is fabricated by providing a substrate, depositing and patterning a metal gate, anodizing the patterned metal gate to form a gate dielectric on the metal gate, depositing and patterning a channel layer comprising a multi-cation oxide over at least a portion of the gate dielectric, and depositing and patterning a conductive source and conductive drain spaced apart from each other and disposed in contact with the channel layer.
    Type: Application
    Filed: October 7, 2004
    Publication date: April 13, 2006
    Applicant: Hewlett-Packard Development Company, L.P.
    Inventors: Randy Hoffman, Peter Mardilovich, Hai Chiang
  • Publication number: 20050199959
    Abstract: A semiconductor device can include a channel including a zinc-indium oxide film.
    Type: Application
    Filed: March 12, 2004
    Publication date: September 15, 2005
    Inventors: Hai Chiang, Randy Hoffman, David Hong, Nicole Dehuff, John Wager
  • Publication number: 20050017244
    Abstract: A semiconductor device including a source electrode, a drain electrode and a channel coupled to the source electrode and the drain electrode. The channel is comprised of a ternary compound containing zinc, tin and oxygen. The semiconductor device further includes a gate electrode configured to permit application of an electric field to the channel.
    Type: Application
    Filed: January 23, 2004
    Publication date: January 27, 2005
    Inventors: Randy Hoffman, Hai Chiang, John Wager
  • Publication number: 20040132362
    Abstract: A net structure for use of both sports and leisure is mainly made up of a net body having a plurality of net yarns integrally woven into a large meshwork of coarse and three-dimensional cords wherein within each net hole of the large meshwork is interwoven a small net layer to form a net-within-net fabric structure. The large meshwork is increased in frictional resistance for barring objects caught at the net body therein; the small net layer can gather the outstretched large meshwork thereof, preventing the large meshwork from getting loose easily and permitting the net body thereof to be flexibly expanded within a certain range. The small net layer also forms a protective layer to stop objects like balls from breaking through thereof. Moreover, the net body can be integrally woven by net yarns of two or more than two different colors with the large meshwork in contrast or matching with the small net layer in different colors to verify and increase the beauty of the net body in display.
    Type: Application
    Filed: January 8, 2003
    Publication date: July 8, 2004
    Inventors: Joe Chiang, Ming-Hai Chiang