Patents by Inventor Hajime Inagaki
Hajime Inagaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220203595Abstract: A production method for a container having a covering layer includes forming a preform having a covering layer by using a thermoplastic synthetic resin; heating the preform from an outside of the preform with an infrared heater, and heating the preform from an inside of the preform with an internal heating unit; and forming the container having the covering layer by blow molding in which the heated preform is blown.Type: ApplicationFiled: April 3, 2020Publication date: June 30, 2022Applicant: TOYO SEIKAN CO., LTD.Inventors: Hiromitsu KIYOTO, Hajime INAGAKI
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Publication number: 20220017258Abstract: Provided are a preform for manufacturing a synthetic resin container, in which a decorative layer (60) having three-dimensional design different from the conventional one is formed on the surface of a container main body (10a), and a synthetic resin container. In a preform (1) including a preform main body (1a) of a bottomed cylindrical shape that is opened to have a mouth portion (2) on one end side thereof, and a covering layer (6) configured to cover the preform main body (1a) except for a part thereof on a mouth portion (2) side, and a container (10) obtained by subjecting the preform to blow molding, a distal end side of the covering layer (6) (decorative layer (60)) is formed so as to reach a peripheral end edge of a neck ring (22) while covering a lower surface of the neck ring (22) that is provided on a lower end side of the mouth portion (2) and protrudes annularly along a circumferential direction.Type: ApplicationFiled: November 13, 2019Publication date: January 20, 2022Applicant: TOYO SEIKAN CO., LTD.Inventors: Hiromitsu KIYOTO, Hajime INAGAKI, Hideto MONZEN, Hiroki YASUKAWA
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Patent number: 7906217Abstract: A vapor deposited film is formed on a base material surface by a plasma CVD method where an organic metal compound and an oxidizing gas are used as a reactive gas. The vapor deposited film has three sections of a base material side adhesive layer having 5% or more carbon, a barrier intermediate layer having less than 5% carbon, and a surface protection film having 5% or more carbon, by element concentration with respect to the total amount of three elements of a metal element (M), oxygen (O) and carbon (C) derived from the organic metal compound. The vapor deposited film has excellent adhesiveness to the base material, and has excellent resistance to water, especially to alkaline aqueous solutions, as well.Type: GrantFiled: February 7, 2006Date of Patent: March 15, 2011Assignee: Toyo Seikan Kaisha, Ltd.Inventors: Hajime Inagaki, Toshihide Ieki, Satoru Kitou, Ryuta Nakano, Megumi Nakayama
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Patent number: 7847209Abstract: A method of forming a metal oxide film by the plasma CVD method and which includes reacting chiefly an organometal by a glow discharge in a low output region and, then, reacting the organometal with an oxidizing gas by the glow discharge in a high-output region to form a metal oxide film on the surface of a plastic substrate via an organic layer. This method forms a thin film having excellent adhesiveness, softness and flexibility on the surface of a plastic substrate relying on the plasma CVD method.Type: GrantFiled: October 9, 2003Date of Patent: December 7, 2010Assignee: Toyo Seikan Kaisha, Ltd.Inventors: Tsunehisa Namiki, Toshihide Ieki, Hideo Kurashima, Hajime Inagaki, Akira Kobayashi, Koji Yamada
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Publication number: 20090148633Abstract: A vapor deposited film is formed on a base material surface by a plasma CVD method where an organic metal compound and an oxidizing gas are used as a reactive gas. The vapor deposited film has three sections of a base material side adhesive layer having 5% or more carbon, a barrier intermediate layer having less than 5% carbon, and a surface protection film having 5% or more carbon, by element concentration with respect to the total amount of three elements of a metal element (M), oxygen (O) and carbon (C) derived from the organic metal compound. The vapor deposited film has excellent adhesiveness to the base material, and has excellent resistance to water, especially to alkaline aqueous solutions, as well.Type: ApplicationFiled: February 7, 2006Publication date: June 11, 2009Applicant: Toyo Seikan Kaisha , Ltd.Inventors: Hajime Inagaki, Toshihide Ieki, Satoru Kitou, Ryuta Nakano, Megumi Nakayama
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Patent number: 7488683Abstract: A method of forming a vapor deposited film of a silicon oxide on the surface of a substrate by holding the substrate to be treated in a plasma-treating chamber, and effecting the treatment with a chemical plasma by feeding an organosilicon compound and an oxidizing gas into the treating chamber, wherein the rate of feeding the oxidizing gas is varied while maintaining constant the rate of feeding the organosilicon compound gas into the plasma-treating chamber during the formation of the vapor deposited film. A chemical vapor deposited film is formed featuring excellent adhesiveness, softness, flexibility, oxygen-barrier property and water-barrier property.Type: GrantFiled: March 23, 2004Date of Patent: February 10, 2009Assignee: Toyo Seikan Kaisha, Ltd.Inventors: Akira Kobayashi, Tsunehisa Namiki, Hiroko Hosono, Hideo Kurashima, Hajime Inagaki, Toshihide Ieki
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Publication number: 20090011146Abstract: A vapor deposition film formation method includes a step for arranging a surface wave generating device (10) using a microwave in a vacuum region, a step for continuously feeding a plastic film substrate (13) into the vacuum region so as to oppose to the surface wave generating device, a step of continuously supplying a reaction gas containing at least organic metal compound into the vacuum region, and a step for executing plasma reaction by the surface wave of the microwave from the surface wave generating device (10), thereby continuously forming a vapor deposition film on the surface of the film substrate (13). This method enables continuous formation of a vapor deposition film on the surface of a film substrate, especially a long film, by the surface wave plasma of the microwave.Type: ApplicationFiled: April 3, 2006Publication date: January 8, 2009Applicant: TOYO SEIKAN KAISHA, LTD.Inventors: Kouji Yamada, Ichiro Kunihiro, Hajime Inagaki, Hideo Kurashima
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Publication number: 20060264044Abstract: A method of forming a vapor deposited film of a silicon oxide on the surface of a substrate by holding the substrate to be treated in a plasma-treating chamber, and effecting the treatment with a chemical plasma by feeding an organosilicon compound and an oxidizing gas into the treating chamber, wherein the rate of feeding the oxidizing gas is varied while maintaining constant the rate of feeding the organosilicon compound gas into the plasma-treating chamber during the formation of the vapor deposited film. A chemical vapor deposited film is formed featuring excellent adhesiveness, softness, flexibility, oxygen-barrier property and water-barrier property.Type: ApplicationFiled: March 23, 2004Publication date: November 23, 2006Inventors: Akira Kobayashi, Tsunehisa Namiki, Hiroko Hosono, Hideo Kurashima, Hajime Inagaki, Toshihide Ieki
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Publication number: 20060138099Abstract: A method of forming a metal oxide film by the plasma CVD method and comprising reacting chiefly an organometal by a glow discharge in a low output region and, then, reacting the organometal with an oxidizing gas by the glow discharge in a high-output region to form a metal oxide film on the surface of a plastic substrate via an organic layer. This method forms a thin film having excellent adhesiveness, softness and flexibility on the surface of a plastic substrate relying on the plasma CVD method.Type: ApplicationFiled: October 9, 2003Publication date: June 29, 2006Inventors: Tsunehisa Namiki, Toshihide Ieki, Hideo Kurashima, Hajime Inagaki, Akira Kobayashi, Koji Yamada
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Patent number: 6818310Abstract: A silicon oxide film is formed on the surfaces of a plastic substrate and contains methyl groups and methylene groups in a portion near the interface to the plastic substrate. The silicon oxide film exhibits not only excellent adhesion to the plastic substrate, softness and flexibility but also exhibits excellent gas shut-off property (gas barrier property), makes it possible to achieve excellent gas-shutoff property with a smaller film thickness than that of the conventional films, and can be mass-produced favorably.Type: GrantFiled: January 6, 2003Date of Patent: November 16, 2004Assignee: Toyo Seikan Kaisha, Ltd.Inventors: Tsunehisa Namiki, Toshihide Ieki, Hideo Kurashima, Hajime Inagaki, Akira Kobayashi, Koji Yamada, Miwako Tanikawa
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Publication number: 20030165696Abstract: A silicon oxide film is formed on the surfaces of a plastic substrate and contains methyl groups and methylene groups in a portion near the interface to the plastic substrate. The silicon oxide film exhibits not only excellent adhesion to the plastic substrate, softness and flexibility but also exhibits excellent gas shut-off property (gas barrier property), makes it possible to achieve excellent gas-shutoff property with a smaller film thickness than that of the conventional films, and can be mass-produced favorably.Type: ApplicationFiled: January 6, 2003Publication date: September 4, 2003Inventors: Tsunehisa Namiki, Toshihide Ieki, Hideo Kurashima, Hajime Inagaki, Akira Kobayashi, Koji Yamada, Miwako Tanikawa
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Publication number: 20020016416Abstract: Ethylene/&agr;-olefin copolymer with olefin type elastomer, each having particular properties, including density and melt flow rate, with a density ratio of elastomer to copolymer of less than 1, provide compositions which have excellent moldability and form films having high mechanical strength.Type: ApplicationFiled: August 15, 2001Publication date: February 7, 2002Inventors: Mamoru Takahashi, Seiichi Ikeyama, Akira Todo, Toshiyuki Tsutsui, Seiji Ohta, Hajime Inagaki
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Patent number: 6333387Abstract: Ethylene/&agr;-olefin copolymer with olefin type elastomer, each having particular properties, including density and melt flow rate, with a density ratio of elastomer to copolymer of less than 1, provide compostions which have excellent moldability and form films having high mechanical strength.Type: GrantFiled: November 2, 2000Date of Patent: December 25, 2001Assignee: Mitsui Chemicals Inc.Inventors: Mamoru Takahashi, Seiichi Ikeyama, Akira Todo, Toshiyuki Tsutsui, Seiji Ohta, Hajime Inagaki
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Patent number: 6303713Abstract: A graft modified ethylene/&agr;-olefin copolymer obtained by graft polymerizing an ethylene/&agr;-olefin of 3 to 20 carbon atoms copolymerizing with a polar monomer in the presence of a catalyst for olefin polymerization comprising an organoaluminum oxy-compound (a) and at least two kinds of transition metal compounds (b). This ethylene/&agr;-olefin copolymer has high melt tension and high flowability. An ethylene copolymer composition comprising the above-mentioned graft modified ethylene/&agr;-olefin copolymer and polyolefin. The graft modified ethylene/&agr;-olefin copolymer of the invention is excellent in heat stability and moldability. From this copolymer, a film having a high transparency and good adhesion to highly polar materials can be produced. The ethylene copolymer composition of the invention is excellent in heat stability and moldability. From this composition, a film having high transparency and good adhesion to highly polar materials can be produced.Type: GrantFiled: August 20, 1999Date of Patent: October 16, 2001Assignee: Mitsui Chemicals INCInventors: Toshiyuki Tsutsui, Ken Yoshitsugu, Mamoru Takahashi, Akira Todo, Seiji Ohta, Hajime Inagaki
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Patent number: 6184297Abstract: An ethylene copolymer composition comprising an ethylene/&agr;-olefin copolymer [A1] obtained by using a catalyst for olefin polymerization containing an organoaluminum oxy-compound (a) and at least two kinds of specific metallocene compounds (b), and one (co)polymer selected from the group consisting of [B1] a low-density polyethylene obtained by high-pressure radical polymerization, [B2] a crystalline polyolefin and [B3] an olefin type elastomer. An ethylene copolymer composition comprising an ethylene/&agr;-olefin copolymer [A2] having specific properties, and one (co)polymer selected from the group consisting of [B1] a low-density polyethylene obtained by high-pressure radical polymerization, [B2] a crystalline polyolefin and [B3] an olefin type elastomer.Type: GrantFiled: February 12, 1997Date of Patent: February 6, 2001Assignee: Mitsui Chemicals IncInventors: Mamoru Takahashi, Seiichi Ikeyama, Akira Todo, Toshiyuki Tsutsui, Seiji Ohta, Hajime Inagaki
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Patent number: 6001941Abstract: An ethylene/.alpha.-olefin copolymer obtained by copolymerizing ethylene with an .alpha.-olefin of 3 to 20 carbon atoms in the presence of a catalyst for olefin polymerization comprising an organoaluminum oxy-compound (a) and at least two kinds of transition metal compounds (b). This ethylene/.alpha.-olefin copolymer has high melt tension and high flowability. A graft modified ethylene/.alpha.-olefin copolymer obtained by graft polymerizing the above-mentioned ethylene/.alpha.-olefin copolymer with a polar monomer. An ethylene copolymer composition comprising the above-mentioned graft modified ethylene/.alpha.-olefin copolymer and polyolefin. The ethylene/.alpha.-olefin copolymer of the invention is excellent in moldability. From this copolymer, a film having high transparency and high mechanical strength can be produced. The graft modified ethylene/.alpha.-olefin copolymer of the invention is excellent in heat stability and moldability.Type: GrantFiled: June 5, 1995Date of Patent: December 14, 1999Assignee: Mitsui Chemicals, Inc.Inventors: Toshiyuki Tsutsui, Ken Yoshitsugu, Mamoru Takahashi, Akira Todo, Seiji Ohta, Hajime Inagaki
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Patent number: 5948860Abstract: Disclosed is a propylene polymer composition comprising (a) a propylene polymer, (b) an olefin type elastomer and (c) a polar group-containing olefin polymer composition obtained by heating (c-1) an olefin polymer containing a carboxyl group or an acid anhydrous group in its molecule and (c-2) an amino compound, each in a specific amount. Also disclosed is a propylene polymer composition comprising (a) a propylene polymer, (b) an olefin type elastomer, (c-1) an olefin polymer containing a carboxyl group or an acid anhydrous group in its molecule and (c-2) an amino compound, each in a specific amount. The propylene polymer compositions of the present invention are excellent in properties of being coated with various coatings.Type: GrantFiled: January 9, 1997Date of Patent: September 7, 1999Assignee: Mitsui Chemicals, Inc.Inventors: Shoji Hiraoka, Masayoshi Yamaguchi, Hajime Inagaki, Mikio Hashimoto
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Patent number: 5834557Abstract: An ethylene/.alpha.-olefin copolymer composition including (I) a graft-modified ethylene/.alpha.-olefin copolymer composition and (II) a polyolefin. The graft-modified composition is prepared by graft copolymerizing an ethylene/.alpha.-olefin copolymer with a polar monomer. The ethylene/.alpha.-olefin copolymer composition includes first and second ethylene/.alpha.-olefin copolymers. The copolymers are each prepared in the presence of a polymerization catalyst containing (a) an organoaluminum oxy compound and (b) for the first ethylene/.alpha.-olefin copolymer at least two kinds, and for the second ethylene/.alpha.-olefin copolymer one kind, of compounds of Group IV transition metals of the periodic table containing a ligand having a cyclopentadienyl skeleton. The graft-modified ethylene/.alpha.-olefin copolymer composition is blended with a polyolefin, such as by mechanical or solution blending, at a weight ratio (I) to (II) of 1:99 to 99:1.Type: GrantFiled: June 11, 1997Date of Patent: November 10, 1998Assignee: Mitsui Chemicals, Inc.Inventors: Toshiyuki Tsutsui, Ken Yoshitsugu, Mamoru Takahashi, Akira Todo, Seiji Ohta, Hajime Inagaki
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Patent number: 5789459Abstract: A surface-coated vessel or a surface-coated product having a hard coating layer is obtained, by coating a substrate of, for example, resin product with a resin composition for hard coating which comprises(a) a poly?(meth)acryloyloxyalkyl! (iso)cyanurate represented by the following general formula (1) or (2): ##STR1## wherein X.sup.1, X.sup.2 and X.sup.3 are each an acryloyl group, methacryloyl group, hydrogen atom or an alkyl group, with a proviso that at least two of them are (meth)acryloyl groups, and R.sup.1, R.sup.2 and R.sup.3 are each an oxyalkylene group or a polyoxyalkylene group;(b) a poly(meth)acrylated polyoxyalkane polyol;(c) a photopolymerization initiator consisting of 2-methyl-1-?4-(methylthio)phenyl!-2-morpholino-1-propanone;(d) a photopolymerization initiator based on thioxanthone;(e) a UV-absorber based on monohydroxybenzophenone;(f) an organic solvent.Type: GrantFiled: August 22, 1997Date of Patent: August 4, 1998Assignee: Mitsui Petrochemical Industries, Ltd.Inventors: Hajime Inagaki, Koji Yoshii
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Patent number: 5708080Abstract: A graft-modified ethylene/.alpha.-olefin copolymer composition is prepared by graft copolymerizing an ethylene/.alpha.-olefin copolymer. The ethylene/.alpha.-olefin copolymer composition includes first and second ethylene/.alpha.-olefin copolymers. The copolymers are each prepared in the presence of a polymerization catalyst containing (a) an organoaluminum oxy compound and (b) for the first ethylene/.alpha.-olefin copolymer at least two kinds, and for the second ethylene/.alpha.-olefin copolymer one kind, of compounds of Group IV transition metals of the periodic table containing a ligand having a cyclopentadienyl skeleton. The ethylene/.alpha.-olefin copolymer composition may be blended with a polyolefin by mechanical or solution blending. The copolymer compositions have excellent moldability and heat stability properties and forms films having high transparency and mechanical strength.Type: GrantFiled: May 25, 1995Date of Patent: January 13, 1998Assignee: Mitsui Petrochemical Industries, Ltd.Inventors: Toshiyuki Tsutsui, Ken Yoshitsugu, Mamoru Takahashi, Akira Todo, Seiji Ohta, Hajime Inagaki