Patents by Inventor Hajime Ishizaka

Hajime Ishizaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7521574
    Abstract: Organohalosilanes are prepared by charging a reactor with a contact mass comprising metallic silicon and a catalyst and feeding an organohalide-containing gas to the reactor. The contact mass is prepared by premixing metallic silicon and a tin compound and heat treating the premix at 300-600° C. in an inert gas atmosphere.
    Type: Grant
    Filed: October 18, 2005
    Date of Patent: April 21, 2009
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mikio Aramata, Hajime Ishizaka, Tetsuya Inukai, Kenji Saito
  • Patent number: 7420075
    Abstract: Organohalosilanes are prepared by charging a reactor with a contact mass of metallic silicon and a catalyst and feeding an organohalide-containing gas to the reactor. Tin or a tin compound is used as the catalyst. Then organohalosilanes can be produced quite efficiently at a high reaction rate while maintaining a low T/D ratio and minimizing the deposition of by-products and carbon.
    Type: Grant
    Filed: August 16, 2004
    Date of Patent: September 2, 2008
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mikio Aramata, Hajime Ishizaka, Tetsuya Inukai
  • Patent number: 7279590
    Abstract: Organohalosilanes are prepared by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst. A contact mass composed of metallic silicon and copper catalyst contains an effective amount of a catalyst powder obtained by mechanical surface treatment of a powder mixture of tin powder and another metal, typically copper powder, on a ball mill, stamp mill, jet mill, mechanofusion device or the like.
    Type: Grant
    Filed: March 17, 2005
    Date of Patent: October 9, 2007
    Assignee: Shin-Estu Chemical Co., Ltd.
    Inventors: Tetsuya Inukai, Hajime Ishizaka, Mikio Aramata, Yukinori Satou
  • Patent number: 7179933
    Abstract: Organohalosilanes are prepared by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst. A contact mass composed of the metallic silicon and the copper catalyst contains an effective amount of a catalyst alloy containing 0.2–8 wt % of tin and 4–20 wt % of phosphorus which is powdered by atomization.
    Type: Grant
    Filed: March 17, 2005
    Date of Patent: February 20, 2007
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tetsuya Inukai, Hajime Ishizaka, Mikio Aramata, Yukinori Satou
  • Publication number: 20060084821
    Abstract: Organohalosilanes are prepared by charging a reactor with a contact mass comprising metallic silicon and a catalyst and feeding an organohalide-containing gas to the reactor. The contact mass is prepared by premixing metallic silicon and a tin compound and heat treating the premix at 300-600° C. in an inert gas atmosphere.
    Type: Application
    Filed: October 18, 2005
    Publication date: April 20, 2006
    Inventors: Mikio Aramata, Hajime Ishizaka, Tetsuya Inukai, Kenji Saito
  • Publication number: 20050209475
    Abstract: Organohalosilanes are prepared by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst. A contact mass composed of the metallic silicon and the copper catalyst contains an effective amount of a catalyst alloy containing 0.2-8 wt % of tin and 4-20 wt % of phosphorus which is powdered by atomization.
    Type: Application
    Filed: March 17, 2005
    Publication date: September 22, 2005
    Inventors: Tetsuya Inukai, Hajime Ishizaka, Mikio Aramata, Yukinori Satou
  • Publication number: 20050209474
    Abstract: Organohalosilanes are prepared by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst. A contact mass composed of metallic silicon and copper catalyst contains an effective amount of a catalyst powder obtained by mechanical surface treatment of a powder mixture of tin powder and another metal, typically copper powder, on a ball mill, stamp mill, jet mill, mechanofusion device or the like.
    Type: Application
    Filed: March 17, 2005
    Publication date: September 22, 2005
    Inventors: Tetsuya Inukai, Hajime Ishizaka, Mikio Aramata, Yukinori Satou
  • Patent number: 6894181
    Abstract: In an industrial process for preparing organohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains an effective amount of a phosphine chalcogenide compound. The invention drastically increases the silane formation rate and the utilization of silicon without lowering the selectivity of useful silane.
    Type: Grant
    Filed: April 23, 2003
    Date of Patent: May 17, 2005
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Tetsuya Inukai, Hajime Ishizaka
  • Publication number: 20050043557
    Abstract: Organohalosilanes are prepared by charging a reactor with a contact mass of metallic silicon and a catalyst and feeding an organohalide-containing gas to the reactor. Tin or a tin compound is used as the catalyst. Then organohalosilanes can be produced quite efficiently at a high reaction rate while maintaining a low T/D ratio and minimizing the deposition of by-products and carbon.
    Type: Application
    Filed: August 16, 2004
    Publication date: February 24, 2005
    Inventors: Mikio Aramata, Hajime Ishizaka, Tetsuya Inukai
  • Patent number: 6768018
    Abstract: When oganohalosilanes are prepared by charging a reactor with a contact mass containing metallic silicon and a copper catalyst, and introducing an organohalide-containing gas feed into the reactor, the partial pressure of organohalide gas in the gas feed is manipulated so as to keep the temperature within the reactor substantially constant. The precise control of reactor internal temperature ensures that organohalosilanes with a higher useful silane content are produced in a safe and inexpensive manner and in high yields from the contact mass having perpetually changing reactivity.
    Type: Grant
    Filed: November 20, 2003
    Date of Patent: July 27, 2004
    Assignee: Shin Etsu Chemical Co., Ltd.
    Inventors: Masaaki Furuya, Hajime Ishizaka, Mikio Aramata
  • Publication number: 20040102641
    Abstract: When oganohalosilanes are prepared by charging a reactor with a contact mass containing metallic silicon and a copper catalyst, and introducing an organohalide-containing gas feed into the reactor, the partial pressure of organohalide gas in the gas feed is manipulated so as to keep the temperature within the reactor substantially constant. The precise control of reactor internal temperature ensures that organohalosilanes with a higher useful silane content are produced in a safe and inexpensive manner and in high yields from the contact mass having perpetually changing reactivity.
    Type: Application
    Filed: November 20, 2003
    Publication date: May 27, 2004
    Inventors: Masaaki Furuya, Hajime Ishizaka, Mikio Aramata
  • Patent number: 6727376
    Abstract: In an industrial process for preparing organohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains an effective amount of a phosphonium compound having on the molecule at least one group of the formula: [R2R3R4P—]+Y− wherein R2, R3 and R4 each are a monovalent hydrocarbon group and Y is a halogen atom or acid group. The invention drastically increases the silane formation rate and the utilization of silicon without lowering the selectivity of useful silane.
    Type: Grant
    Filed: August 29, 2002
    Date of Patent: April 27, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Tetsuya Inukai, Hajime Ishizaka
  • Publication number: 20030199705
    Abstract: In an industrial process for preparing organohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains an effective amount of a phosphine chalcogenide compound. The invention drastically increases the silane formation rate and the utilization of silicon without lowering the selectivity of useful silane.
    Type: Application
    Filed: April 23, 2003
    Publication date: October 23, 2003
    Inventors: Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Tetsuya Inukai, Hajime Ishizaka
  • Publication number: 20030055277
    Abstract: In an industrial process for preparing organohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains an effective amount of a phosphonium compound having on the molecule at least one group of the formula: [R2R3R4P—]+Y− wherein R2, R3 and R4 each are a monovalent hydrocarbon group and Y is a halogen atom or acid group. The invention drastically increases the silane formation rate and the utilization of silicon without lowering the selectivity of useful silane.
    Type: Application
    Filed: August 29, 2002
    Publication date: March 20, 2003
    Inventors: Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Tetsuya Inukai, Hajime Ishizaka
  • Patent number: 6506923
    Abstract: In a process for preparing oganohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains a minute, but effective amount of a catalytic metal powder which has been produced by an atomizing technique. The process is successful in drastically increasing a formation rate without lowering the selectivity of useful silane.
    Type: Grant
    Filed: February 14, 2002
    Date of Patent: January 14, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tetsuya Inukai, Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Hajime Ishizaka
  • Patent number: 6495006
    Abstract: The present invention has an object of providing a bipolar type ion exchange electrolytic cell which is capable of minimizing the anode-cathode distance by a movable system which has a low electric resistance and which is simple and inexpensive, thereby to substantially reduce the electrolysis voltage.
    Type: Grant
    Filed: August 25, 2000
    Date of Patent: December 17, 2002
    Assignee: Asahi Glass Company, Limited
    Inventors: Tatsuhito Kimura, Hajime Ishizaka, Kiyoshi Hachiya
  • Publication number: 20020156310
    Abstract: In a process for preparing oganohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains a minute, but effective amount of a catalytic metal powder which has been produced by an atomizing technique. The process is successful in drastically increasing a formation rate without lowering the selectivity of useful silane.
    Type: Application
    Filed: February 14, 2002
    Publication date: October 24, 2002
    Inventors: Tetsuya Inukai, Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Hajime Ishizaka
  • Publication number: 20020082437
    Abstract: When oganohalosilanes are prepared by charging a reactor with a contact mass containing a metallic silicon powder, a copper catalyst and a co-catalyst, and introducing an organohalide-containing gas into the reactor to effect the direct reaction, the catalyst and/or co-catalyst used in the contact mass is obtained by mixing particles of the catalyst and/or co-catalyst with finely divided silica, and applying shear forces to the mixture for mutually rubbing the particles, thereby producing the catalyst and/or co-catalyst having finely divided silica fused to surfaces thereof. The invention is successful in producing organohalosilanes at a significantly improved formation rate without reducing the proportion of diorganodihalosilane.
    Type: Application
    Filed: October 19, 2001
    Publication date: June 27, 2002
    Inventors: Hajime Ishizaka, Susumu Ueno, Toshio Shinohara, Yoichi Tanifuji, Tetsuya Inukai, Mikio Aramata
  • Patent number: 6395917
    Abstract: When oganohalosilanes are prepared by charging a reactor with a contact mass containing a metallic silicon powder, a copper catalyst and a co-catalyst, and introducing an organohalide-containing gas into the reactor to effect the direct reaction, the catalyst and/or co-catalyst used in the contact mass is obtained by mixing particles of the catalyst and/or co-catalyst with finely divided silica, and applying shear forces to the mixture for mutually rubbing the particles, thereby producing the catalyst and/or co-catalyst having finely divided silica fused to surfaces thereof. The invention is successful in producing organohalosilanes at a significantly improved formation rate without reducing the proportion of diorganodihalosilane.
    Type: Grant
    Filed: October 19, 2001
    Date of Patent: May 28, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hajime Ishizaka, Susumu Ueno, Toshio Shinohara, Yoichi Tanifuji, Tetsuya Inukai, Mikio Aramata
  • Patent number: 6288258
    Abstract: When oganohalosilanes are prepared by charging a reactor with a contact mass containing metallic silicon and a copper catalyst and introducing an organohalide-containing gas into the reactor to effect the direct reaction, 50-10,000 ppm of bronze phosphide is added to the contact mass. The invention is successful in efficiently producing organohalosilanes in a high STY and low T/D.
    Type: Grant
    Filed: October 24, 2000
    Date of Patent: September 11, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mikio Aramata, Tatsuya Fujimoto, Ryuichi Saito, Masahiro Yuyama, Tetsuya Inukai, Hajime Ishizaka