Patents by Inventor Hajime Kakumaru
Hajime Kakumaru has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20030090193Abstract: Disclosed are a phosphor pattern which comprises a substrate having unevenness and a phosphor layer formed on the inner surface of a concave portion of the substrate, wherein the phosphor pattern thickness ratio (x)/(y) satisfies a range of 0.1 to 1.5, where when the length from the bottom of the concave portion to the top of a convex portion is L (&mgr;m), (x) is a thickness of the phosphor pattern formed on an uneven wall surface at a position of 0.9×L from the bottom of the concave portion toward the top of the convex portion, and (y) is a thickness of the phosphor pattern formed on the uneven wall surface at a position of 0.4×L from the bottom of the concave portion toward the top of the convex portion, and processes for preparing the same.Type: ApplicationFiled: June 11, 2002Publication date: May 15, 2003Inventors: Takeshi Nojiri, Hideyasu Tsuiki, Hiroyuki Tanaka, Yumiko Wada, Seiji Tai, Seikichi Tanno, Hajime Kakumaru, Kazuya Sato, Naoki Kimura, Ikuo Mukai
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Patent number: 6416931Abstract: Disclosed are a phosphor pattern which comprises a substrate having unevenness and a phosphor layer formed on the inner surface of a concave portion of the substrate, wherein the phosphor pattern thickness ratio (x)/(y) satisfies a range of 0.1 to 1.5, where when the length from the bottom of the concave portion to the top of a convex portion is L (&mgr;m), (x) is a thickness of the phosphor pattern formed on an uneven wall surface at a position of 0.9×L from the bottom of the concave portion toward the top of the convex portion, and (y) is a thickness of the phosphor pattern formed on the uneven wall surface at a position of 0.4×L from the bottom of the concave portion toward the top of the convex portion, and processes for preparing the same.Type: GrantFiled: August 13, 2001Date of Patent: July 9, 2002Assignee: Hitachi Chemical Co., Ltd.Inventors: Takeshi Nojiri, Hideyasu Tsuiki, Hiroyuki Tanaka, Yumiko Wada, Seiji Tai, Seikichi Tanno, Hajime Kakumaru, Kazuya Sato, Naoki Kimura, Ikuo Mukai
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Publication number: 20020018946Abstract: Disclosed are a phosphor pattern which comprises a substrate having unevenness and a phosphor layer formed on the inner surface of a concave portion of the substrate, wherein the phosphor pattern thickness ratio (x)/(y) satisfies a range of 0.1 to 1.5, where when the length from the bottom of the concave portion to the top of a convex portion is L (&mgr;m), (x) is a thickness of the phosphor pattern formed on an uneven wall surface at a position of 0.9×L from the bottom of the concave portion toward the top of the convex portion, and (y) is a thickness of the phosphor pattern formed on the uneven wall surface at a position of 0.4×L from the bottom of the concave portion toward the top of the convex portion, and processes for preparing the same.Type: ApplicationFiled: August 13, 2001Publication date: February 14, 2002Inventors: Takeshi Nojiri, Hideyasu Tsuiki, Hiroyuki Tanaka, Yumiko Wada, Seiji Tai, Seikichi Tanno, Hajime Kakumaru, Kazuya Sato, Naoki Kimura, Ikuo Mukai
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Patent number: 6329111Abstract: Disclosed are a phosphor pattern which comprises a substrate having unevenness and a phosphor layer formed on the inner surface of a concave portion of the substrate, wherein the phosphor pattern thickness ratio (x)/(y) satisfies a range of 0.1 to 1.5, where when the length from the bottom of the concave portion to the top of a convex portion is L (&mgr;m), (x) is a thickness of the phosphor pattern formed on an uneven wall surface at a position of 0.9×L from the bottom of the concave portion toward the top of the convex portion, and (y) is a thickness of the phosphor pattern formed on the uneven wall surface at a position of 0.4×L from the bottom of the concave portion toward the top of the convex portion, and processes for preparing the same.Type: GrantFiled: January 22, 1997Date of Patent: December 11, 2001Assignee: Hitachi Chemical CompanyInventors: Takeshi Nojiri, Hideyasu Tsuiki, Hiroyuki Tanaka, Yumiko Wada, Seiji Tai, Seikichi Tanno, Hajime Kakumaru, Kazuya Sato, Naoki Kimura, Ikuo Mukai
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Patent number: 6248501Abstract: Disclosed are a photosensitive resin composition which comprises: (C) a photopolymerizable unsaturated compound having an ethylenic unsaturated group; (D) a photopolymerization initiator which produces free radical by irradiation of active light; and (E) a surface treated phosphor, a photosensitive film and a process for preparing a fluorescent pattern using the same, and a plate for a display panel.Type: GrantFiled: March 9, 2000Date of Patent: June 19, 2001Assignee: Hitachi Chemical Co., Ltd.Inventors: Hiroyuki Tanaka, Hideyasu Tsuiki, Takeshi Nojiri, Koichi Kamijima, Seiji Tai, Seikichi Tanno, Hajime Kakumaru
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Patent number: 6077647Abstract: Disclosed are a photosensitive resin composition which comprises:(A) a compound having a carboxyl group;(B) a resin having a carboxyl group;(C) a photopolymerizable unsaturated compound having an ethylenic unsaturated group;(D) a photopolymerization initiator which produces free radical by irradiation of active light; and(E) a phosphor,a photosensitive film and a process for preparing a fluorescent pattern using the same, and a phosphor subjected to surface treatment and a process for preparing the same.Type: GrantFiled: October 15, 1998Date of Patent: June 20, 2000Assignee: Hitachi Chemical Co., Ltd.Inventors: Hiroyuki Tanaka, Hideyasu Tsuiki, Takeshi Nojiri, Koichi Kamijima, Seiji Tai, Seikichi Tanno, Hajime Kakumaru
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Patent number: 5858616Abstract: Disclosed are a photosensitive resin composition which comprises:(A) a compound having a carboxyl group;(B) a resin having a carboxyl group;(C) a photopolymerizable unsaturated compound having an ethylenic unsaturated group;(D) a photopolymerization initiator which produces free radical by irradiation of active light; and(E) a phosphor,a photosensitive film and a process for preparing a fluorescent pattern using the same, and a phosphor subjected to surface treatment and a process for preparing the same.Type: GrantFiled: October 11, 1996Date of Patent: January 12, 1999Assignee: Hitachi Chemical Company, Ltd.Inventors: Hiroyuki Tanaka, Hideyasu Tsuiki, Takeshi Nojiri, Koichi Kamijima, Seiji Tai, Seikichi Tanno, Hajime Kakumaru
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Patent number: 5700629Abstract: A resist pattern good in resolution and image precision can be obtained by a developing process characterized by jetting a gas on a developing surface during development or after development.Type: GrantFiled: May 20, 1996Date of Patent: December 23, 1997Assignee: Hitachi Chemical Company, Ltd.Inventor: Hajime Kakumaru
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Patent number: 5403698Abstract: A negative type photosensitive electrodepositing resin composition comprising (a) a polymer obtained by neutralizing a copolymer of acrylic or methacrylic acid and having an acid number of 20 to 300 with a basic organic compound, (b) a non-water-soluble monomer having two or more photopolymerizable unsaturated bonds in the molecule, (c) a non-water-soluble photoinitiator, and (d) a benzotriazole derivative having one or more carboxyl groups, is effective for giving electrodeposited films with a low voltage or low electric current in a short time, and usable for forming resist patterns with high degree of resolution.Type: GrantFiled: October 11, 1991Date of Patent: April 4, 1995Assignees: Hitachi Chemical Company, Ltd., Dai Nippon Toryo Co., Ltd.Inventors: Sigeo Tachiki, Masahiko Hiro, Toshihiko Akahori, Takuro Kato, Hajime Kakumaru, Yoshitaka Minami, Yuhji Yamazaki, Toshiya Takahashi, Toshihiko Shiotani, Yoshihisa Nagashima
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Patent number: 5334484Abstract: A photopolymerizable composition comprising: (a) 100 parts by weight of a compound having at least one ethylenically unsaturated group, (b) 0 to 400 parts by weight of a thermoplastic organic polymer and (c) 0.01 to 20 parts by weight of a photoinitiator, characterized in that an acridine compound of the following general formula (I) is used as the photoinitiator: ##STR1## wherein R represents an alkylene, oxadialkylene or thiodialkylene group having 2 to 20 carbon atoms,and a photopolymerizable element comprising a layer of the photopolymerizable composition formed on a support.Type: GrantFiled: June 15, 1992Date of Patent: August 2, 1994Assignees: Hitachi Chemical Co., Ltd., Asahi Denka Kogyo Kabushiki KaishaInventors: Yoshitaka Minami, Hajime Kakumaru, Naohiro Kubota, Nobuhide Tominaga, Koji Ishizaki
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Patent number: 5089377Abstract: Acridine compounds such as 1,4-butylenebis-.beta.-(acridin-9-yl)acrylate, or the like, are high in light sensitivity and suitable as a photopolymerization initiator.Type: GrantFiled: December 12, 1990Date of Patent: February 18, 1992Assignee: Asahi Denka Kogyo K.K.Inventors: Hajime Kakumaru, Yoshitaka Minami, Naohiro Kubota, Shinya Mashimo
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Patent number: 5045433Abstract: A substituted acridine derivative represented by ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7 and R.sub.8 are independently hydrogen atoms, alkyl groups, substituted alkyl groups, aryl groups, substituted aryl groups, halogen atoms, or alkoxy groups, and Z.sub.1 is a six-membered heteroaromatic group which has one or two nitrogen atoms in its ring and may have an alkyl substituent having 1 to 8 carbon atoms, or a quinolyl group; and a photopolymerizable composition comprising 0.01 to 10 parts by weight of said derivative, 100 parts by weight of a photopolymerizable compound having a boiling point of 100.degree. C. or higher at atmospheric pressure and at least one kind of ethylenic unsaturated group, and 0 to 400 parts by weight of a thermoplastic organic polymer.Type: GrantFiled: May 30, 1990Date of Patent: September 3, 1991Assignees: Hitachi Chemical Co., Ltd., Adeka Argus Chemical Co., Ltd.Inventors: Hajime Kakumaru, Yoshitaka Minami, Naohiro Kubota, Shinya Mashimo
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Patent number: 4985564Abstract: Acridine compounds such as 1,4-butylene-bis-.beta.-(acridin-9-yl)acrylate, or the like are high in light sensitivity and suitable as a photopolymerization initiator.Type: GrantFiled: September 1, 1989Date of Patent: January 15, 1991Assignees: Hitachi Chemical Co., Ltd., Adeka Argus Chemical Co., Ltd.Inventors: Hajime Kakumaru, Yoshitaka Minami, Naohiro Kubota, Shinya Mashimo
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Patent number: 4562142Abstract: Photosensitive composition comprising (a) an addition polymerizable compound of the general formula: ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are hydrogen atom or methyl group, and n+m=8 to 12, (b) an addition-poymerizable compound of the general formula: ##STR2## wherein Z is a cyclic dibasic acid residue, R.sup.5 is a C.sub.1 to C.sub.3 alkylene group, R.sup.6 is hydrogen atom or methyl group, and R.sup.7 is hydrogen atom, methyl group, ethyl group or CH.sub.2 X in which X is chlorine atom or bromine atom, (c) a photoactivatable polymerization initiator, and (d) a linear copolymer having a carboxy content of 17 to 50% by mole, a water absorption of 4 to 30% by weight and a weight average molecular weight of 30,000 to 400,000. Photosensitive laminate having a photosensitive layer formed from the composition has an excellent resistance to plating liquids as well as excellent etching resistance, chemical resistance, adhesion property to boards and developing property.Type: GrantFiled: September 28, 1984Date of Patent: December 31, 1985Assignee: Hitachi Chemical Company, Ltd.Inventors: Hajime Kakumaru, Nobuyuki Hayashi
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Patent number: 4312916Abstract: A process for producing adhesive film comprising coating on a filmlike substrate a composition comprising (i) a copolymer having a glass transition temperature of -30.degree. C. or lower and obtained from one or more monomers (a) such as alkyl acrylates or methacrylates, or the like, and another monomers (b) containing at least one carboxyl, alcoholic hydroxyl, or glycidyl group, (ii) a crosslinking agent having at least two crosslinkable functional groups which can react with the monomers (b), (iii) one or more monofunctional addition polymerizable monomers having a boiling point of 200.degree. C. or higher, (iv) one or more polyfunctional addition polymerizable monomers having a boiling point of 200.degree. C. or higher, and (v) a photochemical initiator, and irradiating said composition with actinic light, is advantageous in that the amount of solvent to be removed after coating the composition on the substrate can be reduced remarkably without lowering properties of the resulting adhesive film.Type: GrantFiled: September 11, 1980Date of Patent: January 26, 1982Assignee: Hitachi Chemical Company, Ltd.Inventors: Hajime Kakumaru, Nobuyuki Hayashi, Toshiaki Ishimaru, Kiyoshi Nakao, Tomohisa Ohta
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Patent number: 4272607Abstract: A photosensitive resin composition comprising (a) a linear polymer or copolymer having tetrahydrofurfuryl groups at side chains, (b) one or more photopolymerizable unsaturated compounds having at least two terminal ethylene groups, and (c) one or more sensitizers which initiate polymerization of said unsaturated compounds by irradiation of active light, has excellent storage stability and photosensitivity. The composition can produce permanent protective films having excellent resistance to solvents, heat resistance and the like and can be used as a solder resist and the like.Type: GrantFiled: March 29, 1977Date of Patent: June 9, 1981Assignee: Hitachi Chemical Company, Ltd.Inventors: Katsushige Tsukada, Nobuyuki Hayashi, Hideo Yamada, Toshiaki Ishimaru, Hajime Kakumaru