Patents by Inventor Hailiang LU
Hailiang LU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11549891Abstract: An automatic optical inspection (AOI) device and method are disclosed. The device is adapted to inspect an object under inspection (OUI) (102) carried on a workpiece stage (101) and includes: a plurality of detectors (111, 112) for capturing images of the OUI (102); a plurality of light sources (121, 122) for illuminating the OUI (102) in different illumination modes; and a synchronization controller (140) signal-coupled to both the plurality of detectors (111, 112) and the plurality of light sources (121, 122).Type: GrantFiled: July 31, 2017Date of Patent: January 10, 2023Assignee: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.Inventors: Hailiang Lu, Junwei Jia, Pengli Zhang, Hongji Zhou, Wen Xu, Fan Wang
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Patent number: 10942129Abstract: An apparatus and method for die defect detection are disclosed. The apparatus includes: a light source unit (10) for emitting light of at least two wavelengths; a beam splitter (40) for receiving the light emitted by the light source unit (10) and splitting it into a first portion and a second portion, the first portion of the light reflected by a die (60) surface under inspection and thereby forming a detection beam; a reference unit (70) for receiving the second portion of the light and processing it into a reference beam; and a detection unit (90) for receiving the detection beam and the reference beam. The reference beam crosses the detection beam at an angle and thus produces interference fringes on a sensing surface of the detection unit (90), based on which a defect parameter of the die (60) surface under inspection is determined. This apparatus is capable of measuring a die with improved accuracy and efficiency and is suitable for the measurement of large dies.Type: GrantFiled: October 20, 2017Date of Patent: March 9, 2021Assignee: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.Inventors: Pengli Zhang, Hailiang Lu, Fan Wang
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Patent number: 10937151Abstract: An automatic optical inspection (AOI) method for inspecting defects on a surface of an object is provided. The method includes: providing at least two different illumination systems; acquiring, by at least one detector, at least two pieces of image information of the object, each piece of image information being acquired under illumination of a corresponding one of the illumination systems; obtaining at least two pieces of surface defect information of the object by analyzing the acquired at least two pieces of image information using a computer and storing at least one of the obtained at least two pieces of surface defect information by the computer; and combining, by the computer, all of the at least two pieces of surface defect information to de-duplicate the at least two pieces of surface defect information and obtain a piece of combined surface defect information.Type: GrantFiled: July 31, 2018Date of Patent: March 2, 2021Assignee: Shanghai Micro Electronics Equipment (Group) Co., Ltd.Inventors: Fan Wang, Hailiang Lu, Kai Zhang
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Publication number: 20200173932Abstract: An apparatus and method for die defect detection are disclosed. The apparatus includes: a light source unit (10) for emitting light of at least two wavelengths; a beam splitter (40) for receiving the light emitted by the light source unit (10) and splitting it into a first portion and a second portion, the first portion of the light reflected by a die (60) surface under inspection and thereby forming a detection beam; a reference unit (70) for receiving the second portion of the light and processing it into a reference beam; and a detection unit (90) for receiving the detection beam and the reference beam. The reference beam crosses the detection beam at an angle and thus produces interference fringes on a sensing surface of the detection unit (90), based on which a defect parameter of the die (60) surface under inspection is determined. This apparatus is capable of measuring a die with improved accuracy and efficiency and is suitable for the measurement of large dies.Type: ApplicationFiled: October 20, 2017Publication date: June 4, 2020Inventors: Pengli ZHANG, Hailiang LU, Fan WANG
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Publication number: 20190293566Abstract: An automatic optical inspection (AOI) device and method are disclosed. The device is adapted to inspect an object under inspection (OUI) (102) carried on a workpiece stage (101) and includes: a plurality of detectors (111, 112) for capturing images of the OUI (102); a plurality of light sources (121, 122) for illuminating the OUI (102) in different illumination modes; and a synchronization controller (140) signal-coupled to both the plurality of detectors (111, 112) and the plurality of light sources (121, 122).Type: ApplicationFiled: July 31, 2017Publication date: September 26, 2019Inventors: Hailiang LU, Junwei JIA, Pengli ZHANG, Hongji ZHOU, Wen XU, Fan WANG
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Patent number: 10268125Abstract: A device including a light source, illumination system, objective lens, and detector. The light source produces measurement light beams, the illumination system directs measurement light beams into the objective lens, and the objective lens directs measurement light beams onto an overlay marker, collects main maximums of diffracted light beam diffracted from the overlay marker, and focuses main maximums of diffracted light beam onto a pupil plane of the objective lens. The detector is positioned on the pupil plane of the objective lens and used for detecting the position of each main maximums of diffracted light beam on the detector, to obtain the overlay error of said overlay marker. Diffracted-light position information is used to measure overlay error, and measurement signals are not affected by illumination uniformity, transmissivity uniformity, etc.Type: GrantFiled: February 5, 2016Date of Patent: April 23, 2019Assignee: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.Inventors: Bofang Peng, Hailiang Lu, Fan Wang
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Publication number: 20190043182Abstract: An automatic optical inspection (AOI) method for inspecting defects on a surface of an object is provided. The method includes: providing at least two different illumination systems; acquiring, by at least one detector, at least two pieces of image information of the object, each piece of image information being acquired under illumination of a corresponding one of the illumination systems; obtaining at least two pieces of surface defect information of the object by analyzing the acquired at least two pieces of image information using a computer and storing at least one of the obtained at least two pieces of surface defect information by the computer; and combining, by the computer, all of the at least two pieces of surface defect information to de-duplicate the at least two pieces of surface defect information and obtain a piece of combined surface defect information.Type: ApplicationFiled: July 31, 2018Publication date: February 7, 2019Inventors: Fan WANG, Hailiang LU, Kai ZHANG
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Publication number: 20170348213Abstract: Provided herein is an oral care composition comprising an antioxidant and a surfactant system, wherein the surfactant system comprises sodium methyl cocoyl taurate in an amount of from 0.7 weight % to 1.2 weight % by total weight of the composition and optionally, a poloxamer in an amount of from 0.4 to 1.2 weight % by total weight of the composition. The composition is useful for preventing or treating periodontal disease.Type: ApplicationFiled: December 24, 2014Publication date: December 7, 2017Applicant: Colgate-Palmolive CompanyInventors: Yun Xu, Guangxin LIN, Yuyan ZENG, Wei SONG, Hailiang LU, Dandan CHEN, Shao Peng XU
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Publication number: 20170351184Abstract: A device including a light source, illumination system, objective lens, and detector. The light source produces measurement light beams, the illumination system directs measurement light beams into the objective lens, and the objective lens directs measurement light beams onto an overlay marker, collects main maximums of diffracted light beam diffracted from the overlay marker, and focuses main maximums of diffracted light beam onto a pupil plane of the objective lens. The detector is positioned on the pupil plane of the objective lens and used for detecting the position of each main maximums of diffracted light beam on the detector, to obtain the overlay error of said overlay marker. Diffracted-light position information is used to measure overlay error, and measurement signals are not affected by illumination uniformity, transmissivity uniformity, etc.Type: ApplicationFiled: February 5, 2016Publication date: December 7, 2017Applicant: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.Inventors: Bofang PENG, Hailiang LU, Fan WANG
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Publication number: 20170144251Abstract: A laser annealing apparatus for annealing a silicon wafer placed on a wafer stage is disclosed which includes: a laser light source for generating a light beam; a first optical unit, configured to convert the light beam generated by the laser light source into a polarized light beam of a first type; and a second optical unit, including a light guiding element and a first reflecting element. The light guiding element is configured to make the polarized light beam of the first type incident on and reflected by a surface of the silicon wafer for a first time along a first optical path, and the light beam reflected from the surface of the silicon wafer is further reflected by the first reflecting element and is thereby incident on the surface of the silicon wafer for a second time along a second optical path symmetrical to the first optical path and reflected by the surface to the light guiding element.Type: ApplicationFiled: July 3, 2015Publication date: May 25, 2017Inventors: Chunfeng SONG, Pengli ZHANG, Hailiang LU