Patents by Inventor Haifang Liao

Haifang Liao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8448096
    Abstract: Disclosed is a method and system for processing the tasks performed by an IC layout processing tool in parallel. In some approaches, the IC layout is divided into a plurality of layout portions and one or more of the layout portions are processed in parallel, where geometric select operations are performed in which data for different layout portions may be shared between different processing entities. One approach includes the following actions: select phase one operation for performing initial select actions within layout portions; distributed regioning action for local regioning; distributed regioning action for global regioning and binary select; count select aggregation for count-based select operations; and select phase two operations for combining results of selecting of internal shapes and interface shapes.
    Type: Grant
    Filed: June 30, 2006
    Date of Patent: May 21, 2013
    Assignee: Cadence Design Systems, Inc.
    Inventors: Xiaojun Wang, Roland Ruehl, Li-Ling Ma, Mathew Koshy, Tianhao Zhang, Udayan Gumaste, Krzysztof Antoni Kozminski, Haifang Liao, Xinming Tu, Xu Zhu
  • Patent number: 7904852
    Abstract: Disclosed is an improved method and system for processing the tasks performed by an EDA tool in parallel. The IC layout is divided into a plurality of layout windows and one or more of the layout windows are processed in parallel. Sampling of one or more windows may be performed to provide dynamic performance estimation.
    Type: Grant
    Filed: September 12, 2005
    Date of Patent: March 8, 2011
    Assignee: Cadence Design Systems, Inc.
    Inventors: Eitan Cadouri, Krzysztof A. Kozminski, Haifang Liao, Kenneth Mednick, Roland Ruehl, Mark A. Snowden
  • Patent number: 7823095
    Abstract: Disclosed is an improved method and system for processing the tasks performed by an EDA tool in parallel. The IC layout is divided into a plurality of layout windows and one or more of the layout windows are processed in parallel. Sampling of one or more windows may be performed to provide dynamic performance estimation.
    Type: Grant
    Filed: September 12, 2005
    Date of Patent: October 26, 2010
    Assignee: Cadence Design Systems, Inc.
    Inventors: Eitan Cadouri, Krzysztof A. Kozminski, Haifang Liao, Kenneth Mednick, Roland Ruehl, Mark A. Snowden