Abstract: A computer-implemented for information processing based on a large language model (LLM) includes: obtaining a query request; determining, by the LLM and based on the query request, a query condition, a source of a query result, and a select field for generating a structured query language (SQL) statement; generating by the LLM, the SQL statement by combining the query condition, the source of the query result, and the select field; and obtaining the query result corresponding to the query request, by inputting the SQL statement into the LLM for execution

Abstract: A data processing method is provided. The method includes: obtaining a sample data set for modeling; selecting a first sample data from the sample data set; generating, in response to determining that a similarity between a first semantic vector corresponding to a first feature dimension and a second semantic vector corresponding, to a second feature dimension meets a preset condition, a second sample data based on the first sample data; and adding the second sample data to the sample data set.

Abstract: A monitoring method and a device for chemical mechanical polishing are provided. The method includes: loading a to-be-polished wafer with a carrier, attaching the wafer to a polishing pad on a polishing platen, and supplying slurry between the polishing pad and the wafer with a slurry supply apparatus; conditioning the polishing pad with a conditioner, and obtaining strain data of the conditioner, wherein the conditioner includes a drive arm and a conditioning head, the conditioning head conditions the polishing pad with the support of the drive arm, the drive arm undergoes a strain in response to a force applied by the the conditioning head, and the strain data is used to indicate a strain value of the drive arm; determining a conditioning deviation based on the strain data, and determining a wear state of the polishing pad based on the conditioning deviation.

Abstract: A cleaning liquid supply device for supplying a cleaning device with cleaning liquid includes a chemical liquid inlet portion and a dilution water inlet portion, a first chemical liquid control unit fluidically connected to the chemical liquid inlet portion and the dilution water inlet portion, and a second chemical liquid control unit fluidically connected to the chemical liquid inlet portion and the dilution water inlet portion. The first chemical liquid control unit includes a first chemical-liquid-flow-rate control unit, a first dilution-water-flow-rate control unit, and a first mixing portion. The second chemical liquid control unit includes a second chemical-liquid-flow-rate control unit, a second dilution-water-flow-rate control unit, and a second mixing portion.

Abstract: To detach a substrate from a table without damaging the substrate. According to Embodiment 1, provided is a substrate processing apparatus including a table to hold a substrate, a plurality of lift pins that are arranged at periphery of the table and configured to arrange or separate the substrate on or from the table and to be movable in a direction perpendicular to a surface of the table, a drive mechanism that includes a motor to move the lift pins in the direction perpendicular to the surface of the table, and a control device that is configured to control the drive mechanism. The control device is configured to be capable of moving the lift pins at a first speed and at a second speed different from the first speed.

Abstract: A substrate cleaning device includes: a pressing member that cleans a substrate by contacting the substrate; a load measurement unit that measures a pressing load of the cleaning member; and a control unit that repeats an operation of comparing the measurement value of the load measurement unit with the setting load, changing the pressing amount of the cleaning member by a first movement amount so that a difference value decreases, when the difference value is larger than a first threshold value and equal to or smaller than a second threshold value, and changing the pressing amount of the cleaning member by a second movement amount larger than the first movement amount so that the difference value decreases, when the difference value is larger than the second threshold value, until the difference value becomes equal to or smaller than the first threshold value.

Abstract: A substrate cleaning device includes: a pressing member that cleans a substrate by contacting the substrate; a load measurement unit that measures a pressing load of the cleaning member; and a control unit that repeats an operation of comparing the measurement value of the load measurement unit with the setting load, changing the pressing amount of the cleaning member by a first movement amount so that a difference value decreases, when the difference value is larger than a first threshold value and equal to or smaller than a second threshold value, and changing the pressing amount of the cleaning member by a second movement amount larger than the first movement amount so that the difference value decreases, when the difference value is larger than the second threshold value, until the difference value becomes equal to or smaller than the first threshold value.

Abstract: Embodiments of the disclosure provide a multi-class classification system. An exemplary system includes at least one processor and at least one non-transitory memory storing instructions that, when executed by the at least one processor, cause the system to perform operations. The operation includes applying a multi-class classifier to classify a set of objects into multiple classes and applying a plurality of binary classifiers to the set of objects, wherein the plurality of binary classifiers are decomposed from the multi-class classifier, each binary classifier classifying the set of the objects into a first group consisting of one or more classes selected from the multiple classes and a second group consisting of one or more remaining classes of the multiple classes. The operation also includes jointly classifying the set of objects using the multi-class classifier and the plurality of binary classifiers.

Abstract: A substrate processing apparatus includes a first processing unit and a second processing unit placed in upper and lower two stages. Each processing unit has: a plurality of processing tanks arranged in series; a partition wall defining a conveyance space extending along an arrangement direction outside the plurality of processing tanks; a conveyance mechanism placed in the conveyance space and being configured to convey a substrate between the processing tanks along the arrangement direction; and an air guide duct provided to extend along the arrangement direction in the conveyance space. The air guide duct is connected with a fan filter unit. Each of the processing tanks is connected with an exhaust duct. An opening is formed in each of parts facing the processing tank in the air guide duct. The conveyance spaces of the first and second processing units are separated into upper and lower segments by the partition wall.

Abstract: Methods and apparatus for improving performance in a virtual meeting session in a distributed workspace system. One example of such a method includes acts of launching the virtual meeting session on a computing device of a first meeting participant, establishing a first connection between the computing device and a virtual meeting server, monitoring network latency conditions in the first network connection, upon determining that the network latency conditions exceed a predetermined threshold, selecting a proxy agent and establishing a second network connection between the computing device and the proxy agent, and establishing a third network connection between the virtual meeting server and the proxy agent to connect the computing device to the virtual meeting server through the proxy agent.

Abstract: The present disclosure is related to systems and methods for processing speech dialogue. The method includes obtaining target speech dialogue data. The method includes obtaining a text vector representation sequence, a phonetic symbol vector representation sequence, and a role vector representation sequence by performing a vector transformation on the target speech dialogue data based on a text embedding model, a phonetic symbol embedding model, and a role embedding model, respectively. The method includes determining a representation vector corresponding to the target speech dialogue data by inputting the text vector representation sequence, the phonetic symbol vector representation sequence, and the role vector representation sequence into a trained speech dialogue coding model. The method includes determining a summary of the target speech dialogue data by inputting the representation vector into a classification model.

Abstract: The present disclosure provides a metamaterial absorber integrated long-wave infrared focal plane array (LWIRFPA), including: a resonator layer, a dielectric layer, and a metal layer. The resonator layer is of a sub-wavelength periodic resonator array structure, generates surface plasmon resonance (SPR), and is made of a metal or metalloid material. The SPR refers to propagating surface plasmon resonance (PSPR) or localized surface plasmon resonance (LSPR). By using corresponding shape and structural size of a resonator, the present disclosure achieves broadband absorption, narrow-band absorption, multi-wavelength absorption, polarization-selective absorption, etc. By integrating the metamaterial absorber on the IRFPA, not only can the absorptivity be improved, but also more functions can be achieved by the IRFPA.

Abstract: A substrate cleaning device includes: a pressing member that cleans a substrate by contacting the substrate; a load measurement unit that measures a pressing load of the cleaning member; and a control unit that repeats an operation of comparing the measurement value of the load measurement unit with the setting load, changing the pressing amount of the cleaning member by a first movement amount so that a difference value decreases, when the difference value is larger than a first threshold value and equal to or smaller than a second threshold value, and changing the pressing amount of the cleaning member by a second movement amount larger than the first movement amount so that the difference value decreases, when the difference value is larger than the second threshold value, until the difference value becomes equal to or smaller than the first threshold value.

Abstract: A substrate cleaning device includes: a pressing member that cleans a substrate by contacting the substrate; a load measurement unit that measures a pressing load of the cleaning member; and a control unit that repeats an operation of comparing the measurement value of the load measurement unit with the setting load, changing the pressing amount of the cleaning member by a first movement amount so that a difference value decreases, when the difference value is larger than a first threshold value and equal to or smaller than a second threshold value, and changing the pressing amount of the cleaning member by a second movement amount larger than the first movement amount so that the difference value decreases, when the difference value is larger than the second threshold value, until the difference value becomes equal to or smaller than the first threshold value.

Abstract: A data processing method is provided. The method includes: obtaining a sample data set for modeling; selecting a first sample data from the sample data set; generating, in response to determining that a similarity between a first semantic vector corresponding to a first feature dimension and a second semantic vector corresponding, to a second feature dimension meets a preset condition, a second sample data based on the first sample data; and adding the second sample data to the sample data set.

Abstract: An entity recognition method and apparatus, an electronic device, a storage medium, and a computer program product are provided. The method includes: recognizing a to-be-recognized image to determine a preliminary recognition result for entities in the to-be-recognized image; determining, in response to determining that the preliminary recognition result includes a plurality of entities of a same category, image features of the to-be-recognized image and textual features of the plurality of entities; determining whether the plurality of entities is a consecutive complete entity based on the image features and the textual features, to obtain a complete-entity determining result; and obtaining a final recognition result based on the preliminary recognition result and the complete-entity determining result.

Abstract: A substrate processing apparatus includes a polishing section and a transport section. The polishing section has a first polishing unit, a second polishing unit, and a transport mechanism. The first polishing unit has a first polishing apparatus and a second polishing apparatus. The second polishing unit has a third polishing apparatus and a fourth polishing apparatus. Each of the first to fourth polishing apparatuses has a polishing table to which a polishing pad is mounted, a top ring, and auxiliary units that perform a process on the polishing pad during polishing. Around the polishing table, a pair of auxiliary unit mounting units for mounting the respective auxiliary units in a left-right switchable manner with respect to a straight line connecting a swing center of the top ring and a center of rotation of the polishing table is provided at respective positions symmetrical with respect to the straight line.

Abstract: A cleaning liquid supply device for supplying a cleaning device with cleaning liquid includes a chemical liquid inlet portion and a dilution water inlet portion, a first chemical liquid control unit fluidically connected to the chemical liquid inlet portion and the dilution water inlet portion, and a second chemical liquid control unit fluidically connected to the chemical liquid inlet portion and the dilution water inlet portion. The first chemical liquid control unit includes a first chemical-liquid-flow-rate control unit, a first dilution-water-flow-rate control unit, and a first mixing portion. The second chemical liquid control unit includes a second chemical-liquid-flow-rate control unit, a second dilution-water-flow-rate control unit, and a second mixing portion.

Abstract: A cleaning device is described. In one embodiment, the cleaning device includes a cleaning member; a moving portion, a measurement portion, and a controller. The controller performs a reset operation in which the cleaning member is pressed against the reference member before cleaning, a cleaning member is moved in a direction away from the reference member after the measured value of the measurement portion reaches a predetermined reset load, when the measurement values of the measurement portion for each unit movement amount of the cleaning member become equal to each other at least twice consecutively, a position of the cleaning member at the time is set as a reference position of the cleaning member at the time of cleaning, and the measurement value of the measurement portion at the time is set as a pressing reference value at the time of cleaning.

Abstract: A cleaning liquid supply device for supplying a cleaning device with cleaning liquid includes a chemical liquid inlet portion and a dilution water inlet portion, a first chemical liquid control unit fluidically connected to the chemical liquid inlet portion and the dilution water inlet portion, and a second chemical liquid control unit fluidically connected to the chemical liquid inlet portion and the dilution water inlet portion. The first chemical liquid control unit includes a first chemical-liquid-flow-rate control unit, a first dilution-water-flow-rate control unit, and a first mixing portion. The second chemical liquid control unit includes a second chemical-liquid-flow-rate control unit, a second dilution-water-flow-rate control unit, and a second mixing portion.