Abstract: A monitoring method and a device for chemical mechanical polishing are provided. The method includes: loading a to-be-polished wafer with a carrier, attaching the wafer to a polishing pad on a polishing platen, and supplying slurry between the polishing pad and the wafer with a slurry supply apparatus; conditioning the polishing pad with a conditioner, and obtaining strain data of the conditioner, wherein the conditioner includes a drive arm and a conditioning head, the conditioning head conditions the polishing pad with the support of the drive arm, the drive arm undergoes a strain in response to a force applied by the the conditioning head, and the strain data is used to indicate a strain value of the drive arm; determining a conditioning deviation based on the strain data, and determining a wear state of the polishing pad based on the conditioning deviation.

Abstract: A method and device for mixedly playing a program are provided by embodiments of the disclosure, the method of mixedly playing a program including: playing, in a first player interface of an application, a first multimedia program in a first list, the application being used to play at least two types of multimedia programs included in the first list; receiving a switching operation in the application, the switching operation being used to instruct the first multimedia program being played to switch to a second multimedia program in the first list; and if a type of the first multimedia program is different from the second multimedia program, playing the second multimedia program in a second player interface of the application, the first player interface and the second player interface being used to play different types of multimedia programs respectively.

Abstract: A reaction chamber lining including an annular side wall and a flange arranged on an upper portion of the side wall. An end face of the flange extends from the side wall in a radial direction, an outer edge of the flange extends in the radial direction to form fixing flanging parts, and a hole is in each of the fixing flanging parts. The side wall includes a rectangular slot, and a position of the rectangular slot corresponds to a position of a robotic arm access hole in a side wall of a reaction chamber. The side wall includes through holes and honeycomb-shaped apertures. A face joined to the bottom of the side wall includes a disc extending inwards in the radial direction, an extending end of the disc is fitted with an outer edge of an electrode assembly. A plurality of circles of slotted holes are in the disc.

Abstract: A device operation management method, system, and medium based on a device health degree are provided. The method includes: constructing a health degree evaluation model; collecting running values corresponding to a plurality of running status parameters in real time, and calculating a maintenance feature health degree corresponding to a maintenance component and a key feature health degree corresponding to a key and important component; determining a device health degree corresponding to a device; determining a health degree grade matching with the device health degree, and determining whether a running status corresponding to the device is healthy or not according to the health degree grade; and determining, in a case that the running status is not healthy, an attenuation interval where the maintenance component and the key and important component are located correspondingly, so as to take corresponding management strategies for the maintenance component or the key and important component.

Abstract: A cleaning control method for a dust box of a sweeping robot, the sweeping robot being configured to mate with a maintenance station, the maintenance station having a first fan, the sweeping robot having a second fan, includes: mating the sweeping robot with the maintenance station for charging; starting the second fan first, and then starting the first fan to extract dust from the sweeping robot; or, starting the first fan and the second fan at the same time; and when dust extraction is completed, turning off the first fan first, and then turning off the second fan; or, turning off the first fan and the second fan at the same time.

Abstract: Embodiments of the present disclosure disclose a method and apparatus for generating an image file and a computer-readable storage medium. The method includes: receiving an image file generation request, the image file generation request carrying an application installation file; loading a basic image file of an operating system in a preset system area according to the image file generation request, to start the operating system; installing an application corresponding to the application installation file in the operating system, and running the application to obtain a system dataset after the application is run and attribute information of the application; identifying application data corresponding to the application from the system dataset according to the attribute information of the application; and merging the application data with the basic image file to generate an image file of the application.

Abstract: A cleaning liquid supply device for supplying a cleaning device with cleaning liquid includes a chemical liquid inlet portion and a dilution water inlet portion, a first chemical liquid control unit fluidically connected to the chemical liquid inlet portion and the dilution water inlet portion, and a second chemical liquid control unit fluidically connected to the chemical liquid inlet portion and the dilution water inlet portion. The first chemical liquid control unit includes a first chemical-liquid-flow-rate control unit, a first dilution-water-flow-rate control unit, and a first mixing portion. The second chemical liquid control unit includes a second chemical-liquid-flow-rate control unit, a second dilution-water-flow-rate control unit, and a second mixing portion.

Abstract: To detach a substrate from a table without damaging the substrate. According to Embodiment 1, provided is a substrate processing apparatus including a table to hold a substrate, a plurality of lift pins that are arranged at periphery of the table and configured to arrange or separate the substrate on or from the table and to be movable in a direction perpendicular to a surface of the table, a drive mechanism that includes a motor to move the lift pins in the direction perpendicular to the surface of the table, and a control device that is configured to control the drive mechanism. The control device is configured to be capable of moving the lift pins at a first speed and at a second speed different from the first speed.

Abstract: A substrate cleaning device includes: a pressing member that cleans a substrate by contacting the substrate; a load measurement unit that measures a pressing load of the cleaning member; and a control unit that repeats an operation of comparing the measurement value of the load measurement unit with the setting load, changing the pressing amount of the cleaning member by a first movement amount so that a difference value decreases, when the difference value is larger than a first threshold value and equal to or smaller than a second threshold value, and changing the pressing amount of the cleaning member by a second movement amount larger than the first movement amount so that the difference value decreases, when the difference value is larger than the second threshold value, until the difference value becomes equal to or smaller than the first threshold value.

Abstract: A substrate cleaning device includes: a pressing member that cleans a substrate by contacting the substrate; a load measurement unit that measures a pressing load of the cleaning member; and a control unit that repeats an operation of comparing the measurement value of the load measurement unit with the setting load, changing the pressing amount of the cleaning member by a first movement amount so that a difference value decreases, when the difference value is larger than a first threshold value and equal to or smaller than a second threshold value, and changing the pressing amount of the cleaning member by a second movement amount larger than the first movement amount so that the difference value decreases, when the difference value is larger than the second threshold value, until the difference value becomes equal to or smaller than the first threshold value.

Abstract: Embodiments of the disclosure provide a multi-class classification system. An exemplary system includes at least one processor and at least one non-transitory memory storing instructions that, when executed by the at least one processor, cause the system to perform operations. The operation includes applying a multi-class classifier to classify a set of objects into multiple classes and applying a plurality of binary classifiers to the set of objects, wherein the plurality of binary classifiers are decomposed from the multi-class classifier, each binary classifier classifying the set of the objects into a first group consisting of one or more classes selected from the multiple classes and a second group consisting of one or more remaining classes of the multiple classes. The operation also includes jointly classifying the set of objects using the multi-class classifier and the plurality of binary classifiers.

Abstract: A substrate processing apparatus includes a first processing unit and a second processing unit placed in upper and lower two stages. Each processing unit has: a plurality of processing tanks arranged in series; a partition wall defining a conveyance space extending along an arrangement direction outside the plurality of processing tanks; a conveyance mechanism placed in the conveyance space and being configured to convey a substrate between the processing tanks along the arrangement direction; and an air guide duct provided to extend along the arrangement direction in the conveyance space. The air guide duct is connected with a fan filter unit. Each of the processing tanks is connected with an exhaust duct. An opening is formed in each of parts facing the processing tank in the air guide duct. The conveyance spaces of the first and second processing units are separated into upper and lower segments by the partition wall.

Abstract: Methods and apparatus for improving performance in a virtual meeting session in a distributed workspace system. One example of such a method includes acts of launching the virtual meeting session on a computing device of a first meeting participant, establishing a first connection between the computing device and a virtual meeting server, monitoring network latency conditions in the first network connection, upon determining that the network latency conditions exceed a predetermined threshold, selecting a proxy agent and establishing a second network connection between the computing device and the proxy agent, and establishing a third network connection between the virtual meeting server and the proxy agent to connect the computing device to the virtual meeting server through the proxy agent.

Abstract: The present disclosure is related to systems and methods for processing speech dialogue. The method includes obtaining target speech dialogue data. The method includes obtaining a text vector representation sequence, a phonetic symbol vector representation sequence, and a role vector representation sequence by performing a vector transformation on the target speech dialogue data based on a text embedding model, a phonetic symbol embedding model, and a role embedding model, respectively. The method includes determining a representation vector corresponding to the target speech dialogue data by inputting the text vector representation sequence, the phonetic symbol vector representation sequence, and the role vector representation sequence into a trained speech dialogue coding model. The method includes determining a summary of the target speech dialogue data by inputting the representation vector into a classification model.

Abstract: The present disclosure provides a metamaterial absorber integrated long-wave infrared focal plane array (LWIRFPA), including: a resonator layer, a dielectric layer, and a metal layer. The resonator layer is of a sub-wavelength periodic resonator array structure, generates surface plasmon resonance (SPR), and is made of a metal or metalloid material. The SPR refers to propagating surface plasmon resonance (PSPR) or localized surface plasmon resonance (LSPR). By using corresponding shape and structural size of a resonator, the present disclosure achieves broadband absorption, narrow-band absorption, multi-wavelength absorption, polarization-selective absorption, etc. By integrating the metamaterial absorber on the IRFPA, not only can the absorptivity be improved, but also more functions can be achieved by the IRFPA.

Abstract: A substrate cleaning device includes: a pressing member that cleans a substrate by contacting the substrate; a load measurement unit that measures a pressing load of the cleaning member; and a control unit that repeats an operation of comparing the measurement value of the load measurement unit with the setting load, changing the pressing amount of the cleaning member by a first movement amount so that a difference value decreases, when the difference value is larger than a first threshold value and equal to or smaller than a second threshold value, and changing the pressing amount of the cleaning member by a second movement amount larger than the first movement amount so that the difference value decreases, when the difference value is larger than the second threshold value, until the difference value becomes equal to or smaller than the first threshold value.

Abstract: A substrate cleaning device includes: a pressing member that cleans a substrate by contacting the substrate; a load measurement unit that measures a pressing load of the cleaning member; and a control unit that repeats an operation of comparing the measurement value of the load measurement unit with the setting load, changing the pressing amount of the cleaning member by a first movement amount so that a difference value decreases, when the difference value is larger than a first threshold value and equal to or smaller than a second threshold value, and changing the pressing amount of the cleaning member by a second movement amount larger than the first movement amount so that the difference value decreases, when the difference value is larger than the second threshold value, until the difference value becomes equal to or smaller than the first threshold value.

Abstract: A data processing method is provided. The method includes: obtaining a sample data set for modeling; selecting a first sample data from the sample data set; generating, in response to determining that a similarity between a first semantic vector corresponding to a first feature dimension and a second semantic vector corresponding, to a second feature dimension meets a preset condition, a second sample data based on the first sample data; and adding the second sample data to the sample data set.

Abstract: An entity recognition method and apparatus, an electronic device, a storage medium, and a computer program product are provided. The method includes: recognizing a to-be-recognized image to determine a preliminary recognition result for entities in the to-be-recognized image; determining, in response to determining that the preliminary recognition result includes a plurality of entities of a same category, image features of the to-be-recognized image and textual features of the plurality of entities; determining whether the plurality of entities is a consecutive complete entity based on the image features and the textual features, to obtain a complete-entity determining result; and obtaining a final recognition result based on the preliminary recognition result and the complete-entity determining result.

Abstract: A substrate processing apparatus includes a polishing section and a transport section. The polishing section has a first polishing unit, a second polishing unit, and a transport mechanism. The first polishing unit has a first polishing apparatus and a second polishing apparatus. The second polishing unit has a third polishing apparatus and a fourth polishing apparatus. Each of the first to fourth polishing apparatuses has a polishing table to which a polishing pad is mounted, a top ring, and auxiliary units that perform a process on the polishing pad during polishing. Around the polishing table, a pair of auxiliary unit mounting units for mounting the respective auxiliary units in a left-right switchable manner with respect to a straight line connecting a swing center of the top ring and a center of rotation of the polishing table is provided at respective positions symmetrical with respect to the straight line.