Abstract: The present invention relates to the technical field of network security, and in particular to an abnormal data detection method, system and device for industrial Internet. This detection method compares data distribution of an initial node with a normal feature expression performance in first normal data distribution subject to extraction processing to obtain a first anomaly score, compares the data distribution of the initial node with the normal feature expression performance in second normal data distribution subject to enhancement processing to obtain a second anomaly score, obtains a risk level of the node based on the first anomaly score and the second anomaly score, and immediately provides corresponding limits on a node communication permission; and the method provides dual detection, is high in accuracy and stable in detection results, and facilitates the maintenance of industrial Internet security.

Abstract: An anti-breakdown ion source discharge apparatus includes a discharge chamber, a coil support, an upper insulation fixing block, a discharge component and an ion source chamber. The discharge component includes a radio-frequency coil, a lower conductive connector and an upper conductive connector. The radio-frequency coil is fixed on a coil support base; the coil support base is clamped on an inner wall of the bottom of the ion source base; the coil support is along the circumference of the coil support base; the radio-frequency coil passes through the coil support; the upper conductive connector passes by the radio-frequency coil and the coil support base from the outside of the radio-frequency coil and extends into the bottom of the discharge chamber; and the upper insulation fixing block is sleeved over the upper conductive connector and is fixed on the inner wall of the bottom of the ion source chamber.

Abstract: A communication method and an apparatus are provided. The method includes: When an access and mobility management function network element determines that a protocol data unit PDU session status of a terminal device does not meet a first condition (where the first condition in this application is a condition related to the PDU session status of the terminal device) of a network slice after first time expires, it is determined to reject access of the terminal device to the network slice, so that a PDU session resource in the network slice can be properly configured and used.

Abstract: A wafer-level semiconductor high-voltage reliability test fixture is provided. The test fixture includes: a first insulation plate, a first circuit board, and a second insulation plate. A target object is disposed between the first circuit board and the second insulation plate. A side of the first circuit board facing the target object is provided with a probe holder including probes. The first circuit board is connected to the target object through the probes such that a high-voltage electrical signal is transmitted to the target object when the high-voltage electrical signal is applied to the first circuit board. The first insulation plate and the second insulation plate isolate the high-voltage electrical signal from the outside world, and the probes also transmit test electrical signals to the target object and transmit feedback signals to the first circuit board when the test electrical signals are applied to the first circuit board.

Abstract: Various embodiments for deduplication of APIs using similarity measures and artificial intelligence are described herein. An embodiment operates by receiving a request to compare a first computing program to a second computing program, wherein each computing program includes an address, one or more tables accessed by a respective computing program, one or more input parameters, and one or more output parameters. Similarity measures are calculated between the addresses, tables, input parameters, and output parameters of the two computing programs. The similarity measures are provided to a trained artificial intelligence (AI) model, which generates a similarity determination. Performed an action based on the similarity determination.

Abstract: Provided are ZmYUC2 and ZmYUC4 genes for regulating and controlling an included angle and the lodging resistance of a maize root system, and use thereof. The ZmYUC2 and ZmYUC4 genes can specifically regulate and control local auxin synthesis of a root tip, and can regulate and control the included angle of the maize root system without an adverse effect on the remaining agronomic traits, so that the ZmYUC2 and ZmYUC4 genes can be applied to a lodging-resistant breeding variety.

Abstract: A computer-implemented for information processing based on a large language model (LLM) includes: obtaining a query request; determining, by the LLM and based on the query request, a query condition, a source of a query result, and a select field for generating a structured query language (SQL) statement; generating by the LLM, the SQL statement by combining the query condition, the source of the query result, and the select field; and obtaining the query result corresponding to the query request, by inputting the SQL statement into the LLM for execution

Abstract: A data processing method is provided. The method includes: obtaining a sample data set for modeling; selecting a first sample data from the sample data set; generating, in response to determining that a similarity between a first semantic vector corresponding to a first feature dimension and a second semantic vector corresponding, to a second feature dimension meets a preset condition, a second sample data based on the first sample data; and adding the second sample data to the sample data set.

Abstract: A monitoring method and a device for chemical mechanical polishing are provided. The method includes: loading a to-be-polished wafer with a carrier, attaching the wafer to a polishing pad on a polishing platen, and supplying slurry between the polishing pad and the wafer with a slurry supply apparatus; conditioning the polishing pad with a conditioner, and obtaining strain data of the conditioner, wherein the conditioner includes a drive arm and a conditioning head, the conditioning head conditions the polishing pad with the support of the drive arm, the drive arm undergoes a strain in response to a force applied by the the conditioning head, and the strain data is used to indicate a strain value of the drive arm; determining a conditioning deviation based on the strain data, and determining a wear state of the polishing pad based on the conditioning deviation.

Abstract: A cleaning liquid supply device for supplying a cleaning device with cleaning liquid includes a chemical liquid inlet portion and a dilution water inlet portion, a first chemical liquid control unit fluidically connected to the chemical liquid inlet portion and the dilution water inlet portion, and a second chemical liquid control unit fluidically connected to the chemical liquid inlet portion and the dilution water inlet portion. The first chemical liquid control unit includes a first chemical-liquid-flow-rate control unit, a first dilution-water-flow-rate control unit, and a first mixing portion. The second chemical liquid control unit includes a second chemical-liquid-flow-rate control unit, a second dilution-water-flow-rate control unit, and a second mixing portion.

Abstract: To detach a substrate from a table without damaging the substrate. According to Embodiment 1, provided is a substrate processing apparatus including a table to hold a substrate, a plurality of lift pins that are arranged at periphery of the table and configured to arrange or separate the substrate on or from the table and to be movable in a direction perpendicular to a surface of the table, a drive mechanism that includes a motor to move the lift pins in the direction perpendicular to the surface of the table, and a control device that is configured to control the drive mechanism. The control device is configured to be capable of moving the lift pins at a first speed and at a second speed different from the first speed.

Abstract: A substrate cleaning device includes: a pressing member that cleans a substrate by contacting the substrate; a load measurement unit that measures a pressing load of the cleaning member; and a control unit that repeats an operation of comparing the measurement value of the load measurement unit with the setting load, changing the pressing amount of the cleaning member by a first movement amount so that a difference value decreases, when the difference value is larger than a first threshold value and equal to or smaller than a second threshold value, and changing the pressing amount of the cleaning member by a second movement amount larger than the first movement amount so that the difference value decreases, when the difference value is larger than the second threshold value, until the difference value becomes equal to or smaller than the first threshold value.

Abstract: A substrate cleaning device includes: a pressing member that cleans a substrate by contacting the substrate; a load measurement unit that measures a pressing load of the cleaning member; and a control unit that repeats an operation of comparing the measurement value of the load measurement unit with the setting load, changing the pressing amount of the cleaning member by a first movement amount so that a difference value decreases, when the difference value is larger than a first threshold value and equal to or smaller than a second threshold value, and changing the pressing amount of the cleaning member by a second movement amount larger than the first movement amount so that the difference value decreases, when the difference value is larger than the second threshold value, until the difference value becomes equal to or smaller than the first threshold value.

Abstract: Embodiments of the disclosure provide a multi-class classification system. An exemplary system includes at least one processor and at least one non-transitory memory storing instructions that, when executed by the at least one processor, cause the system to perform operations. The operation includes applying a multi-class classifier to classify a set of objects into multiple classes and applying a plurality of binary classifiers to the set of objects, wherein the plurality of binary classifiers are decomposed from the multi-class classifier, each binary classifier classifying the set of the objects into a first group consisting of one or more classes selected from the multiple classes and a second group consisting of one or more remaining classes of the multiple classes. The operation also includes jointly classifying the set of objects using the multi-class classifier and the plurality of binary classifiers.

Abstract: A substrate processing apparatus includes a first processing unit and a second processing unit placed in upper and lower two stages. Each processing unit has: a plurality of processing tanks arranged in series; a partition wall defining a conveyance space extending along an arrangement direction outside the plurality of processing tanks; a conveyance mechanism placed in the conveyance space and being configured to convey a substrate between the processing tanks along the arrangement direction; and an air guide duct provided to extend along the arrangement direction in the conveyance space. The air guide duct is connected with a fan filter unit. Each of the processing tanks is connected with an exhaust duct. An opening is formed in each of parts facing the processing tank in the air guide duct. The conveyance spaces of the first and second processing units are separated into upper and lower segments by the partition wall.

Abstract: Methods and apparatus for improving performance in a virtual meeting session in a distributed workspace system. One example of such a method includes acts of launching the virtual meeting session on a computing device of a first meeting participant, establishing a first connection between the computing device and a virtual meeting server, monitoring network latency conditions in the first network connection, upon determining that the network latency conditions exceed a predetermined threshold, selecting a proxy agent and establishing a second network connection between the computing device and the proxy agent, and establishing a third network connection between the virtual meeting server and the proxy agent to connect the computing device to the virtual meeting server through the proxy agent.

Abstract: The present disclosure is related to systems and methods for processing speech dialogue. The method includes obtaining target speech dialogue data. The method includes obtaining a text vector representation sequence, a phonetic symbol vector representation sequence, and a role vector representation sequence by performing a vector transformation on the target speech dialogue data based on a text embedding model, a phonetic symbol embedding model, and a role embedding model, respectively. The method includes determining a representation vector corresponding to the target speech dialogue data by inputting the text vector representation sequence, the phonetic symbol vector representation sequence, and the role vector representation sequence into a trained speech dialogue coding model. The method includes determining a summary of the target speech dialogue data by inputting the representation vector into a classification model.

Abstract: The present disclosure provides a metamaterial absorber integrated long-wave infrared focal plane array (LWIRFPA), including: a resonator layer, a dielectric layer, and a metal layer. The resonator layer is of a sub-wavelength periodic resonator array structure, generates surface plasmon resonance (SPR), and is made of a metal or metalloid material. The SPR refers to propagating surface plasmon resonance (PSPR) or localized surface plasmon resonance (LSPR). By using corresponding shape and structural size of a resonator, the present disclosure achieves broadband absorption, narrow-band absorption, multi-wavelength absorption, polarization-selective absorption, etc. By integrating the metamaterial absorber on the IRFPA, not only can the absorptivity be improved, but also more functions can be achieved by the IRFPA.

Abstract: A substrate cleaning device includes: a pressing member that cleans a substrate by contacting the substrate; a load measurement unit that measures a pressing load of the cleaning member; and a control unit that repeats an operation of comparing the measurement value of the load measurement unit with the setting load, changing the pressing amount of the cleaning member by a first movement amount so that a difference value decreases, when the difference value is larger than a first threshold value and equal to or smaller than a second threshold value, and changing the pressing amount of the cleaning member by a second movement amount larger than the first movement amount so that the difference value decreases, when the difference value is larger than the second threshold value, until the difference value becomes equal to or smaller than the first threshold value.

Abstract: A substrate cleaning device includes: a pressing member that cleans a substrate by contacting the substrate; a load measurement unit that measures a pressing load of the cleaning member; and a control unit that repeats an operation of comparing the measurement value of the load measurement unit with the setting load, changing the pressing amount of the cleaning member by a first movement amount so that a difference value decreases, when the difference value is larger than a first threshold value and equal to or smaller than a second threshold value, and changing the pressing amount of the cleaning member by a second movement amount larger than the first movement amount so that the difference value decreases, when the difference value is larger than the second threshold value, until the difference value becomes equal to or smaller than the first threshold value.