Patents by Inventor Hajime INAMI

Hajime INAMI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12265331
    Abstract: A radiation-sensitive resin composition includes: a resin including a structural unit (A) represented by formula (1) and a structural unit (B) having an acid-dissociable group; a radiation-sensitive acid generator; and a solvent. R1 is a halogen atom-substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms; X is —O— or —S—; La1 is a halogen atom-substituted or unsubstituted divalent hydrocarbon group having 1 to 10 carbon atoms, and RP is a monovalent organic group having at least one structure selected from the group consisting of a lactone structure, a cyclic carbonate structure, and a sultone structure.
    Type: Grant
    Filed: June 30, 2022
    Date of Patent: April 1, 2025
    Assignee: JSR CORPORATION
    Inventors: Ryuichi Nemoto, Kota Furuichi, Hajime Inami
  • Publication number: 20250085629
    Abstract: A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1), a resin including a structural unit having an acid-dissociable group, and an alcohol-based solvent having a boiling point of 90° C. or higher. R1 is a substituted or unsubstituted monovalent hydrocarbon group or a group including a divalent hetero atom-containing group between two adjacent carbon atoms of the hydrocarbon group; R2 and R3 are each independently a hydrogen atom or a monovalent hydrocarbon group, one of Rf11 and Rf12 is a fluorine atom, and the other is a fluorine atom or a monovalent fluorinated hydrocarbon group, m1 is an integer of 1 to 3; m2 is an integer of 0 to 8; and Z1+ represents a monovalent radiation-sensitive onium cation.
    Type: Application
    Filed: November 20, 2024
    Publication date: March 13, 2025
    Applicant: JSR CORPORATION
    Inventors: Ryuichi NEMOTO, Masayuki MIYAKE, Hajime INAMI, Tsuyoshi FURUKAWA, Noboru OTSUKA, Kensuke MIYAO
  • Publication number: 20250076761
    Abstract: A radiation-sensitive resin composition includes: a first onium salt compound represented by formula (1); a second onium salt compound represented by formula (2); a resin including a structural unit having an acid-dissociable group; and a solvent. R1 is a substituted or unsubstituted monovalent hydrocarbon group or the like; R2 and R3 are each independently a hydrogen atom or a monovalent hydrocarbon group; one of Rf11 and Rf12 is a fluorine atom, and the other is a fluorine atom or a monovalent fluorinated hydrocarbon group; and Z1+ represents a monovalent radiation-sensitive onium cation. R4 is a monovalent organic group including a cyclic structure; Rf21 and Rf22 each independently represent a fluorine atom or a monovalent fluorinated hydrocarbon group; and Z2+ represents a monovalent radiation-sensitive onium cation.
    Type: Application
    Filed: November 19, 2024
    Publication date: March 6, 2025
    Applicant: JSR CORPORATION
    Inventors: Ryuichi NEMOTO, Masayuki MIYAKE, Hajime INAMI, Tsuyoshi FURUKAWA, Noboru OTSUKA, Kensuke MIYAO
  • Publication number: 20250076762
    Abstract: A radiation-sensitive resin composition includes: a first onium salt compound represented by formula (1); a second onium salt compound represented by formula (2); a resin including an acid-dissociable group; and a solvent. R1 is a substituted or unsubstituted monovalent hydrocarbon group or the like; R2 and R3 are each independently a hydrogen atom, a fluorine atom, or the like; and Z+ represents a monovalent radiation-sensitive onium cation. R4 is a monovalent organic group; one of Rf21 and Rf22 is a fluorine atom, and the other is a fluorine atom or a monovalent fluorinated hydrocarbon group; Ar is a monovalent organic group including an aromatic ring; R5, R6, R7, and R8 each independently represent a hydrogen atom, a hydroxy group, a halogen atom, or a monovalent organic group; and X is a single bond or a divalent hetero atom-containing group.
    Type: Application
    Filed: November 19, 2024
    Publication date: March 6, 2025
    Applicant: JSR CORPORATION
    Inventors: Ryuichi NEMOTO, Masayuki MIYAKE, Hajime INAMI, Tsuyoshi FURUKAWA, Noboru OTSUKA, Kensuke MIYAO
  • Publication number: 20250076760
    Abstract: A radiation-sensitive resin composition includes: a first onium salt compound represented by formula (1); a second onium salt compound represented by formula (2); a resin including a structural unit having an acid-dissociable group; and a solvent. R1 is a substituted or unsubstituted monovalent hydrocarbon group or a group including a divalent hetero atom-containing group between two adjacent carbon atoms of the hydrocarbon group; R2 and R3 are each independently a hydrogen atom, a fluorine atom, or the like; and one of Rf11 and Rf12 is a fluorine atom, and the other is a hydrogen atom, a fluorine atom, or a monovalent fluorinated hydrocarbon group. R4 is a monovalent organic group in which neither a fluorine atom nor a fluorinated hydrocarbon group is bonded to an atom adjacent to the sulfur atom.
    Type: Application
    Filed: November 19, 2024
    Publication date: March 6, 2025
    Applicant: JSR CORPORATION
    Inventors: Ryuichi NEMOTO, Masayuki MIYAKE, Hajime INAMI, Tsuyoshi FURUKAWA, Noboru OTSUKA, Kensuke MIYAO
  • Publication number: 20240393688
    Abstract: A radiation-sensitive resin composition includes: a polymer comprising a structural unit (I) represented by formula (1) and a structural unit different from the structural unit (I); an onium salt represented by formula (i); and a solvent. In formula (1), RK1 is a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group, L1 is an alkanediyl group having 1 to 5 carbon atoms, and Rf1 is a fluorinated hydrocarbon group having 2 to 10 carbon atoms and 5 to 7 fluorine atoms. In formula (i), Ra1 is a substituted or unsubstituted monovalent organic group having 1 to 40 carbon atoms with no fluorine atom or fluorinated hydrocarbon group attached to an atom adjacent to the sulfur atom, and X+ is a monovalent onium cation.
    Type: Application
    Filed: August 7, 2024
    Publication date: November 28, 2024
    Applicant: JSR CORPORATION
    Inventors: Ryuichi NEMOTO, Taiichi FURUKAWA, Tsuyoshi FURUKAWA, Hajime INAMI
  • Publication number: 20240393687
    Abstract: A radiation-sensitive resin composition includes: a polymer comprising a structural unit (I) represented by a formula (1) and a structural unit different from the structural unit (I); a radiation-sensitive acid generator represented by a formula (?); and a solvent. RK1 is a hydrogen atom, a fluorine atom, or the like, L1 is an alkanediyl group, and Rf1 is a fluorinated hydrocarbon group. RW is a monovalent organic group having 3 to 40 carbon atoms that contains a cyclic structure, Rfa and Rfb are each independently a fluorine atom or the like, R11 and R12 are each independently a hydrogen atom, a fluorine atom, or the like, n1 is an integer of 1 to 4, n2 is an integer of 0 to 4, no carbonyl group is present between a sulfur atom of the sulfonic acid ion and the cyclic structure of RW, and Z+ is a monovalent onium cation.
    Type: Application
    Filed: August 6, 2024
    Publication date: November 28, 2024
    Applicant: JSR CORPORATION
    Inventors: Fuyuki EGAWA, Taiichi FURUKAWA, Tsuyoshi FURUKAWA, Hajime INAMI, Ryuichi NEMOTO
  • Publication number: 20220342307
    Abstract: A radiation-sensitive resin composition includes: a resin including a structural unit (A) represented by formula (1) and a structural unit (B) having an acid-dissociable group; a radiation-sensitive acid generator; and a solvent. R1 is a halogen atom-substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms; X is —O— or —S—; La1 is a halogen atom-substituted or unsubstituted divalent hydrocarbon group having 1 to 10 carbon atoms, and RP is a monovalent organic group having at least one structure selected from the group consisting of a lactone structure, a cyclic carbonate structure, and a sultone structure.
    Type: Application
    Filed: June 30, 2022
    Publication date: October 27, 2022
    Applicant: JSR CORPORATION
    Inventors: Ryuichi NEMOTO, Kota FURUICH, Hajime INAMI
  • Patent number: 11340528
    Abstract: Disclosed herein is a method for producing a composition for resist top coat layer, the method including: polymerizing a monomer solution containing a fluorine-containing monomer in a presence of a polymerization initiator that cleaves to generate an active species having 7 or more carbon atoms in total to obtain a fluorine-containing resin A; and mixing the fluorine-containing resin A and a solvent.
    Type: Grant
    Filed: December 11, 2019
    Date of Patent: May 24, 2022
    Assignee: JSR CORPORATION
    Inventors: Sosuke Osawa, Kosuke Terayama, Hajime Inami, Kanako Ueda, Atsuto Nishii
  • Publication number: 20210181630
    Abstract: Disclosed herein is a method for producing a composition for resist top coat layer, the method including: polymerizing a monomer solution containing a fluorine-containing monomer in a presence of a polymerization initiator that cleaves to generate an active species having 7 or more carbon atoms in total to obtain a fluorine-containing resin A; and mixing the fluorine-containing resin A and a solvent.
    Type: Application
    Filed: December 11, 2019
    Publication date: June 17, 2021
    Applicant: JSR CORPORATION
    Inventors: Sosuke OSAWA, Kosuke TERAYAMA, Hajime INAMI, Kanako UEDA, Atsuto NISHII