Abstract: A communication method and device are provided. The method comprises: detecting a user operation aimed at a trigger element related to a reminder message function page in a communication application; executing a regular processing function corresponding to the trigger element when the user operation is a predefined regular trigger operation; and displaying a quick editing page for a reminder message when the user operation is a predefined quick trigger operation, wherein the quick editing page is used for quickly sending received user input information as content of the reminder message according to a default sending condition. By using the technical solution, a reminder message is edited and sent quickly, thereby helping simplify user operations and improving the efficiency of sending the reminder message.

Abstract: A method including acquiring a received reminder message; identifying a pin-to-top reminder message or a common reminder message from the reminder message according to a display mode configured for the reminder message; and displaying the pin-to-top reminder message in a first display area in a reminder message display page, and displaying the common reminder message in a second display area in the reminder message display page, wherein the first display area and the second display area are respectively located at different positions in the reminder message display page. With the technical solution of the present disclosure, reminder messages may be mode-differentiated and partially displayed in a pin-to-top manner, thus preventing an important message from being obscured due to too many reminder messages, helping improve the reminding effect, and improving the communication efficiency.

Abstract: Embodiments of the present application provide a method and system for communication. During operation, the system may receive a message sent by a sender to multiple recipients. The system may determine that a reply mode of the message is set to a private mode which restricts permission to receive replies to the message. The system may receive a reply message sent by a recipient in response to the message. The system may identify, among the sender and the multiple recipients, a communication party with permission to receive the reply message. The system may then send the reply message to the identified communication party.

Abstract: The invention provides systems and methods for layout decomposition to produce exposure layouts that can be used to perform double patterning lithography (DPL). Preferred embodiment methods of the invention are executed by a computer and provide alternate methods for layout decomposition for double patterning lithography (DPL) using integer linear programming (ILP) formulations. Embodiments of the invention meet a key optimization goals, which is to reduce the total cost of layout decomposition, considering the abovementioned aspects that contribute to cost of prior conventional DPL techniques. Embodiments of the invention provide integer linear programming (ILP), phase conflict detection (PCD) and node election bipartization (NBD) formulations for the optimization of DPL layout decomposition, with a process-aware cost function that avoids small jogging line-ends, and maximizes overlap at dividing points of polygons. The cost function can also make preferential splits at landing pads, junctions and long runs.

Abstract: The invention provides systems and methods for layout decomposition to produce exposure layouts that can be used to perform double patterning lithography (DPL). Preferred embodiment methods of the invention are executed by a computer and provide alternate methods for layout decomposition for double patterning lithography (DPL) using integer linear programming (ILP) formulations. Embodiments of the invention meet a key optimization goals, which is to reduce the total cost of layout decomposition, considering the abovementioned aspects that contribute to cost of prior conventional DPL techniques. Embodiments of the invention provide integer linear programming (ILP), phase conflict detection (PCD) and node election bipartization (NBD) formulations for the optimization of DPL layout decomposition, with a process-aware cost function that avoids small jogging line-ends, and maximizes overlap at dividing points of polygons. The cost function can also make preferential splits at landing pads, junctions and long runs.

Abstract: A range pattern is matched to a block of an IC layout by slicing the layout block and the range pattern, followed by comparing a sequence of widths of layout slices to a sequence of width ranges of pattern slices and if the width of any layout slice falls outside the width range of a corresponding pattern slice then the layout block does not match the range pattern. If the comparison succeeds, further comparisons are made between a sequence of lengths of layout fragments in each layout slice and a sequence of length ranges of pattern fragments in corresponding pattern slices. If the length of any layout fragment falls outside the length range of a corresponding pattern fragment then the block does not match the range pattern. If all lengths are within their respective ranges, then the block matches the pattern, although additional constraints are checked in some embodiments.

Abstract: The invention provides systems and methods for layout decomposition to produce exposure layouts that can be used to perform double patterning lithography (DPL). Preferred embodiment methods of the invention are executed by a computer and provide alternate methods for layout decomposition for double patterning lithography (DPL) using integer linear programming (ILP) formulations. Embodiments of the invention meet a key optimization goals, which is to reduce the total cost of layout decomposition, considering the abovementioned aspects that contribute to cost of prior conventional DPL techniques. Embodiments of the invention provide integer linear programming (ILP), phase conflict detection (PCD) and node election bipartization (NBD) formulations for the optimization of DPL layout decomposition, with a process-aware cost function that avoids small jogging line-ends, and maximizes overlap at dividing points of polygons. The cost function can also make preferential splits at landing pads, junctions and long runs.

Abstract: A range pattern is matched to a block of an IC layout by slicing the layout block and the range pattern, followed by comparing a sequence of widths of layout slices to a sequence of width ranges of pattern slices and if the width of any layout slice falls outside the width range of a corresponding pattern slice then the layout block does not match the range pattern. If the comparison succeeds, further comparisons are made between a sequence of lengths of layout fragments in each layout slice and a sequence of length ranges of pattern fragments in corresponding pattern slices. If the length of any layout fragment falls outside the length range of a corresponding pattern fragment then the block does not match the range pattern. If all lengths are within their respective ranges, then the block matches the pattern, although additional constraints are checked in some embodiments.

Abstract: A range pattern is matched to a block of an IC layout by slicing the layout block and the range pattern, followed by comparing a sequence of widths of layout slices to a sequence of width ranges of pattern slices and if the width of any layout slice falls outside the width range of a corresponding pattern slice then the layout block does not match the range pattern. If the comparison succeeds, further comparisons are made between a sequence of lengths of layout fragments in each layout slice and a sequence of length ranges of pattern fragments in corresponding pattern slices. If the length of any layout fragment falls outside the length range of a corresponding pattern fragment then the block does not match the range pattern. If all lengths are within their respective ranges, then the block matches the pattern, although additional constraints are checked in some embodiments.

Abstract: A range pattern is matched to a block of an IC layout by slicing the layout block and the range pattern, followed by comparing a sequence of widths of layout slices to a sequence of width ranges of pattern slices and if the width of any layout slice falls outside the width range of a corresponding pattern slice then the layout block does not match the range pattern. If the comparison succeeds, further comparisons are made between a sequence of lengths of layout fragments in each layout slice and a sequence of length ranges of pattern fragments in corresponding pattern slices. If the length of any layout fragment falls outside the length range of a corresponding pattern fragment then the block does not match the range pattern. If all lengths are within their respective ranges, then the block matches the pattern, although additional constraints are checked in some embodiments.